KR100659031B1 - 저염소와 저루틸 함유량을 갖는 초미립자 산화 티타늄, 및그 제조 방법 - Google Patents
저염소와 저루틸 함유량을 갖는 초미립자 산화 티타늄, 및그 제조 방법 Download PDFInfo
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- KR100659031B1 KR100659031B1 KR1020047013900A KR20047013900A KR100659031B1 KR 100659031 B1 KR100659031 B1 KR 100659031B1 KR 1020047013900 A KR1020047013900 A KR 1020047013900A KR 20047013900 A KR20047013900 A KR 20047013900A KR 100659031 B1 KR100659031 B1 KR 100659031B1
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 437
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims abstract description 335
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 239000000460 chlorine Substances 0.000 title claims description 127
- 229910052801 chlorine Inorganic materials 0.000 title claims description 127
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims description 125
- 238000000034 method Methods 0.000 claims abstract description 139
- 238000006243 chemical reaction Methods 0.000 claims abstract description 52
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 38
- 150000002367 halogens Chemical class 0.000 claims abstract description 38
- 239000007789 gas Substances 0.000 claims description 110
- 239000002245 particle Substances 0.000 claims description 109
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 71
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical group Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 43
- 239000000843 powder Substances 0.000 claims description 36
- 230000001590 oxidative effect Effects 0.000 claims description 33
- -1 titanium halide Chemical class 0.000 claims description 28
- 239000012071 phase Substances 0.000 claims description 25
- 239000010936 titanium Substances 0.000 claims description 22
- 229910052719 titanium Inorganic materials 0.000 claims description 22
- 230000001186 cumulative effect Effects 0.000 claims description 15
- 238000005695 dehalogenation reaction Methods 0.000 claims description 15
- 239000011941 photocatalyst Substances 0.000 claims description 14
- 239000002002 slurry Substances 0.000 claims description 12
- 239000007791 liquid phase Substances 0.000 claims description 11
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims description 10
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 9
- 229910001882 dioxygen Inorganic materials 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 7
- 239000011261 inert gas Substances 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 6
- 239000000725 suspension Substances 0.000 claims description 6
- 238000000108 ultra-filtration Methods 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 5
- 230000000996 additive effect Effects 0.000 claims description 5
- 229920002379 silicone rubber Polymers 0.000 claims description 5
- 239000004945 silicone rubber Substances 0.000 claims description 4
- 238000001223 reverse osmosis Methods 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 abstract description 6
- 238000003921 particle size analysis Methods 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 18
- 238000006298 dechlorination reaction Methods 0.000 description 18
- 239000001301 oxygen Substances 0.000 description 18
- 229910052760 oxygen Inorganic materials 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 238000007415 particle size distribution analysis Methods 0.000 description 7
- 239000011882 ultra-fine particle Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000007865 diluting Methods 0.000 description 6
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 description 6
- 238000000149 argon plasma sintering Methods 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 230000001699 photocatalysis Effects 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000002537 cosmetic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000003809 water extraction Methods 0.000 description 1
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- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
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- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
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Abstract
Description
실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | 비교예 2 | 비교예 3 | 비교예 4 | |
루틸 함유량 % | 1 | 3 | 1 | 11 | 2 | 12 | 1 |
BET 비표면적 m2/g | 22 | 65 | 97 | 19 | 74 | 44 | 212 |
전체 염소 질량ppm | 1,000 | 1,100 | 2,000 | 300 | 3,900 | 1,300 | <10 |
표면염소함유량 % | 90 | 91 | 90 | 100 | 72 | 92 | - |
D90 ㎛ | 1.1 | 1.9 | 2.2 | 0.8 | 3.6 | 1.2 | 26.1 |
Fe 질량 ppm | <10 | <10 | <10 | <10 | <10 | <10 | 50 |
Al 질량 ppm | <10 | <10 | <10 | <10 | <10 | <10 | <10 |
Si 질량 ppm | <20 | <20 | <20 | <20 | <20 | <20 | <20 |
S 질량 ppm | <10 | <10 | <10 | <10 | <10 | <10 | 670 |
Claims (36)
- 할로겐화 티타늄 함유 가스와 산화성 가스 간의 반응을 통하여 생성된 산화 티타늄으로서,상기 산화 티타늄의 루틸 함유량은 5% 이하이고, BET 원-포인트법으로 측정되는 상기 산화 티타늄의 비표면적; 즉, B(m2/g)과, 상기 산화 티타늄의 염소 함유량; 즉, C(질량 ppm)는 C≤650e0.02B의 관계를 만족하며, 1질량% 양의 산화 티타늄을 함유하는 수용성 현탁액이 30분 동안 20℃에서 유지되었을 때, 상기 산화 티타늄에서 액상으로 이행되는 할로겐의 양은 상기 산화 티타늄에 함유된 할로겐의 전체 양에 대해 80 질량% 이상인 것을 특징으로 산화 티타늄.
