KR100694334B1 - 방직 섬유, 티슈, 및 직물의 마무리 가공 - Google Patents
방직 섬유, 티슈, 및 직물의 마무리 가공 Download PDFInfo
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- KR100694334B1 KR100694334B1 KR1020027012343A KR20027012343A KR100694334B1 KR 100694334 B1 KR100694334 B1 KR 100694334B1 KR 1020027012343 A KR1020027012343 A KR 1020027012343A KR 20027012343 A KR20027012343 A KR 20027012343A KR 100694334 B1 KR100694334 B1 KR 100694334B1
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Abstract
Description
초기값 | 3회 세척후(EN 26330에 따라) | |
분사 테스트 물 흡수 방수값 | 100% 9% 1'/5, 5'/5, 10'/5 | 100% 12% 1'/5, 5'/4, 10'/4 |
초기값 | 3회 세척후 | |
분사 테스트 물 흡수 방수값 | 100% 7% 1'/5, 5'/5, 10'/5 | 100% 9% 1'/5, 5'/5, 10'/5 |
초기값 | 3회 세척후 | |
분사 테스트 방수값 | 100% 1'/5, 5'/5, 10'/5 | 100% 1'/5, 5'/5, 10'/5 |
초기값 | 3회 세척후 | |
분사 테스트 방수값 방유값* | 100% 1'/5, 5'/5, 10'/5 6 | 100% 1'/5, 5'/5, 10'/5 6 |
초기값 | 3회 세척후 | |
분사 테스트 방수값 물 흡수 | 100% 1'/5, 5'/5, 10'/5 7% | 100% 1'/4, 5'/4, 10'/4 13% |
초기값 | 3회 세척후 | |
분사 테스트 방수값 물 흡수 | 100% 1'/5, 5'/5, 10'/5 3% | 100% 1'/5, 5'/5, 10'/5 8% |
초기값 | 3회 세척후 | |
분사 테스트 물 흡수 방수값 | 100% 6% 1'/5, 5'/5, 10'/5 | 100% 8% 1'/5, 5'/4, 10'/4 |
초기값 | 3회 세척후 | |
분사 테스트 물 흡수 방수값 | 100% 5% 1'/5, 5'/5, 10'/5 | 100% 7% 1'/5, 5'/5, 10'/5 |
Claims (36)
- 적어도 2개의 방수 또는 방유 마무리 가공 성분을 포함하는 방수 또는 방유 마무리 가공층에 있어서,제 1 성분은 1 또는 그 이상의 분산제를 포함하고 제 2 성분은 1 또는 그 이상의 분산된 상 또는 콜로이드를 포함하고, 분산제 및 분산된 상은 겔 상태로 존재하고, 상기 분산된 상의 콜로이드는 비등방성의 방식으로 상기 분산제내에 분배되어 상기 콜로이드는 마무리 가공층 및 주위 대기 사이에 상 경계층을 형성하는 상기 마무리 가공층의 상부 표면 영역에 집중되는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 1 항에 있어서,상기 마무리 가공층의 상부 표면은 상기 분산제와 비교할때 동일하거나 또는 증대된 방수성 또는 방유성을 갖는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 1 항에 있어서,상기 분산된 상은 상기 방수 마무리 가공 효과를 향상시키는 공간적인 배향으로 상기 마무리 가공층의 상부 표면에 집중되는 소수성 또는 친유성 콜로이드를 포함하는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 3 항에 있어서,상기 분산된 상은 1 또는 그 이상의 비극성, 방수 성분 또는 다음 그룹 중 어느것으로 부터 선택되는 그러한 화합물의 조합을 포함하는 것을 특징으로 하는 분산된 상;- 실리콘 오일, 지질 변성된 에스테르 및 높은 끓는점을 갖고 비극성 액체인 에테르;- 지방산 에스테르, C12 내지 C25 알킬 에테르 및 고체인 폴리컨덴스된 지방산 아마이드.
- 제 4 항에 있어서,상기 높은 끓는점을 갖고 비극성인 액체는 글리세롤 에스테르 또는 에테르 또는 소르비탄 에스테르 또는 에테르를 포함하는 것을 특징으로 하는 분산된 상.
