KR100756776B1 - 질화 알루미늄 접합체 및 그의 제조 방법 - Google Patents

질화 알루미늄 접합체 및 그의 제조 방법 Download PDF

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KR100756776B1
KR100756776B1 KR1020067008295A KR20067008295A KR100756776B1 KR 100756776 B1 KR100756776 B1 KR 100756776B1 KR 1020067008295 A KR1020067008295 A KR 1020067008295A KR 20067008295 A KR20067008295 A KR 20067008295A KR 100756776 B1 KR100756776 B1 KR 100756776B1
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aluminum nitride
sintered
metal layer
sintered metal
aln
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KR20060120058A (ko
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다쯔오 에사끼
히데끼 사또
마사노부 아즈마
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가부시끼가이샤 도꾸야마
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    • BPERFORMING OPERATIONS; TRANSPORTING
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736Al-base component

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KR1020067008295A 2003-10-31 2004-10-28 질화 알루미늄 접합체 및 그의 제조 방법 Expired - Lifetime KR100756776B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003373074 2003-10-31
JPJP-P-2003-00373074 2003-10-31
PCT/JP2004/016352 WO2005042436A1 (ja) 2003-10-31 2004-10-28 窒化アルミニウム接合体及びその製造方法

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KR20060120058A KR20060120058A (ko) 2006-11-24
KR100756776B1 true KR100756776B1 (ko) 2007-09-07

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US (1) US20070212567A1 (enExample)
EP (1) EP1690845A4 (enExample)
JP (1) JP4189373B2 (enExample)
KR (1) KR100756776B1 (enExample)
CN (1) CN100432024C (enExample)
TW (1) TW200517357A (enExample)
WO (1) WO2005042436A1 (enExample)

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US9604249B2 (en) 2012-07-26 2017-03-28 Applied Materials, Inc. Innovative top-coat approach for advanced device on-wafer particle performance
US9343289B2 (en) 2012-07-27 2016-05-17 Applied Materials, Inc. Chemistry compatible coating material for advanced device on-wafer particle performance
US9916998B2 (en) 2012-12-04 2018-03-13 Applied Materials, Inc. Substrate support assembly having a plasma resistant protective layer
US9685356B2 (en) 2012-12-11 2017-06-20 Applied Materials, Inc. Substrate support assembly having metal bonded protective layer
US8941969B2 (en) 2012-12-21 2015-01-27 Applied Materials, Inc. Single-body electrostatic chuck
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US9669653B2 (en) 2013-03-14 2017-06-06 Applied Materials, Inc. Electrostatic chuck refurbishment
US9887121B2 (en) 2013-04-26 2018-02-06 Applied Materials, Inc. Protective cover for electrostatic chuck
US9666466B2 (en) 2013-05-07 2017-05-30 Applied Materials, Inc. Electrostatic chuck having thermally isolated zones with minimal crosstalk
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
KR102276101B1 (ko) * 2013-12-27 2021-07-13 엔지케이 인슐레이터 엘티디 접합재 조성물, 질화알루미늄 접합체 및 그 제법
JP6819597B2 (ja) * 2015-09-07 2021-01-27 昭和電工マテリアルズ株式会社 接合体及び半導体装置
US10020218B2 (en) 2015-11-17 2018-07-10 Applied Materials, Inc. Substrate support assembly with deposited surface features
CN107527852B (zh) * 2016-06-20 2024-01-26 北京华卓精科科技股份有限公司 陶瓷静电卡盘装置及其制造工艺
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
CN111620701B (zh) 2020-03-27 2022-05-13 烟台睿瓷新材料技术有限公司 一种多层复合陶瓷盘及其制造方法
JP7388573B2 (ja) * 2020-10-21 2023-11-29 住友大阪セメント株式会社 セラミックス接合体、静電チャック装置、セラミックス接合体の製造方法
JP7718902B2 (ja) * 2021-08-06 2025-08-05 株式会社フェローテックマテリアルテクノロジーズ ウエハ支持体
JP7709872B2 (ja) * 2021-08-10 2025-07-17 日本特殊陶業株式会社 接合体、その製造方法、および電極埋設部材

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WO2005042436A1 (ja) 2005-05-12
EP1690845A1 (en) 2006-08-16
CN1898183A (zh) 2007-01-17
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