KR100921523B1 - 평판 디스플레이 제조에 사용되는 기판 처리 장치 및 방법 - Google Patents

평판 디스플레이 제조에 사용되는 기판 처리 장치 및 방법 Download PDF

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Publication number
KR100921523B1
KR100921523B1 KR1020080050672A KR20080050672A KR100921523B1 KR 100921523 B1 KR100921523 B1 KR 100921523B1 KR 1020080050672 A KR1020080050672 A KR 1020080050672A KR 20080050672 A KR20080050672 A KR 20080050672A KR 100921523 B1 KR100921523 B1 KR 100921523B1
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KR
South Korea
Prior art keywords
substrate
cooling
flat panel
panel display
conveying
Prior art date
Application number
KR1020080050672A
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English (en)
Korean (ko)
Inventor
함승원
김상길
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020080050672A priority Critical patent/KR100921523B1/ko
Priority to JP2009111200A priority patent/JP2009290207A/ja
Priority to TW098117018A priority patent/TWI441117B/zh
Priority to CN2009102029249A priority patent/CN101593673B/zh
Application granted granted Critical
Publication of KR100921523B1 publication Critical patent/KR100921523B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
KR1020080050672A 2008-05-30 2008-05-30 평판 디스플레이 제조에 사용되는 기판 처리 장치 및 방법 KR100921523B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020080050672A KR100921523B1 (ko) 2008-05-30 2008-05-30 평판 디스플레이 제조에 사용되는 기판 처리 장치 및 방법
JP2009111200A JP2009290207A (ja) 2008-05-30 2009-04-30 フラットパネルディスプレイの製造に使用される基板処理装置及び方法
TW098117018A TWI441117B (zh) 2008-05-30 2009-05-22 And a substrate processing apparatus and method for manufacturing a flat panel display
CN2009102029249A CN101593673B (zh) 2008-05-30 2009-05-22 制造平板显示器所使用的基板处理装置和方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080050672A KR100921523B1 (ko) 2008-05-30 2008-05-30 평판 디스플레이 제조에 사용되는 기판 처리 장치 및 방법

Publications (1)

Publication Number Publication Date
KR100921523B1 true KR100921523B1 (ko) 2009-10-12

Family

ID=41408261

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080050672A KR100921523B1 (ko) 2008-05-30 2008-05-30 평판 디스플레이 제조에 사용되는 기판 처리 장치 및 방법

Country Status (4)

Country Link
JP (1) JP2009290207A (ja)
KR (1) KR100921523B1 (ja)
CN (1) CN101593673B (ja)
TW (1) TWI441117B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101261012B1 (ko) 2011-02-11 2013-05-06 주식회사 엘피케이 리니어 로봇 이송시스템의 이송벨트 요동방지장치
WO2020149837A1 (en) * 2019-01-16 2020-07-23 Applied Materials, Inc. Substrate processing system, substrate chamber for a vacuum processing system, and method of cooling a substrate

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101274716B1 (ko) 2009-12-23 2013-06-12 엘지디스플레이 주식회사 평판 표시 소자의 제조 장치 및 방법
JP5048810B2 (ja) * 2010-06-23 2012-10-17 東京エレクトロン株式会社 熱処理装置及び熱処理方法
KR101693739B1 (ko) * 2010-08-30 2017-01-06 주식회사 디엠에스 기판처리장치
JP5635378B2 (ja) * 2010-11-30 2014-12-03 日東電工株式会社 半導体ウエハ搬送方法および半導体ウエハ搬送装置
JP2012151258A (ja) * 2011-01-19 2012-08-09 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11157859A (ja) 1997-11-25 1999-06-15 Noritake Co Ltd ガラスパネルの冷却方法、及びその装置
JP2000302468A (ja) 1999-04-19 2000-10-31 Asahi Glass Co Ltd ガラス板加熱炉のガラス板搬送ローラ構造
KR20070017060A (ko) * 2005-08-05 2007-02-08 동경 엘렉트론 주식회사 가열·냉각 처리 장치 기판 처리 장치 및 기판 처리 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3461434B2 (ja) * 1997-07-25 2003-10-27 東レエンジニアリング株式会社 ガラス基板の冷却装置
JP3638119B2 (ja) * 2000-09-21 2005-04-13 パイオニアプラズマディスプレイ株式会社 基板冷却装置
JP3899305B2 (ja) * 2002-10-31 2007-03-28 松下電器産業株式会社 Ｐｄｐ用基板冷却装置及び方法
JP4417221B2 (ja) * 2004-10-18 2010-02-17 株式会社フューチャービジョン 基板冷却装置
JP4537323B2 (ja) * 2006-01-24 2010-09-01 東京エレクトロン株式会社 基板冷却装置
JP4537324B2 (ja) * 2006-01-24 2010-09-01 東京エレクトロン株式会社 基板冷却装置、基板冷却方法、制御プログラム、コンピュータ読取可能な記憶媒体

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11157859A (ja) 1997-11-25 1999-06-15 Noritake Co Ltd ガラスパネルの冷却方法、及びその装置
JP2000302468A (ja) 1999-04-19 2000-10-31 Asahi Glass Co Ltd ガラス板加熱炉のガラス板搬送ローラ構造
KR20070017060A (ko) * 2005-08-05 2007-02-08 동경 엘렉트론 주식회사 가열·냉각 처리 장치 기판 처리 장치 및 기판 처리 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101261012B1 (ko) 2011-02-11 2013-05-06 주식회사 엘피케이 리니어 로봇 이송시스템의 이송벨트 요동방지장치
WO2020149837A1 (en) * 2019-01-16 2020-07-23 Applied Materials, Inc. Substrate processing system, substrate chamber for a vacuum processing system, and method of cooling a substrate

Also Published As

Publication number Publication date
TW200949783A (en) 2009-12-01
TWI441117B (zh) 2014-06-11
CN101593673A (zh) 2009-12-02
CN101593673B (zh) 2011-12-07
JP2009290207A (ja) 2009-12-10

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