KR100790913B1 - 연마 장치 및 연마 방법 - Google Patents

연마 장치 및 연마 방법 Download PDF

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Publication number
KR100790913B1
KR100790913B1 KR1020000068317A KR20000068317A KR100790913B1 KR 100790913 B1 KR100790913 B1 KR 100790913B1 KR 1020000068317 A KR1020000068317 A KR 1020000068317A KR 20000068317 A KR20000068317 A KR 20000068317A KR 100790913 B1 KR100790913 B1 KR 100790913B1
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KR
South Korea
Prior art keywords
polishing
chemical
pad
solution
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020000068317A
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English (en)
Korean (ko)
Other versions
KR20010051754A (ko
Inventor
카와사키테추
이와시타미츠아키
Original Assignee
동경 엘렉트론 주식회사
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Publication date
Application filed by 동경 엘렉트론 주식회사 filed Critical 동경 엘렉트론 주식회사
Publication of KR20010051754A publication Critical patent/KR20010051754A/ko
Application granted granted Critical
Publication of KR100790913B1 publication Critical patent/KR100790913B1/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
KR1020000068317A 1999-11-19 2000-11-17 연마 장치 및 연마 방법 Expired - Fee Related KR100790913B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP99-329074 1999-11-19
JP32907499A JP3767787B2 (ja) 1999-11-19 1999-11-19 研磨装置及びその方法

Publications (2)

Publication Number Publication Date
KR20010051754A KR20010051754A (ko) 2001-06-25
KR100790913B1 true KR100790913B1 (ko) 2008-01-03

Family

ID=18217338

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000068317A Expired - Fee Related KR100790913B1 (ko) 1999-11-19 2000-11-17 연마 장치 및 연마 방법

Country Status (4)

Country Link
US (1) US6660124B1 (enExample)
JP (1) JP3767787B2 (enExample)
KR (1) KR100790913B1 (enExample)
TW (1) TW473854B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6352595B1 (en) * 1999-05-28 2002-03-05 Lam Research Corporation Method and system for cleaning a chemical mechanical polishing pad
JP4945857B2 (ja) * 2001-06-13 2012-06-06 Ｊｓｒ株式会社 研磨パッド洗浄用組成物及び研磨パッド洗浄方法
KR100444605B1 (ko) * 2001-12-29 2004-08-16 주식회사 하이닉스반도체 반도체 소자의 화학적 기계적 연마 방법
KR100886698B1 (ko) * 2002-06-28 2009-03-04 매그나칩 반도체 유한회사 화학적기계적연마의 플래튼 장치
JP2005040916A (ja) * 2003-07-24 2005-02-17 Ebara Corp ポリッシング方法
JP2006159317A (ja) * 2004-12-03 2006-06-22 Asahi Sunac Corp 研磨パッドのドレッシング方法
JP2007030157A (ja) * 2005-06-20 2007-02-08 Elpida Memory Inc 研磨装置及び研磨方法
KR100908017B1 (ko) 2007-11-13 2009-07-15 조선대학교산학협력단 연마패드 컨디셔닝 장치
KR101229972B1 (ko) * 2011-09-14 2013-02-06 주식회사 엘지실트론 웨이퍼 연마 장치
US9966281B2 (en) * 2013-11-15 2018-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and systems for chemical mechanical polish cleaning
CN104044087B (zh) * 2014-06-18 2016-09-07 蓝思科技股份有限公司 一种蓝宝石抛光用铜盘及其修盘方法
US9530655B2 (en) * 2014-09-08 2016-12-27 Taiwan Semiconductor Manufacting Company, Ltd. Slurry composition for chemical mechanical polishing of Ge-based materials and devices
US12017322B2 (en) * 2018-08-14 2024-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Chemical mechanical polishing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05259140A (ja) * 1992-03-11 1993-10-08 Mitsubishi Gas Chem Co Inc 半導体基板の洗浄液
EP0754525A1 (en) * 1995-07-18 1997-01-22 Ebara Corporation Method of and apparatus for dressing polishing cloth

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07108453A (ja) 1992-01-24 1995-04-25 Kyushu Electron Metal Co Ltd 半導体ウェーハ用研磨布のドレッシング方法
JP3256355B2 (ja) 1992-09-24 2002-02-12 株式会社荏原製作所 ポリッシング装置
JP3192346B2 (ja) 1995-03-15 2001-07-23 株式会社東芝 半導体装置の製造方法及び半導体製造装置
JPH0957608A (ja) 1995-08-11 1997-03-04 Sony Corp 研磨パッド及びこれを用いた被表面処理加工物の研磨方法
US5785585A (en) * 1995-09-18 1998-07-28 International Business Machines Corporation Polish pad conditioner with radial compensation
JPH10217104A (ja) 1997-02-07 1998-08-18 Nippon Steel Corp 半導体基板用研磨布のドレッシング方法
JPH11138426A (ja) * 1997-11-11 1999-05-25 Tokyo Electron Ltd 研磨装置
US6132289A (en) * 1998-03-31 2000-10-17 Lam Research Corporation Apparatus and method for film thickness measurement integrated into a wafer load/unload unit
US6126848A (en) * 1998-05-06 2000-10-03 International Business Machines Corporation Indirect endpoint detection by chemical reaction and chemiluminescence
JP3001054B1 (ja) * 1998-06-29 2000-01-17 日本電気株式会社 研磨装置及び研磨パッドの表面調整方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05259140A (ja) * 1992-03-11 1993-10-08 Mitsubishi Gas Chem Co Inc 半導体基板の洗浄液
EP0754525A1 (en) * 1995-07-18 1997-01-22 Ebara Corporation Method of and apparatus for dressing polishing cloth

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
일본공개특허 평5-259140호

Also Published As

Publication number Publication date
JP2001138211A (ja) 2001-05-22
US6660124B1 (en) 2003-12-09
KR20010051754A (ko) 2001-06-25
TW473854B (en) 2002-01-21
JP3767787B2 (ja) 2006-04-19

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