KR100633460B1 - 반도체 디바이스의 검사방법 - Google Patents

반도체 디바이스의 검사방법 Download PDF

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Publication number
KR100633460B1
KR100633460B1 KR1020040054978A KR20040054978A KR100633460B1 KR 100633460 B1 KR100633460 B1 KR 100633460B1 KR 1020040054978 A KR1020040054978 A KR 1020040054978A KR 20040054978 A KR20040054978 A KR 20040054978A KR 100633460 B1 KR100633460 B1 KR 100633460B1
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KR
South Korea
Prior art keywords
wafer
current
laser diode
change
diode chip
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Expired - Fee Related
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KR1020040054978A
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English (en)
Korean (ko)
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KR20050008530A (ko
Inventor
시바시게미츠
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20050008530A publication Critical patent/KR20050008530A/ko
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Publication of KR100633460B1 publication Critical patent/KR100633460B1/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Semiconductor Lasers (AREA)
KR1020040054978A 2003-07-15 2004-07-15 반도체 디바이스의 검사방법 Expired - Fee Related KR100633460B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00274511 2003-07-15
JP2003274511A JP4136832B2 (ja) 2003-07-15 2003-07-15 半導体レーザーダイオードチップの検査方法および検査装置

Publications (2)

Publication Number Publication Date
KR20050008530A KR20050008530A (ko) 2005-01-21
KR100633460B1 true KR100633460B1 (ko) 2006-10-16

Family

ID=33475552

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040054978A Expired - Fee Related KR100633460B1 (ko) 2003-07-15 2004-07-15 반도체 디바이스의 검사방법

Country Status (6)

Country Link
US (2) US7015051B2 (https=)
EP (1) EP1498727B1 (https=)
JP (1) JP4136832B2 (https=)
KR (1) KR100633460B1 (https=)
DE (1) DE602004020550D1 (https=)
TW (1) TWI245356B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101009455B1 (ko) * 2007-06-29 2011-01-19 르네사스 일렉트로닉스 가부시키가이샤 고장해석방법 및 고장해석장치

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6898138B2 (en) * 2002-08-29 2005-05-24 Micron Technology, Inc. Method of reducing variable retention characteristics in DRAM cells
JP4334927B2 (ja) * 2003-06-27 2009-09-30 キヤノン株式会社 半導体レーザーダイオードチップの検査方法および検査装置
KR100688551B1 (ko) 2005-06-07 2007-03-02 삼성전자주식회사 인터록기능을 구비한 반도체 웨이퍼 마킹장치 및 이를이용한 반도체 웨이퍼 마킹방법
JP4363368B2 (ja) * 2005-06-13 2009-11-11 住友電気工業株式会社 化合物半導体部材のダメージ評価方法、及び化合物半導体部材の製造方法
JP2007081197A (ja) * 2005-09-15 2007-03-29 Sony Corp 半導体レーザおよびその製造方法
JP4694970B2 (ja) * 2006-01-16 2011-06-08 三洋電機株式会社 半導体素子解析方法
FR2902926B1 (fr) * 2006-06-22 2008-10-24 Commissariat Energie Atomique Procede et dispositif de suivi d'un traitement thermique d'un substrat microtechnologique.
KR100827819B1 (ko) * 2007-02-21 2008-05-07 전북대학교산학협력단 반도체 나노물질의 캐리어 타입 측정 시스템 및 반도체나노물질의 캐리어 타입의 측정 방법
JP4374552B2 (ja) * 2007-04-12 2009-12-02 ソニー株式会社 基板の製造方法および基板製造システム、並びに表示装置の製造方法
US7919973B2 (en) * 2007-06-22 2011-04-05 Microchip Technology Incorporated Method and apparatus for monitoring via's in a semiconductor fab
JP6137536B2 (ja) * 2013-04-26 2017-05-31 日本電産リード株式会社 基板検査装置、及び基板検査方法
DE102016008509A1 (de) * 2016-07-13 2018-01-18 Siltectra Gmbh Laserkonditionierung von Festkörpern mit Vorwissen aus vorherigen Bearbeitungsschritten
CN110031188B (zh) * 2019-03-29 2021-08-27 上海华岭集成电路技术股份有限公司 集成电路光学芯片光圈测试方法
JP7092089B2 (ja) * 2019-04-10 2022-06-28 株式会社Sumco 半導体製品の導電型判別装置および導電型判別方法
JP2022191643A (ja) * 2021-06-16 2022-12-28 住友電気工業株式会社 面発光レーザの製造方法、面発光レーザの検査方法及び面発光レーザの検査装置
CN118518676A (zh) * 2024-07-09 2024-08-20 深圳市鹏乐智能系统有限公司 基于人工智能的led芯片缺陷检测方法及系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5422498A (en) * 1993-04-13 1995-06-06 Nec Corporation Apparatus for diagnosing interconnections of semiconductor integrated circuits
US5708371A (en) * 1995-03-16 1998-01-13 Mitsubishi Denki Kabushiki Kaisha Scanning photoinduced current analyzer capable of detecting photoinduced current in nonbiased specimen
US5952837A (en) * 1995-07-18 1999-09-14 Mitsubishi Denki Kabushiki Kaisha Scanning photoinduced current analyzer capable of detecting photoinduced current in nonbiased specimen
DE19725679A1 (de) 1997-06-18 1999-01-28 Innomess Elektronik Gmbh Verfahren und Vorrichtung zur Bestimmung der elektrischen Inhomogenität von Halbleitern
EP0990918B1 (en) * 1998-09-28 2009-01-21 NEC Electronics Corporation Device and method for nondestructive inspection on semiconductor device
JP4334927B2 (ja) 2003-06-27 2009-09-30 キヤノン株式会社 半導体レーザーダイオードチップの検査方法および検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101009455B1 (ko) * 2007-06-29 2011-01-19 르네사스 일렉트로닉스 가부시키가이샤 고장해석방법 및 고장해석장치

Also Published As

Publication number Publication date
US20060079058A1 (en) 2006-04-13
US20050012923A1 (en) 2005-01-20
JP4136832B2 (ja) 2008-08-20
EP1498727B1 (en) 2009-04-15
DE602004020550D1 (de) 2009-05-28
EP1498727A1 (en) 2005-01-19
US7015051B2 (en) 2006-03-21
JP2005039054A (ja) 2005-02-10
US7332362B2 (en) 2008-02-19
TWI245356B (en) 2005-12-11
TW200504910A (en) 2005-02-01
KR20050008530A (ko) 2005-01-21

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