KR100840730B1 - 도포장치 - Google Patents
도포장치 Download PDFInfo
- Publication number
- KR100840730B1 KR100840730B1 KR1020010046928A KR20010046928A KR100840730B1 KR 100840730 B1 KR100840730 B1 KR 100840730B1 KR 1020010046928 A KR1020010046928 A KR 1020010046928A KR 20010046928 A KR20010046928 A KR 20010046928A KR 100840730 B1 KR100840730 B1 KR 100840730B1
- Authority
- KR
- South Korea
- Prior art keywords
- coating
- substrate
- rail
- base
- lifting frame
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Abstract
Description
Claims (2)
- 기판을 수평상태로 얹어 놓는 테이블을 구비한 베이스와, 이 베이스에 대해 리니어 모터를 통해 이동 가능하게 된 이동부재와, 이 이동부재를 베이스에 대해 부상(浮上)시키는 부상수단과, 상기 이동부재에 대해 승강 가능하게 지지된 문형(門型)을 이루는 승강 프레임과, 이 문형을 이루는 승강 프레임에 수평상태로 설치되고 슬릿형 토출구가 테이블 위쪽으로 향하는 도포 엘리먼트를 구비한 도포장치에 있어서,상기 문형을 이루는 승강 프레임의 일단측 상면에 도포액 송액 펌프를 설치한 것을 특징으로 하는 도포장치.
- 제 1 항에 있어서, 상기 리니어 모터 및 부상수단은 이동부재의 이동방향을 따라 각각 한쌍씩 평행하게 배치되는 것을 특징으로 하는 도포장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020010046928A KR100840730B1 (ko) | 2001-08-03 | 2001-08-03 | 도포장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020010046928A KR100840730B1 (ko) | 2001-08-03 | 2001-08-03 | 도포장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030011462A KR20030011462A (ko) | 2003-02-11 |
KR100840730B1 true KR100840730B1 (ko) | 2008-06-23 |
Family
ID=37416566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010046928A KR100840730B1 (ko) | 2001-08-03 | 2001-08-03 | 도포장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100840730B1 (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100579884B1 (ko) * | 2003-11-29 | 2006-05-15 | 케이그라스(주) | 채색유리용 절삭장치 |
KR100780718B1 (ko) | 2004-12-28 | 2007-12-26 | 엘지.필립스 엘시디 주식회사 | 도포액 공급장치를 구비한 슬릿코터 |
KR100675643B1 (ko) | 2004-12-31 | 2007-02-02 | 엘지.필립스 엘시디 주식회사 | 슬릿코터 |
KR100700181B1 (ko) | 2004-12-31 | 2007-03-27 | 엘지.필립스 엘시디 주식회사 | 노즐대기부를 구비한 슬릿코터 및 이를 이용한 코팅방법 |
KR100700180B1 (ko) | 2004-12-31 | 2007-03-27 | 엘지.필립스 엘시디 주식회사 | 예비토출부를 구비한 슬릿코터 및 이를 이용한 코팅방법 |
KR100709504B1 (ko) * | 2005-04-30 | 2007-04-20 | 주식회사 에스에프에이 | 보호막 도포 장치 |
KR100709507B1 (ko) * | 2005-04-30 | 2007-04-20 | 주식회사 에스에프에이 | 보호막 도포 장치 |
KR100816070B1 (ko) * | 2006-08-25 | 2008-03-24 | 주식회사 탑 엔지니어링 | 평판 디스플레이 제조용 디스펜서 |
KR100811767B1 (ko) * | 2006-10-17 | 2008-03-07 | 삼성전기주식회사 | 습식처리장치 |
KR101054915B1 (ko) * | 2008-12-05 | 2011-08-05 | 주식회사 디엠에스 | 슬릿코터 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07170615A (ja) * | 1993-12-09 | 1995-07-04 | Hitachi Kiden Kogyo Ltd | 搬送装置の走行路 |
JPH10305253A (ja) * | 1997-05-07 | 1998-11-17 | Dainippon Screen Mfg Co Ltd | 塗布装置 |
JPH11221509A (ja) * | 1998-02-09 | 1999-08-17 | Sharp Corp | 塗布装置 |
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2001
- 2001-08-03 KR KR1020010046928A patent/KR100840730B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07170615A (ja) * | 1993-12-09 | 1995-07-04 | Hitachi Kiden Kogyo Ltd | 搬送装置の走行路 |
JPH10305253A (ja) * | 1997-05-07 | 1998-11-17 | Dainippon Screen Mfg Co Ltd | 塗布装置 |
JPH11221509A (ja) * | 1998-02-09 | 1999-08-17 | Sharp Corp | 塗布装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20030011462A (ko) | 2003-02-11 |
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