KR101002371B1 - 임피던스 매치 네트워크 및 네트워크 어셈블리를 제공하는 방법 및 시스템 - Google Patents

임피던스 매치 네트워크 및 네트워크 어셈블리를 제공하는 방법 및 시스템 Download PDF

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Publication number
KR101002371B1
KR101002371B1 KR1020057015699A KR20057015699A KR101002371B1 KR 101002371 B1 KR101002371 B1 KR 101002371B1 KR 1020057015699 A KR1020057015699 A KR 1020057015699A KR 20057015699 A KR20057015699 A KR 20057015699A KR 101002371 B1 KR101002371 B1 KR 101002371B1
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South Korea
Prior art keywords
match network
inductive elements
variable inductive
radio frequency
magnetic core
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Korean (ko)
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KR20060015465A (ko
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토마스 에이치. 윈드혼
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도쿄엘렉트론가부시키가이샤
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
KR1020057015699A 2003-02-25 2004-02-20 임피던스 매치 네트워크 및 네트워크 어셈블리를 제공하는 방법 및 시스템 Expired - Fee Related KR101002371B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US44954303P 2003-02-25 2003-02-25
US60/449,543 2003-02-25

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Publication Number Publication Date
KR20060015465A KR20060015465A (ko) 2006-02-17
KR101002371B1 true KR101002371B1 (ko) 2010-12-17

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KR1020057015699A Expired - Fee Related KR101002371B1 (ko) 2003-02-25 2004-02-20 임피던스 매치 네트워크 및 네트워크 어셈블리를 제공하는 방법 및 시스템

Country Status (4)

Country Link
US (1) US7212078B2 (enExample)
JP (1) JP2006521725A (enExample)
KR (1) KR101002371B1 (enExample)
WO (1) WO2004077894A2 (enExample)

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Publication number Publication date
KR20060015465A (ko) 2006-02-17
US20040163594A1 (en) 2004-08-26
WO2004077894A3 (en) 2004-11-18
US7212078B2 (en) 2007-05-01
JP2006521725A (ja) 2006-09-21
WO2004077894A2 (en) 2004-09-10

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