KR100456436B1 - 조명장치 - Google Patents

조명장치 Download PDF

Info

Publication number
KR100456436B1
KR100456436B1 KR10-2001-0026978A KR20010026978A KR100456436B1 KR 100456436 B1 KR100456436 B1 KR 100456436B1 KR 20010026978 A KR20010026978 A KR 20010026978A KR 100456436 B1 KR100456436 B1 KR 100456436B1
Authority
KR
South Korea
Prior art keywords
light
optical means
wafer
optical
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR10-2001-0026978A
Other languages
English (en)
Korean (ko)
Other versions
KR20010105250A (ko
Inventor
카와시마하루나
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20010105250A publication Critical patent/KR20010105250A/ko
Application granted granted Critical
Publication of KR100456436B1 publication Critical patent/KR100456436B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
KR10-2001-0026978A 2000-05-18 2001-05-17 조명장치 Expired - Fee Related KR100456436B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000146365A JP2001326171A (ja) 2000-05-18 2000-05-18 照明装置
JP2000-146365 2000-05-18

Publications (2)

Publication Number Publication Date
KR20010105250A KR20010105250A (ko) 2001-11-28
KR100456436B1 true KR100456436B1 (ko) 2004-11-10

Family

ID=18652738

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-0026978A Expired - Fee Related KR100456436B1 (ko) 2000-05-18 2001-05-17 조명장치

Country Status (2)

Country Link
JP (1) JP2001326171A (enExample)
KR (1) KR100456436B1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118383A (ja) * 2008-11-11 2010-05-27 Nikon Corp 照明装置、露光装置、及びデバイス製造方法
JP5806479B2 (ja) * 2011-02-22 2015-11-10 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP6362095B2 (ja) 2014-06-17 2018-07-25 キヤノン株式会社 照明装置、露光装置、調整方法、及び、物品の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950001393A (ko) * 1993-06-30 1995-01-03 오노 시게오 노광장치
JPH07159977A (ja) * 1993-12-01 1995-06-23 Nippon Telegr & Teleph Corp <Ntt> ホトマスク検査装置
KR970007502A (ko) * 1995-07-19 1997-02-21 오노 시게오 조명장치 및 그 장치를 구비한 투영 노광장치
WO1999049505A1 (en) * 1998-03-24 1999-09-30 Nikon Corporation Illuminator, exposing method and apparatus, and device manufacturing method
KR19990088055A (ko) * 1998-05-05 1999-12-27 헨켈 카르스텐 Ｅｕｖ리소그래피용조광시스템
JP2001110707A (ja) * 1999-10-08 2001-04-20 Orc Mfg Co Ltd 周辺露光装置の光学系

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP3010567B2 (ja) * 1992-05-21 2000-02-21 松下電器産業株式会社 照明光学装置
JP2827951B2 (ja) * 1994-05-16 1998-11-25 松下電器産業株式会社 投写型表示装置
JP3447895B2 (ja) * 1996-02-09 2003-09-16 株式会社東芝 投射型表示装置におけるパラメータの設定方法
JP3347676B2 (ja) * 1998-10-29 2002-11-20 キヤノン株式会社 照明装置およびそれを用いた投射型表示装置
JP2001043701A (ja) * 1999-07-28 2001-02-16 Ricoh Co Ltd 照明光学装置およびそれを用いた投写装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950001393A (ko) * 1993-06-30 1995-01-03 오노 시게오 노광장치
JPH07159977A (ja) * 1993-12-01 1995-06-23 Nippon Telegr & Teleph Corp <Ntt> ホトマスク検査装置
KR970007502A (ko) * 1995-07-19 1997-02-21 오노 시게오 조명장치 및 그 장치를 구비한 투영 노광장치
WO1999049505A1 (en) * 1998-03-24 1999-09-30 Nikon Corporation Illuminator, exposing method and apparatus, and device manufacturing method
KR19990088055A (ko) * 1998-05-05 1999-12-27 헨켈 카르스텐 Ｅｕｖ리소그래피용조광시스템
JP2001110707A (ja) * 1999-10-08 2001-04-20 Orc Mfg Co Ltd 周辺露光装置の光学系

Also Published As

Publication number Publication date
KR20010105250A (ko) 2001-11-28
JP2001326171A (ja) 2001-11-22

Similar Documents

Publication Publication Date Title
JP2006216917A (ja) 照明光学系、露光装置およびデバイス製造方法
JP2001284240A (ja) 照明光学系、および該照明光学系を備えた投影露光装置と該投影露光装置によるデバイスの製造方法
JP3576685B2 (ja) 露光装置及びそれを用いたデバイスの製造方法
KR100485314B1 (ko) 투영노광장치와 이것을 사용한 디바이스제조방법
KR20020033059A (ko) 낮은 열 부하를 갖는 조명시스템
JP3559694B2 (ja) 照明装置及びそれを用いた投影露光装置
TWI270120B (en) Illumination optical system and exposure apparatus
US9946056B2 (en) Illumination optical system, exposure apparatus, and method of manufacturing article
JP2004055856A (ja) 照明装置、それを用いた露光装置及びデバイス製造方法
KR100456436B1 (ko) 조명장치
JP3814444B2 (ja) 照明装置及びそれを用いた投影露光装置
JP2004140390A (ja) 照明光学系、露光装置及びデバイス製造方法
KR0165701B1 (ko) 조명장치 및 동장치를 사용하는 노광장치
JP2002057081A (ja) 照明光学装置並びに露光装置及び露光方法
US6885434B2 (en) Diaphragm for an integrator unit
JP2002222756A (ja) 照明装置、露光装置、デバイス製造方法及びデバイス
JPS6349367B2 (enExample)
JP3376043B2 (ja) 照明装置及びそれを用いた投影露光装置
JP4551666B2 (ja) 照明装置及び露光装置
JP3347405B2 (ja) 照明装置及び該照明装置を備える露光装置
JP2002350620A (ja) 光学部材、当該光学部材を用いた照明装置及び露光装置
JPH0769576B2 (ja) 照明光学装置
JPS63133522A (ja) 露光装置
JP2002025898A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JPH04250455A (ja) 円弧照明装置

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20121023

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20131029

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

FPAY Annual fee payment

Payment date: 20141028

Year of fee payment: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

FPAY Annual fee payment

Payment date: 20151023

Year of fee payment: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

FPAY Annual fee payment

Payment date: 20161025

Year of fee payment: 13

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

FPAY Annual fee payment

Payment date: 20171025

Year of fee payment: 14

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 14

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 15

FPAY Annual fee payment

Payment date: 20191023

Year of fee payment: 16

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 16

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20201102

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20201102

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000