- 제 1 항에 있어서,상기 분산된 상은 상기 마무리 가공층의 상부 표면에 방향성 배향을 가진 원주 형상의 구조를 형성하는 고체 입자를 포함하여 상기 표면의 미세조도가 "로터스" 효과를 발생시키는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 6 항에 있어서,상기 분산된 상은 1 또는 그 이상의 화합물 또는 다음 그룹으로부터 선택되는 화합물의 조합을 포함하는 것을 특징으로 하는 방수 또는 방유 마무리 가공층;- 0.1 및 50 ㎛ 사이의 입자 크기를 갖는 미분화된 왁스;- 지질 변성된 아미노알킬레이션 또는 폴리아마이드 산물인 왁스;- 5 내지 50 nm 사이의 입자 크기를 갖는 소수성 실리카 나노입자.
- 제 7 항에 있어서,상기 분산된 상은 폴리올레핀 및 지방 아마이드 왁스, 및 방수 실리카의 그룹의 미분화된 왁스를 포함하는 것을 특징으로 하는 분산된 상.
- 제 1 항에 있어서,상기 분산제는 1 또는 그 이상의 방수제 또는 방수제의 조합을 포함하는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 9 항에 있어서,지질 변성된, 비극성 아크릴레이트, 메타크릴레이트, 아이소시아네이트, 에폭시 유도체, 및 우레아 유도체의 그룹으로 부터 선택되는 방수제.
- 제 10 항에 있어서,상기 방수제는 모노머릭, 프리폴리머릭 또는 프리폴리컨덴스된 것을 특징으로 하는 방수제.
- 제 1 항에 있어서,상기 분산제는 폴리머릭 바인더를 포함하는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 12 항에 있어서,상기 바인더는 교차결합된, 프리폴리컨덴스된 포름알데하이드 수지 또는 그것들의 개별적인 성분, 또는 아크릴산 유도체, 메타크릴산 유도체, 아이소시아네이트, 폴리우레탄의 그룹으로 부터의 프리폴리머릭 화합물 또는 그것들의 개별적인 성분을 포함하는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 13 항에 있어서,상기 프리폴리머는 변성된 아크릴산 및 메타크릴산 모노머로부터 선택되는 것을 특징으로 하는 프리폴리머.
- 제 14 항에 있어서,상기 프리폴리머는 아크릴산 도데실 에스테르, 메타크릴산 도데실 에스테르, 터미널 터셔리 부틸 그룹을 갖는 아크릴산 및 메타크릴산 에스테르, 정적으로 변성 되고, 용융가능하고, 에멀젼 중합반응에 의해 교차결합 가능한 프리폴리머로 변환될 수 있는 트리메틸사일렌을 갖는 아크릴산 및 메타크릴산 에스테르의 그룹으로부터의 화합물을 포함하는 것을 특징으로 하는 프리폴리머.
- 제 13 항 내지 제 15 항 중 어느 하나에 있어서,상기 바인더는 다중 반응성 그룹을 함유하는 화합물을 포함하는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 16 항에 있어서,상기 다중 반응성 그룹을 함유하는 화합물은 폴리사카라이드, 글리세롤 및 젤라틴의 그룹으로부터 단독으로 또는 조합으로 선택되는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 제 1 항에 있어서,분산제 및 분산된 상의 겔 상태는 에너지 공급에 의해 적어도 부분적으로 가역적인 방식으로 졸 상태로 변환될 수 있는 것을 특징으로 하는 방수 또는 방유 마무리 가공층.
- 방직 섬유 또는 직물, 및 지지 재료상에 적용되는 전항들 중 어느것에 따른 방수 또는 방유 마무리 가공층을 포함하는 그룹으로부터 선택되는 지지 재료를 포 함하는 직물 제품.
- 제 19 항에 있어서,프라이머 층이 접착 및 방수 또는 방유 마무리 가공층의 결합을 개선하기 위해 상기 지지 재료 및 상기 방수 또는 방유 마무리 가공층 사이에 유도되는 것을 특징으로 하는 직물 제품.