- 제 1 항에 있어서,상기 산화 티타늄에서 액상으로 이행되는 할로겐의 양은 상기 산화 티타늄에 함유된 할로겐의 전체 양에 대해 90 질량% 이상인 것을 특징으로 산화 티타늄.
- 제 1 항 또는 제 2 항에 있어서,100 질량 ppm 이하의 Fe, 100 질량 ppm 이하의 Al, 100 질량 ppm 이하의 Si, 및 100 질량 ppm 이하의 S를 포함하는 것을 특징으로 하는 산화 티타늄.
- 제 1 항 또는 제 2 항에 있어서,10 내지 200m2/g의 비표면적을 갖는 것을 특징으로 하는 산화 티타늄.
- 제 1 항 또는 제 2 항에 있어서,주상으로서 아나타제를 포함하는 것을 특징으로 하는 산화 티타늄.
- 제 5 항에 있어서,90% 이상의 아나타제 함유량을 갖는 것을 특징으로 하는 산화 티타늄.
- 제 1 항 또는 제 2 항에 있어서,주상으로서 브루카이트를 포함하는 것을 특징으로 하는 산화 티타늄.
- 제 7 항에 있어서,90% 이상의 브루카이트 함유량을 갖는 것을 특징으로 하는 산화 티타늄.
- 제 1 항 또는 제 2 항에 있어서,레이저 회절식 입자 크기 분석계를 사용하여 측정되는 2.5㎛ 이하의 90% 누적 질량 입자 크기를 갖는 것을 특징으로 하는 산화 티타늄.
- 제 1 항 또는 제 2 항에 있어서,상기 할로겐화 티타늄은 4염화 티타늄이고 상기 할로겐은 염소인 것을 특징으로 하는 산화 티타늄.
- 할로겐화 티타늄 함유 가스와 산화성 가스를 반응시키는 공정을 포함하는 제1항 또는 제2항에 기재된 산화 티타늄을 기상법으로 제조하는 방법으로서,상기 할로겐화 티타늄 함유 가스와 상기 산화성 가스가 반응기에 도입되어 반응이 진행되고;상기 할로겐화 티타늄 함유가스는 할로겐화 티타늄 1몰에 대하여 비활성 가스를 0.1 내지 20몰의 비율로 함유하는 원료가스 혼합물이고;상기 산화성 가스는 상기 할로겐화 티타늄 1몰에 대해 1 내지 30몰의 비율로 사용되고;상기 반응기의 내부 온도는 800℃ 이상 1100℃ 미만인 것을 특징으로 하는 산화티타늄 제조 방법.
- 제 11 항에 있어서,800℃ 이상 1,100℃ 미만의 온도 범위에서 상기 반응기내의 할로겐화 티타늄 함유 가스와 산화성 가스의 체류 시간은 0.1초 이하인 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 11 항에 있어서,상기 할로겐화 티타늄 함유 가스와 산화성 가스 각각은 상기 반응기로 도입되기 전에 600℃ 이상 1,100℃ 미만의 온도에서 예열되는 것을 특징으로 하는 산화 티타늄 제조 방법.
