KR100452732B1 - 리소그래피 투영용 보조 피쳐 - Google Patents

리소그래피 투영용 보조 피쳐 Download PDF

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Publication number
KR100452732B1
KR100452732B1 KR10-2001-0043438A KR20010043438A KR100452732B1 KR 100452732 B1 KR100452732 B1 KR 100452732B1 KR 20010043438 A KR20010043438 A KR 20010043438A KR 100452732 B1 KR100452732 B1 KR 100452732B1
Authority
KR
South Korea
Prior art keywords
mask
isolated
feature
array
auxiliary
Prior art date
Application number
KR10-2001-0043438A
Other languages
English (en)
Korean (ko)
Other versions
KR20020009430A (ko
Inventor
바젤만스요하네스야코부스마테우스
슐루터마르쿠스
플라젤로도니스조지
소챠로버트존
Original Assignee
에이에스엠엘 네델란즈 비.브이.
에이에스엠엘 마스크툴즈 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이에스엠엘 네델란즈 비.브이., 에이에스엠엘 마스크툴즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Publication of KR20020009430A publication Critical patent/KR20020009430A/ko
Application granted granted Critical
Publication of KR100452732B1 publication Critical patent/KR100452732B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR10-2001-0043438A 2000-07-21 2001-07-19 리소그래피 투영용 보조 피쳐 KR100452732B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP00306237.9 2000-07-21
EP00306237 2000-07-21
US24465700P 2000-11-01 2000-11-01
US60/244,657 2000-11-01

Publications (2)

Publication Number Publication Date
KR20020009430A KR20020009430A (ko) 2002-02-01
KR100452732B1 true KR100452732B1 (ko) 2004-10-12

Family

ID=26073249

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-0043438A KR100452732B1 (ko) 2000-07-21 2001-07-19 리소그래피 투영용 보조 피쳐

Country Status (3)

Country Link
JP (1) JP3996360B2 (de)
KR (1) KR100452732B1 (de)
DE (1) DE60102523T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002116529A (ja) * 2000-10-06 2002-04-19 Dainippon Printing Co Ltd 半導体回路設計パタンデータの補正方法、該補正方法により得られたパタンデータにより作製されたフォトマスク
US7217503B2 (en) 2001-04-24 2007-05-15 Canon Kabushiki Kaisha Exposure method and apparatus
JP4790350B2 (ja) * 2005-08-31 2011-10-12 富士通セミコンダクター株式会社 露光用マスク及び露光用マスクの製造方法
JP4635085B2 (ja) * 2008-03-03 2011-02-16 株式会社東芝 半導体装置の製造方法
KR101061357B1 (ko) * 2009-02-17 2011-08-31 주식회사 하이닉스반도체 포토 마스크
SG185228A1 (en) * 2011-04-25 2012-11-29 Ultratech Inc Phase-shift mask with assist phase regions
KR101694275B1 (ko) 2013-03-14 2017-01-23 에이에스엠엘 네델란즈 비.브이. 패터닝 디바이스, 기판에 마커를 생성하는 방법 및 디바이스 제조 방법

Also Published As

Publication number Publication date
JP2002090979A (ja) 2002-03-27
DE60102523T2 (de) 2005-04-07
DE60102523D1 (de) 2004-05-06
KR20020009430A (ko) 2002-02-01
JP3996360B2 (ja) 2007-10-24

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