KR100924262B1 - 메쉬 전극을 갖는 세라믹 정전척 및 그 제조 방법 - Google Patents
메쉬 전극을 갖는 세라믹 정전척 및 그 제조 방법 Download PDFInfo
- Publication number
- KR100924262B1 KR100924262B1 KR1020030016976A KR20030016976A KR100924262B1 KR 100924262 B1 KR100924262 B1 KR 100924262B1 KR 1020030016976 A KR1020030016976 A KR 1020030016976A KR 20030016976 A KR20030016976 A KR 20030016976A KR 100924262 B1 KR100924262 B1 KR 100924262B1
- Authority
- KR
- South Korea
- Prior art keywords
- electrode
- hole
- lower insulator
- mesh electrode
- electrostatic chuck
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030016976A KR100924262B1 (ko) | 2003-03-19 | 2003-03-19 | 메쉬 전극을 갖는 세라믹 정전척 및 그 제조 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030016976A KR100924262B1 (ko) | 2003-03-19 | 2003-03-19 | 메쉬 전극을 갖는 세라믹 정전척 및 그 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040082454A KR20040082454A (ko) | 2004-09-30 |
KR100924262B1 true KR100924262B1 (ko) | 2009-10-30 |
Family
ID=37366231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030016976A KR100924262B1 (ko) | 2003-03-19 | 2003-03-19 | 메쉬 전극을 갖는 세라믹 정전척 및 그 제조 방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100924262B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111095521B (zh) * | 2017-10-24 | 2023-03-28 | 日本碍子株式会社 | 晶片载置台及其制法 |
KR20230002057A (ko) | 2021-06-25 | 2023-01-05 | 주식회사 템네스트 | 전극 패턴이 내장된 고정밀 소결체 및 그 제조 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1072260A (ja) | 1995-11-01 | 1998-03-17 | Ngk Insulators Ltd | 窒化アルミニウム焼結体、金属包含材、静電チャック、窒化アルミニウム焼結体の製造方法および金属包含材の製造方法 |
JPH10209255A (ja) | 1997-01-27 | 1998-08-07 | Ngk Insulators Ltd | セラミックス部材と電力供給用コネクターとの接合構造 |
KR20000062456A (ko) * | 1999-01-12 | 2000-10-25 | 조셉 제이. 스위니 | 개선된 rf 전력 분포를 가진 정전 척 |
JP2001308165A (ja) | 2000-04-19 | 2001-11-02 | Sumitomo Osaka Cement Co Ltd | サセプタ及びその製造方法 |
-
2003
- 2003-03-19 KR KR1020030016976A patent/KR100924262B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1072260A (ja) | 1995-11-01 | 1998-03-17 | Ngk Insulators Ltd | 窒化アルミニウム焼結体、金属包含材、静電チャック、窒化アルミニウム焼結体の製造方法および金属包含材の製造方法 |
JPH10209255A (ja) | 1997-01-27 | 1998-08-07 | Ngk Insulators Ltd | セラミックス部材と電力供給用コネクターとの接合構造 |
KR20000062456A (ko) * | 1999-01-12 | 2000-10-25 | 조셉 제이. 스위니 | 개선된 rf 전력 분포를 가진 정전 척 |
JP2001308165A (ja) | 2000-04-19 | 2001-11-02 | Sumitomo Osaka Cement Co Ltd | サセプタ及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20040082454A (ko) | 2004-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6272002B1 (en) | Electrostatic holding apparatus and method of producing the same | |
KR100920784B1 (ko) | 히터를 구비한 정전 척 및 히터를 구비한 정전 척의 제조방법 | |
EP1203383B1 (en) | Manufacture of solid state capacitors | |
JP7496486B2 (ja) | 静電チャック | |
US6721163B2 (en) | Stacked ceramic body and production method thereof | |
WO2001035459A1 (en) | Ceramic substrate | |
JP3847198B2 (ja) | 静電チャック | |
CN111095521B (zh) | 晶片载置台及其制法 | |
JP2007258610A (ja) | アルミナ焼成体 | |
US20230141651A1 (en) | Structure and heating device | |
US10381253B2 (en) | Electrostatic chuck | |
JP4548928B2 (ja) | 電極内蔵体及びこれを用いたウエハ支持部材 | |
KR100652244B1 (ko) | 나선형 전극을 갖는 정전척 및 그 제조 방법 | |
KR100924262B1 (ko) | 메쉬 전극을 갖는 세라믹 정전척 및 그 제조 방법 | |
JP2010114351A (ja) | 静電チャック装置 | |
KR20080039801A (ko) | 정전 척 및 정전 척의 제조 방법 | |
KR102024528B1 (ko) | 소결 합착척 및 이의 제조방법 | |
JP2967024B2 (ja) | 電極埋設品及びその製造方法 | |
CN111446196A (zh) | 陶瓷部件及其制造方法 | |
JP4502462B2 (ja) | ウエハ支持部材及びその製造方法 | |
KR101977394B1 (ko) | 액상 접합법을 이용한 세라믹 정전척의 제조방법 | |
CN107154375B (zh) | 静电卡盘装置及其集成工艺 | |
JP2004259805A (ja) | 静電チャック | |
JP2020126913A (ja) | セラミックス部材 | |
JP6114215B2 (ja) | 試料保持具 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120925 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20130904 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20140917 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20150909 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20160907 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20170907 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20190909 Year of fee payment: 11 |