DE602004020550D1 - Verfahren zur Untersuchung von Halbleitern - Google Patents

Verfahren zur Untersuchung von Halbleitern

Info

Publication number
DE602004020550D1
DE602004020550D1 DE602004020550T DE602004020550T DE602004020550D1 DE 602004020550 D1 DE602004020550 D1 DE 602004020550D1 DE 602004020550 T DE602004020550 T DE 602004020550T DE 602004020550 T DE602004020550 T DE 602004020550T DE 602004020550 D1 DE602004020550 D1 DE 602004020550D1
Authority
DE
Germany
Prior art keywords
studying
semiconductors
studying semiconductors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004020550T
Other languages
English (en)
Inventor
Shigemitsu Shiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE602004020550D1 publication Critical patent/DE602004020550D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
DE602004020550T 2003-07-15 2004-07-05 Verfahren zur Untersuchung von Halbleitern Active DE602004020550D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003274511A JP4136832B2 (ja) 2003-07-15 2003-07-15 半導体レーザーダイオードチップの検査方法および検査装置

Publications (1)

Publication Number Publication Date
DE602004020550D1 true DE602004020550D1 (de) 2009-05-28

Family

ID=33475552

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004020550T Active DE602004020550D1 (de) 2003-07-15 2004-07-05 Verfahren zur Untersuchung von Halbleitern

Country Status (6)

Country Link
US (2) US7015051B2 (de)
EP (1) EP1498727B1 (de)
JP (1) JP4136832B2 (de)
KR (1) KR100633460B1 (de)
DE (1) DE602004020550D1 (de)
TW (1) TWI245356B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6898138B2 (en) * 2002-08-29 2005-05-24 Micron Technology, Inc. Method of reducing variable retention characteristics in DRAM cells
JP4334927B2 (ja) * 2003-06-27 2009-09-30 キヤノン株式会社 半導体レーザーダイオードチップの検査方法および検査装置
KR100688551B1 (ko) 2005-06-07 2007-03-02 삼성전자주식회사 인터록기능을 구비한 반도체 웨이퍼 마킹장치 및 이를이용한 반도체 웨이퍼 마킹방법
JP4363368B2 (ja) * 2005-06-13 2009-11-11 住友電気工業株式会社 化合物半導体部材のダメージ評価方法、及び化合物半導体部材の製造方法
JP2007081197A (ja) * 2005-09-15 2007-03-29 Sony Corp 半導体レーザおよびその製造方法
JP4694970B2 (ja) * 2006-01-16 2011-06-08 三洋電機株式会社 半導体素子解析方法
FR2902926B1 (fr) * 2006-06-22 2008-10-24 Commissariat Energie Atomique Procede et dispositif de suivi d'un traitement thermique d'un substrat microtechnologique.
KR100827819B1 (ko) * 2007-02-21 2008-05-07 전북대학교산학협력단 반도체 나노물질의 캐리어 타입 측정 시스템 및 반도체나노물질의 캐리어 타입의 측정 방법
JP4374552B2 (ja) * 2007-04-12 2009-12-02 ソニー株式会社 基板の製造方法および基板製造システム、並びに表示装置の製造方法
US7919973B2 (en) * 2007-06-22 2011-04-05 Microchip Technology Incorporated Method and apparatus for monitoring via's in a semiconductor fab
JP2009008626A (ja) 2007-06-29 2009-01-15 Nec Electronics Corp 故障解析方法及び故障解析装置
JP6137536B2 (ja) * 2013-04-26 2017-05-31 日本電産リード株式会社 基板検査装置、及び基板検査方法
DE102016008509A1 (de) * 2016-07-13 2018-01-18 Siltectra Gmbh Laserkonditionierung von Festkörpern mit Vorwissen aus vorherigen Bearbeitungsschritten
CN110031188B (zh) * 2019-03-29 2021-08-27 上海华岭集成电路技术股份有限公司 集成电路光学芯片光圈测试方法
JP7092089B2 (ja) * 2019-04-10 2022-06-28 株式会社Sumco 半導体製品の導電型判別装置および導電型判別方法
JP2022191643A (ja) * 2021-06-16 2022-12-28 住友電気工業株式会社 面発光レーザの製造方法、面発光レーザの検査方法及び面発光レーザの検査装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5422498A (en) * 1993-04-13 1995-06-06 Nec Corporation Apparatus for diagnosing interconnections of semiconductor integrated circuits
US5708371A (en) * 1995-03-16 1998-01-13 Mitsubishi Denki Kabushiki Kaisha Scanning photoinduced current analyzer capable of detecting photoinduced current in nonbiased specimen
US5952837A (en) * 1995-07-18 1999-09-14 Mitsubishi Denki Kabushiki Kaisha Scanning photoinduced current analyzer capable of detecting photoinduced current in nonbiased specimen
DE19725679A1 (de) 1997-06-18 1999-01-28 Innomess Elektronik Gmbh Verfahren und Vorrichtung zur Bestimmung der elektrischen Inhomogenität von Halbleitern
DE69940335D1 (de) * 1998-09-28 2009-03-12 Nec Electronics Corp Vorrichtung und Verfahren zum zerstörungsfreien Prüfen einer Halbleiteranordnung
JP4334927B2 (ja) * 2003-06-27 2009-09-30 キヤノン株式会社 半導体レーザーダイオードチップの検査方法および検査装置

Also Published As

Publication number Publication date
TW200504910A (en) 2005-02-01
TWI245356B (en) 2005-12-11
KR20050008530A (ko) 2005-01-21
JP2005039054A (ja) 2005-02-10
JP4136832B2 (ja) 2008-08-20
US20060079058A1 (en) 2006-04-13
US7332362B2 (en) 2008-02-19
US20050012923A1 (en) 2005-01-20
US7015051B2 (en) 2006-03-21
EP1498727B1 (de) 2009-04-15
KR100633460B1 (ko) 2006-10-16
EP1498727A1 (de) 2005-01-19

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