- 제 20 항에 있어서,상기 직물 재료는 천연 재료를 포함하고 상기 프라이머 층은 상기 직물 재료에 관하여 교차 결합되고 수축하는 성분을 포함하는 것을 특징으로 하는 직물 제품.
- 제 20 항에 있어서,상기 지지 재료는 합성 및 재생 섬유, 티슈, 또는 직물을 포함하고, 상기 프라이머 층은 변성된 지지 재료 표면에 의해 형성되거나 또는 교차결합된 천연 또는 합성 하이드록실, 카르보닐, 아미노, 또는 치올 그룹을 포함하는 폴리머에 의해 형성되는 것을 특징으로 하는 직물 제품.
- 방수 또는 방유 마무리 가공층을 갖는 섬유, 티슈, 및 직물의 그룹으로부터 선택되는 직물 지지 재료상에 마무리 가공층을 적용하기 위한 방법에 있어서,제 1 단계에서는 제 1 항 내지 제 13 항 중 어느것에 따른 1 또는 그 이상의 분산제 및 분산된 상을 포함하는 분산이 상기 지지 재료에 적용되고, 상기 분산은 적용되는 동안 졸 상태로 존재하고, 이후 단계에서는 상기 분산은 겔 상태로 변환되는 것을 특징으로 하는 마무리 가공 방법.
- 제 23 항에 있어서,상기 마무리 가공층은 거의 5%의 건조로 건조되는 것을 특징으로 하는 마무리 가공 방법.
- 제 23 항에 있어서,상기 분산은 물 내 소수성 분산제의 물 내 오일(O/W) 에멀젼 및 그 안에서 상기 분산된 상의 뒤따르는 에멀젼화에 의해 준비되는 것을 특징으로 하는 마무리 가공 방법.
- 제 24 항에 있어서,상기 겔 상태는 에너지 공급에 의해 적어도 부분적으로 가역적인 방식으로 졸 상태로 변환될 수 있는 것을 특징으로 하는 마무리 가공 방법.
- 제 23 항에 있어서,상기 방수 또는 방유 마무리 가공층의 적용 전에 상기 지지 재료의 표면에는 방수 또는 방유 마무리 가공층의 접착을 개선하기 위한 프라이머 층이 제공되는 것을 특징으로 하는 마무리 가공 방법.
- 제 27 항에 있어서,반응성 그룹이 방수 또는 방유 마무리 가공층의 공유 결합을 위해 제공되고 이것은 프라이머 층을 통하여 상기 지지 재료에 직접적으로 또는 간접적으로 결합되는 것을 특징으로 하는 마무리 가공 방법.
- 제 27 항에 있어서,상기 지지 재료에는 무명 섬유로의 물의 침투를 막는 상기 프라이머 층을 형성하는 교차결합제를 포함하는 용액이 주입되고 이에 의해 섬유의 팽창을 최소화하는 직물 및 섬유의 그룹으로 부터 선택되는 무명 재료인 것을 특징으로 하는 마무리 가공 방법.
- 제 29 항에 있어서,상기 주입은 부분적으로 에테르화된 헥사메틸올 멜라민 또는 다이메틸올 에틸렌 우레아 유도체를 사용하여 수행되고 상기 주입된 지지 재료는 그후 건조되는 것을 특징으로 하는 마무리 가공 방법.
- 제 27 항에 있어서,상기 지지 재료는 합성 또는 섬유, 티슈, 및 직물의 그룹으로 부터 재생된 재료이고, 상기 지지 재료의 표면상에서는 하이드록실 또는 카르보닐 그룹이 결합된 폴리머가 표면 변성에 의해 생성되는 것을 특징으로 하는 마무리 가공 방법.
- 제 31 항에 있어서,상기 지지 재료는 폴리에스테르 재료이고 상기 표면 변성은 0.01 내지 1%의 부분적인 비누화반응, 바람직하게는 0.2 내지 0.4%의 부분적인 비누화반응인 것을 특징으로 하는 마무리 가공 방법.