- 삭제
- 제 11 항에 있어서,상기 산화성 가스는 수증기를 포함하는 산소 가스인 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 15 항에 있어서,상기 산화성 가스는 산소 가스 1몰에 대하여 수증기 0.1몰 이상을 포함하는 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 11 항에 있어서,상기 할로겐화 티타늄은 4염화 티타늄인 것을 특징으로 하는 산화 티타늄 제조 방법.
- 산화티타늄이 200℃ 내지 500℃로 가열되는 건식 탈할로겐화법에 의하여 제11항 기재의 방법으로 제조된 산화 티타늄을 탈할로겐화하는 공정을 포함하는 것을 특징으로 하는 산화 티타늄 제조방법.
- 삭제
- 제 18 항에 있어서,상기 건식 탈할로겐화법에서, 수증기 함유 가스가 200 내지 1,000℃로 가열되어, 산화 티타늄과 접촉되는 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 20 항에 있어서,상기 수증기 함유 가스는 0.1 부피% 이상의 수증기를 함유하는 공기인 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 20 항에 있어서,상기 수증기와 산화 티타늄의 질량비는 0.01 이상인 것을 특징으로 하는 산화 티타늄 제조 방법.
- 산화 티타늄이 물에 현탁되고, 액상으로 이행되는 할로겐이 얻어진 현탁액의 계외로 배출되는 습식 탈할로겐화법에 의하여 제11항 기재의 방법으로 제조된 산화 티타늄을 탈할로겐화하여, 산화 티타늄을 함유하는 슬러리를 얻는 공정을 포함하는 것을 특징으로 하는 산화 티타늄 제조방법.
- 삭제
- 제 23 항에 있어서,상기 습식 탈할로겐화법에서, 염소의 분리는 한외 여과막을 사용하여 수행되는 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 23 항에 있어서,상기 습식 탈할로겐화법에서, 염소의 분리는 역삼투막을 사용하여 수행되는 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 23 항에 있어서,상기 습식 탈할로겐화법에서, 염화물의 분리는 필터 프레스를 사용하여 수행되는 것을 특징으로 하는 산화 티타늄 제조 방법.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 분말.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 슬러리.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 조성물.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 광촉매 재료.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 습식 태양 전지용 재료.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 유전체 원료.
- 제 11 항 기재의 방법으로 제조된 산화 티타늄을 포함하는 것을 특징으로 하는 실리콘 고무 첨가제.
- 산화 티타늄의 루틸 함유량은 5% 이하이며, 상기 산화 티타늄의 BET 원-포인 트법으로 측정되는 비표면적은 10 내지 200 m2/g이며, 상기 산화 티타늄의 레이저 회절식 입자 크기 분석계로 측정되는 90% 누적 질량 입자 크기는 2.5㎛ 이하이고, BET 원-포인트법으로 측정되는 상기 산화 티타늄의 비표면적; 즉, B(m2/g)과, 상기 산화 티타늄의 할로겐 함유량; 즉, Ci(질량 ppm)는 0 < Ci ≤ 650ke0.02B 의 관계를 만족하며, 여기서 k는 0.20인 것을 특징으로 산화 티타늄.
- 산화 티타늄의 루틸 함유량은 5% 이하이며, 상기 산화 티타늄의 BET 원-포인트법으로 측정되는 비표면적은 10 내지 200 m2/g이며, 상기 산화 티타늄의 레이저 회절식 입자 크기 분석계로 측정되는 90% 누적 질량 입자 크기는 2.5㎛ 이하이고, BET 원-포인트법으로 측정되는 상기 산화 티타늄의 비표면적; 즉, B(m2/g)과, 상기 산화 티타늄의 할로겐 함유량; 즉, Ci(질량 ppm)는 10 < Ci ≤ 650ke0.02B의 관계를 만족하며, 여기서 k는 0.15인 것을 특징으로 산화 티타늄.
