KR100652498B1 - 투영 대물렌즈 - Google Patents

투영 대물렌즈 Download PDF

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Publication number
KR100652498B1
KR100652498B1 KR1019990039823A KR19990039823A KR100652498B1 KR 100652498 B1 KR100652498 B1 KR 100652498B1 KR 1019990039823 A KR1019990039823 A KR 1019990039823A KR 19990039823 A KR19990039823 A KR 19990039823A KR 100652498 B1 KR100652498 B1 KR 100652498B1
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KR
South Korea
Prior art keywords
lens
lenses
aperture
projection objective
lens group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1019990039823A
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English (en)
Korean (ko)
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KR20000034929A (ko
Inventor
슈스터칼-하인츠
Original Assignee
칼 짜이스 에스엠테 아게
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Application filed by 칼 짜이스 에스엠테 아게 filed Critical 칼 짜이스 에스엠테 아게
Publication of KR20000034929A publication Critical patent/KR20000034929A/ko
Application granted granted Critical
Publication of KR100652498B1 publication Critical patent/KR100652498B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Viewfinders (AREA)
KR1019990039823A 1998-11-30 1999-09-16 투영 대물렌즈 Expired - Fee Related KR100652498B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19855157A DE19855157A1 (de) 1998-11-30 1998-11-30 Projektionsobjektiv
DE19855157.6 1999-09-04

Publications (2)

Publication Number Publication Date
KR20000034929A KR20000034929A (ko) 2000-06-26
KR100652498B1 true KR100652498B1 (ko) 2006-11-30

Family

ID=7889476

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990039823A Expired - Fee Related KR100652498B1 (ko) 1998-11-30 1999-09-16 투영 대물렌즈

Country Status (6)

Country Link
US (1) US6522484B1 (https=)
EP (1) EP1006387A3 (https=)
JP (1) JP2000171699A (https=)
KR (1) KR100652498B1 (https=)
DE (1) DE19855157A1 (https=)
TW (1) TW442669B (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323653A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
DE10138847A1 (de) * 2001-08-15 2003-02-27 Zeiss Carl Blende für eine Integratoreinheit
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
WO2003075096A2 (de) * 2002-03-01 2003-09-12 Carl Zeiss Smt Ag Refraktives projektionsobjektiv
DE10221386A1 (de) 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
DE10240002A1 (de) 2002-08-27 2004-03-11 Carl Zeiss Semiconductor Manufacturing Technologies Ag Optisches Teilsystem insbesondere für eine Projektionsbelichtungsanlage mit mindestens einem in mindestens zwei Stellungen verbringbaren optischen Element
JP2006511070A (ja) 2002-12-19 2006-03-30 カール・ツァイス・エスエムティー・アーゲー 効率的な集光器光学系を有する照明システム
CN1745457A (zh) * 2003-03-17 2006-03-08 株式会社尼康 投影光学系统、曝光装置以及曝光方法
US7932020B2 (en) * 2003-07-10 2011-04-26 Takumi Technology Corporation Contact or proximity printing using a magnified mask image
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6961186B2 (en) * 2003-09-26 2005-11-01 Takumi Technology Corp. Contact printing using a magnified mask image
US7055127B2 (en) * 2003-10-27 2006-05-30 Takumi Technology Corp. Mask data preparation
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP2628864B1 (de) 2012-02-14 2017-02-01 Heinrich Schulte GmbH + Co. KG Spül- und Abdrückvorrichtung für eine Anschlussarmatur
CN109581622B (zh) * 2017-09-29 2020-12-04 上海微电子装备（集团）股份有限公司 一种投影物镜

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06313845A (ja) * 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系
JPH07140384A (ja) * 1993-11-15 1995-06-02 Nikon Corp 投影光学系及び投影露光装置
JPH08190047A (ja) * 1995-01-06 1996-07-23 Nikon Corp 投影光学系
US5805344A (en) * 1994-11-10 1998-09-08 Nikon Corporation Projection optical system and projection exposure apparatus
US6522484B1 (en) * 1998-11-30 2003-02-18 Carl-Zeiss-Stiftung Projection objective

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5469299A (en) * 1990-05-15 1995-11-21 Olympus Optical Co., Ltd. Objective lens system
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JP3624973B2 (ja) 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
JP3750123B2 (ja) * 1996-04-25 2006-03-01 株式会社ニコン 投影光学系
JPH1048517A (ja) * 1996-08-07 1998-02-20 Nikon Corp 投影光学系
JP3864399B2 (ja) * 1996-08-08 2006-12-27 株式会社ニコン 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
US5852490A (en) * 1996-09-30 1998-12-22 Nikon Corporation Projection exposure method and apparatus
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
DE19653983A1 (de) * 1996-12-21 1998-06-25 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06313845A (ja) * 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系
JPH07140384A (ja) * 1993-11-15 1995-06-02 Nikon Corp 投影光学系及び投影露光装置
US5805344A (en) * 1994-11-10 1998-09-08 Nikon Corporation Projection optical system and projection exposure apparatus
JPH08190047A (ja) * 1995-01-06 1996-07-23 Nikon Corp 投影光学系
US6522484B1 (en) * 1998-11-30 2003-02-18 Carl-Zeiss-Stiftung Projection objective

Also Published As

Publication number Publication date
JP2000171699A (ja) 2000-06-23
KR20000034929A (ko) 2000-06-26
EP1006387A3 (de) 2002-05-02
TW442669B (en) 2001-06-23
US6522484B1 (en) 2003-02-18
DE19855157A1 (de) 2000-05-31
EP1006387A2 (de) 2000-06-07

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