KR100884029B1 - 마스크 유지 기구 및 성막 장치 - Google Patents

마스크 유지 기구 및 성막 장치 Download PDF

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Publication number
KR100884029B1
KR100884029B1 KR1020077016155A KR20077016155A KR100884029B1 KR 100884029 B1 KR100884029 B1 KR 100884029B1 KR 1020077016155 A KR1020077016155 A KR 1020077016155A KR 20077016155 A KR20077016155 A KR 20077016155A KR 100884029 B1 KR100884029 B1 KR 100884029B1
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KR
South Korea
Prior art keywords
mask
chuck
glass substrate
magnet
substrate
Prior art date
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Expired - Fee Related
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KR1020077016155A
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English (en)
Korean (ko)
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KR20070089856A (ko
Inventor
다쓰야 가타오카
겐지 나가오
겐이치 사이토
Original Assignee
미쯔이 죠센 가부시키가이샤
조슈 인더스트리 컴파니 리미티드
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Application filed by 미쯔이 죠센 가부시키가이샤, 조슈 인더스트리 컴파니 리미티드 filed Critical 미쯔이 죠센 가부시키가이샤
Publication of KR20070089856A publication Critical patent/KR20070089856A/ko
Application granted granted Critical
Publication of KR100884029B1 publication Critical patent/KR100884029B1/ko
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020077016155A 2005-02-23 2006-02-22 마스크 유지 기구 및 성막 장치 Expired - Fee Related KR100884029B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005047813A JP4609755B2 (ja) 2005-02-23 2005-02-23 マスク保持機構および成膜装置
JPJP-P-2005-00047813 2005-02-23

Publications (2)

Publication Number Publication Date
KR20070089856A KR20070089856A (ko) 2007-09-03
KR100884029B1 true KR100884029B1 (ko) 2009-02-17

Family

ID=36927385

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077016155A Expired - Fee Related KR100884029B1 (ko) 2005-02-23 2006-02-22 마스크 유지 기구 및 성막 장치

Country Status (5)

Country Link
JP (1) JP4609755B2 (enExample)
KR (1) KR100884029B1 (enExample)
CN (1) CN101090994B (enExample)
TW (1) TW200639592A (enExample)
WO (1) WO2006090747A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160082557A (ko) * 2014-12-26 2016-07-08 삼성디스플레이 주식회사 증착 장치 및 증착 장치 내 기판 정렬 방법
KR20160082410A (ko) * 2014-12-26 2016-07-08 삼성디스플레이 주식회사 증착 장치 및 증착 장치 내 기판 정렬 방법

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5297046B2 (ja) * 2008-01-16 2013-09-25 キヤノントッキ株式会社 成膜装置
JP5192492B2 (ja) * 2008-03-28 2013-05-08 キヤノンアネルバ株式会社 真空処理装置、当該真空処理装置を用いた画像表示装置の製造方法及び当該真空処理装置により製造される電子装置
WO2009125802A1 (ja) * 2008-04-09 2009-10-15 株式会社 アルバック 蒸発源及び成膜装置
KR101049804B1 (ko) * 2009-02-19 2011-07-15 삼성모바일디스플레이주식회사 증착 장치용 마스크 밀착 수단 및 이를 이용한 증착 장치
JP2011195907A (ja) * 2010-03-19 2011-10-06 Tokyo Electron Ltd マスク保持装置及び薄膜形成装置
JP2011233510A (ja) * 2010-04-05 2011-11-17 Canon Inc 蒸着装置
JP4857407B1 (ja) * 2011-02-28 2012-01-18 信越エンジニアリング株式会社 薄板状ワークの粘着保持方法及び薄板状ワークの粘着保持装置並びに製造システム
KR101347546B1 (ko) * 2011-03-14 2014-01-03 엘아이지에이디피 주식회사 기판 척킹장치 및 이를 가지는 박막증착장비
JP6298110B2 (ja) * 2016-07-08 2018-03-20 キヤノントッキ株式会社 マスク支持体、成膜装置及び成膜方法
CN106399936B (zh) * 2016-12-09 2018-12-21 京东方科技集团股份有限公司 一种蒸镀设备及蒸镀方法
JP6448067B2 (ja) * 2017-05-22 2019-01-09 キヤノントッキ株式会社 基板載置方法、基板載置機構、成膜方法、成膜装置及び電子デバイスの製造方法
JP7202168B2 (ja) * 2018-12-13 2023-01-11 キヤノントッキ株式会社 成膜装置、有機ｅｌパネルの製造システム、及び成膜方法
KR102257008B1 (ko) * 2019-01-11 2021-05-26 캐논 톡키 가부시키가이샤 성막 장치, 성막 방법 및 전자 디바이스 제조방법
KR102829388B1 (ko) * 2020-01-14 2025-07-03 한국알박(주) 트레이용 마그넷 클램프

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1041069A (ja) * 1996-04-18 1998-02-13 Toray Ind Inc 有機電界発光素子の製造方法
KR20040050045A (ko) * 2002-12-03 2004-06-14 세이코 엡슨 가부시키가이샤 마스크 증착 방법 및 장치, 마스크 및 마스크의 제조 방법, 표시 패널 제조 장치, 표시 패널 및 전자 기기

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3516346B2 (ja) * 1992-09-08 2004-04-05 大日本印刷株式会社 スパッタ用治具
JP3891805B2 (ja) * 2001-08-29 2007-03-14 株式会社Ｈｉｔｚハイテクノロジー 真空蒸着装置
KR100422487B1 (ko) * 2001-12-10 2004-03-11 에이엔 에스 주식회사 전자석을 이용한 유기전계발광소자 제작용 증착장치 및그를 이용한 증착방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1041069A (ja) * 1996-04-18 1998-02-13 Toray Ind Inc 有機電界発光素子の製造方法
KR20040050045A (ko) * 2002-12-03 2004-06-14 세이코 엡슨 가부시키가이샤 마스크 증착 방법 및 장치, 마스크 및 마스크의 제조 방법, 표시 패널 제조 장치, 표시 패널 및 전자 기기

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160082557A (ko) * 2014-12-26 2016-07-08 삼성디스플레이 주식회사 증착 장치 및 증착 장치 내 기판 정렬 방법
KR20160082410A (ko) * 2014-12-26 2016-07-08 삼성디스플레이 주식회사 증착 장치 및 증착 장치 내 기판 정렬 방법
KR102311586B1 (ko) 2014-12-26 2021-10-12 삼성디스플레이 주식회사 증착 장치 및 증착 장치 내 기판 정렬 방법
KR102373326B1 (ko) * 2014-12-26 2022-03-11 삼성디스플레이 주식회사 증착 장치 및 증착 장치 내 기판 정렬 방법

Also Published As

Publication number Publication date
JP2006233257A (ja) 2006-09-07
WO2006090747A1 (ja) 2006-08-31
CN101090994B (zh) 2010-05-19
TWI323291B (enExample) 2010-04-11
JP4609755B2 (ja) 2011-01-12
TW200639592A (en) 2006-11-16
KR20070089856A (ko) 2007-09-03
CN101090994A (zh) 2007-12-19

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