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PCT/JP2003/002673 WO2003074426A1 (en) | 2002-03-06 | 2003-03-06 | Ultrafine particulate titanium oxide with low chlorine and low rutile content, and production process thereof |
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US7119039B2 (en) * | 2003-03-24 | 2006-10-10 | Carbo Ceramics Inc. | Titanium dioxide scouring media and method of production |
JP4107499B2 (ja) * | 2004-03-17 | 2008-06-25 | 日本アエロジル株式会社 | 酸化チタン粒子の製造方法 |
WO2005092797A1 (ja) * | 2004-03-26 | 2005-10-06 | Toho Titanium Co., Ltd. | アナターゼ型酸化チタン粉末およびその製造方法 |
US20050253310A1 (en) * | 2004-05-17 | 2005-11-17 | Osada Giken Co., Ltd. | Method for manufacturing shaped titanium oxide |
US20080260625A1 (en) | 2004-08-11 | 2008-10-23 | Showa Denko K.K. | Fine Particulate Titanium Dioxide, and Production Process and Use Thereof |
KR100854984B1 (ko) * | 2004-08-11 | 2008-08-28 | 쇼와 덴코 가부시키가이샤 | 미립자 이산화티탄 및 그의 제조방법과 용도 |
TWI314919B (en) * | 2005-02-28 | 2009-09-21 | Showa Denko Kk | Fine particulate titanium dioxide, and production process and uses thereof |
US20080075654A1 (en) * | 2006-09-21 | 2008-03-27 | Jamison Matthew E | Titanium dioxide process |
US8114377B2 (en) * | 2006-11-02 | 2012-02-14 | E.I. Du Pont De Nemours And Company | Process for producing titanium dioxide particles having reduced chlorides |
US8178074B2 (en) * | 2008-08-29 | 2012-05-15 | Showa Denko K.K. | Method for producing titanium oxide particles |
US9617166B2 (en) | 2009-08-24 | 2017-04-11 | National University Corporation Hokkaido University | Metal oxide particle production method and production device |
EP2527299B1 (en) * | 2010-08-02 | 2016-11-30 | Showa Denko K.K. | Titanium oxide sol and process for producing same, ultrafine particulate titanium oxide, process for producing same, and uses of same |
US8663440B2 (en) * | 2010-09-28 | 2014-03-04 | Jx Nippon Mining & Metals Corporation | Titanium target for sputtering |
JP5274691B1 (ja) | 2012-05-30 | 2013-08-28 | 株式会社フジクラ | 色素増感太陽電池 |
KR101621831B1 (ko) * | 2013-09-05 | 2016-05-17 | 쇼와 덴코 가부시키가이샤 | 초미립자 이산화티타늄 및 그 제조 방법 |
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US2240343A (en) * | 1937-11-26 | 1941-04-29 | Pittsburgh Plate Glass Co | Material treatment |
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US2957753A (en) | 1958-11-05 | 1960-10-25 | American Cyanamid Co | Titanium dioxide from titanium tetrachloride |
JPH03252315A (ja) | 1990-02-27 | 1991-11-11 | Osaka Titanium Co Ltd | 高純度酸化チタンの製造方法 |
JP3170094B2 (ja) | 1993-04-08 | 2001-05-28 | 株式会社トクヤマ | 酸化チタンの製造方法 |
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US5698177A (en) * | 1994-08-31 | 1997-12-16 | University Of Cincinnati | Process for producing ceramic powders, especially titanium dioxide useful as a photocatalyst |
JP3656355B2 (ja) * | 1997-03-10 | 2005-06-08 | 昭和電工株式会社 | 塩素含有量の少ない微粒子酸化チタン粉末及びその製造法 |
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WO2003074426A1 (en) | 2003-09-12 |
EP1483205A4 (en) | 2009-03-04 |
CN1703372A (zh) | 2005-11-30 |
KR20040093101A (ko) | 2004-11-04 |
EP1483205B1 (en) | 2012-12-12 |
US20050076811A1 (en) | 2005-04-14 |
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