KR100931875B1 - 박막 트랜지스터 및 이의 제조 방법 - Google Patents

박막 트랜지스터 및 이의 제조 방법 Download PDF

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Publication number
KR100931875B1
KR100931875B1 KR1020080029767A KR20080029767A KR100931875B1 KR 100931875 B1 KR100931875 B1 KR 100931875B1 KR 1020080029767 A KR1020080029767 A KR 1020080029767A KR 20080029767 A KR20080029767 A KR 20080029767A KR 100931875 B1 KR100931875 B1 KR 100931875B1
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KR
South Korea
Prior art keywords
thin film
source
layer
drain electrodes
film transistor
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Expired - Fee Related
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KR1020080029767A
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English (en)
Korean (ko)
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KR20080107990A (ko
Inventor
지엔서 쉐
승 무 임
커 리앙
Original Assignee
베이징 보에 옵토일렉트로닉스 테크놀로지 컴퍼니 리미티드
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Publication of KR20080107990A publication Critical patent/KR20080107990A/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/6737—Thin-film transistors [TFT] characterised by the electrodes characterised by the electrode materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6741—Group IV materials, e.g. germanium or silicon carbide
    • H10D30/6743—Silicon

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thin Film Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
KR1020080029767A 2007-06-08 2008-03-31 박막 트랜지스터 및 이의 제조 방법 Expired - Fee Related KR100931875B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN200710100342.0 2007-06-08
CN2007101003420 2007-06-08
CN200710100342A CN100583443C (zh) 2007-06-08 2007-06-08 一种薄膜晶体管结构及其制备方法

Publications (2)

Publication Number Publication Date
KR20080107990A KR20080107990A (ko) 2008-12-11
KR100931875B1 true KR100931875B1 (ko) 2009-12-15

Family

ID=40095018

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080029767A Expired - Fee Related KR100931875B1 (ko) 2007-06-08 2008-03-31 박막 트랜지스터 및 이의 제조 방법

Country Status (4)

Country Link
US (1) US8030654B2 (enExample)
JP (2) JP2008306167A (enExample)
KR (1) KR100931875B1 (enExample)
CN (1) CN100583443C (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100917654B1 (ko) * 2006-11-10 2009-09-17 베이징 보에 옵토일렉트로닉스 테크놀로지 컴퍼니 리미티드 박막트랜지스터 액정 디스플레이 화소 구조 및 그 제조방법
CN101826532B (zh) * 2009-03-06 2012-05-30 北京京东方光电科技有限公司 Tft-lcd阵列基板及其制造方法
EP2519969A4 (en) * 2009-12-28 2016-07-06 Semiconductor Energy Lab SEMICONDUCTOR COMPONENT
JP6019370B2 (ja) * 2012-01-11 2016-11-02 株式会社Ｊｏｌｅｄ 薄膜トランジスタ及びその製造方法、表示装置
CN103400822A (zh) * 2013-08-01 2013-11-20 京东方科技集团股份有限公司 阵列基板及显示装置
CN103715266A (zh) * 2013-12-25 2014-04-09 京东方科技集团股份有限公司 氧化物薄膜晶体管、阵列基板的制造方法及显示器件
CN105161504B (zh) * 2015-09-22 2019-01-04 京东方科技集团股份有限公司 阵列基板及其制作方法、显示装置
CN105870058B (zh) * 2016-06-08 2018-12-18 昆山龙腾光电有限公司 薄膜晶体管阵列基板的制作方法
CN109935627A (zh) * 2019-01-21 2019-06-25 上海易密值半导体技术有限公司 薄膜晶体管
CN112447762A (zh) * 2019-09-05 2021-03-05 咸阳彩虹光电科技有限公司 一种显示面板及显示器

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990030267A (ko) * 1997-09-30 1999-04-26 다카노 야스아키 표시 장치와 그 제조 방법
KR100336890B1 (ko) * 1998-12-15 2003-06-19 주식회사 현대 디스플레이 테크놀로지 박막트랜지스터액정표시소자의제조방법
KR100615205B1 (ko) * 2004-01-27 2006-08-25 삼성에스디아이 주식회사 광투과율을 개선시키는 구조의 유기 전계 발광 디스플레이소자 및 이의 제조 방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284563A (ja) * 1985-10-08 1987-04-18 Nec Corp 薄膜電界効果トランジスタアレイの製造方法
JPS62252973A (ja) * 1986-04-25 1987-11-04 Nec Corp 順スタガ−ド型薄膜トランジスタ
JPS6378572A (ja) * 1986-09-20 1988-04-08 Fujitsu Ltd 半導体装置
JPH02248079A (ja) * 1989-03-22 1990-10-03 Sumitomo Metal Ind Ltd 薄膜半導体装置
JPH05315616A (ja) 1992-05-08 1993-11-26 Hitachi Ltd 半導体装置及び薄膜トランジスタ
JPH07326756A (ja) * 1994-05-30 1995-12-12 Kyocera Corp 薄膜トランジスタおよびその製造方法
JP3288615B2 (ja) 1997-10-21 2002-06-04 株式会社アドバンスト・ディスプレイ 薄膜トランジスタの製造方法
JP2001166332A (ja) * 1999-12-06 2001-06-22 Hitachi Ltd 液晶表示装置
US6933568B2 (en) * 2002-05-17 2005-08-23 Samsung Electronics Co., Ltd. Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same
CN1466017A (zh) 2002-07-05 2004-01-07 友达光电股份有限公司 于薄膜晶体管液晶显示器制造过程中的蚀刻方法
JP2006100387A (ja) * 2004-09-28 2006-04-13 Toshiba Corp 電界効果トランジスタ及びその製造方法
JP4700352B2 (ja) * 2005-01-12 2011-06-15 出光興産株式会社 Ｔｆｔ基板及びその製造方法
US7411298B2 (en) * 2005-08-17 2008-08-12 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Source/drain electrodes, thin-film transistor substrates, manufacture methods thereof, and display devices

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990030267A (ko) * 1997-09-30 1999-04-26 다카노 야스아키 표시 장치와 그 제조 방법
KR100336890B1 (ko) * 1998-12-15 2003-06-19 주식회사 현대 디스플레이 테크놀로지 박막트랜지스터액정표시소자의제조방법
KR100615205B1 (ko) * 2004-01-27 2006-08-25 삼성에스디아이 주식회사 광투과율을 개선시키는 구조의 유기 전계 발광 디스플레이소자 및 이의 제조 방법

Also Published As

Publication number Publication date
KR20080107990A (ko) 2008-12-11
JP2008306167A (ja) 2008-12-18
JP2012248896A (ja) 2012-12-13
US8030654B2 (en) 2011-10-04
US20080303028A1 (en) 2008-12-11
JP5685565B2 (ja) 2015-03-18
CN101320737A (zh) 2008-12-10
CN100583443C (zh) 2010-01-20

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