- 제 27 항에 있어서,상기 지지 재료는 합성 또는 섬유, 티슈, 및 직물의 그룹으로 부터 재생된 재료이고, 반응성 그룹을 포함하는 폴리머는 상기 지지 재료에 적용되고 이어서 프라이머 층을 형성하기 위해 교차결합되고 여기서 간접적으로 상기 폴리머에 결합되는 하이드록실, 카르보닐, 아미노 및/또는 티올 그룹이 상기 지지 재료의 표면상에 생성되는 것을 특징으로 하는 마무리 가공 방법.
- 제 33 항에 있어서,상기 반응성 그룹을 포함하는 폴리머는 폴리사카라이드, 리그닌, 폴리비닐알콜의 그룹으로부터 선택되고, 상기 교차결합은 아이소시아네이트 및 α- 아밀레이션 산물의 그룹으로부터의 화합물에 의해 수행되는 것을 특징으로 하는 마무리 가 공 방법.
- 제 27 항에 있어서,상기 분산은 1 또는 그이상의 분산제, 1개의 분산된 상 및 1 또는 그 이상의 바인더를 포함하는 것을 특징으로 하는 마무리 가공 방법.
- 제 35 항에 있어서,적용되는 상기 분산의 준비를 위해 분산제 및 분산된 상을 포함하는 에멀젼이 수용액상 바인더를 포함하는 용액내로 에멀젼화되는 것을 특징으로 하는 마무리 가공 방법.
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CH00556/01A CH695946A5 (de) | 2000-04-04 | 2001-03-26 | Ausrüstung von textilen Fasern, Geweben und Flächengebilden. |
CH556/01 | 2001-03-26 |
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AT (1) | ATE331066T1 (ko) |
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2001
- 2001-03-26 CH CH00556/01A patent/CH695946A5/de not_active IP Right Cessation
- 2001-04-02 AU AU2001242211A patent/AU2001242211A1/en not_active Abandoned
- 2001-04-02 ES ES01914943T patent/ES2266172T3/es not_active Expired - Lifetime
- 2001-04-02 WO PCT/CH2001/000211 patent/WO2001075216A1/de active IP Right Grant
- 2001-04-02 DE DE50110256T patent/DE50110256D1/de not_active Expired - Lifetime
- 2001-04-02 AT AT01914943T patent/ATE331066T1/de active
- 2001-04-02 US US10/240,866 patent/US7056845B2/en not_active Expired - Lifetime
- 2001-04-02 JP JP2001573085A patent/JP2003529673A/ja active Pending
- 2001-04-02 PT PT01914943T patent/PT1268919E/pt unknown
- 2001-04-02 EP EP01914943A patent/EP1268919B1/de not_active Expired - Lifetime
- 2001-04-02 DK DK01914943T patent/DK1268919T3/da active
- 2001-04-02 KR KR1020027012343A patent/KR100694334B1/ko active IP Right Grant
- 2001-04-12 TW TW90108845A patent/TWI238213B/zh not_active IP Right Cessation
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- 2004-09-30 US US10/953,925 patent/US20050066448A1/en not_active Abandoned
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PT1268919E (pt) | 2006-10-31 |
JP2008069507A (ja) | 2008-03-27 |
WO2001075216A1 (de) | 2001-10-11 |
US7056845B2 (en) | 2006-06-06 |
US20030100234A1 (en) | 2003-05-29 |
CH695946A5 (de) | 2006-10-31 |
JP2003529673A (ja) | 2003-10-07 |
DK1268919T3 (da) | 2006-10-23 |
KR20020086930A (ko) | 2002-11-20 |
TWI238213B (en) | 2005-08-21 |
JP5236919B2 (ja) | 2013-07-17 |
DE50110256D1 (de) | 2006-08-03 |
US20050066448A1 (en) | 2005-03-31 |
EP1268919A1 (de) | 2003-01-02 |
AU2001242211A1 (en) | 2001-10-15 |
ES2266172T3 (es) | 2007-03-01 |
EP1268919B1 (de) | 2006-06-21 |
US20090137171A1 (en) | 2009-05-28 |
ATE331066T1 (de) | 2006-07-15 |
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