DE60102523D1 - Hilfsmuster für lithographisches Belichtungsverfahren - Google Patents

Hilfsmuster für lithographisches Belichtungsverfahren

Info

Publication number
DE60102523D1
DE60102523D1 DE60102523T DE60102523T DE60102523D1 DE 60102523 D1 DE60102523 D1 DE 60102523D1 DE 60102523 T DE60102523 T DE 60102523T DE 60102523 T DE60102523 T DE 60102523T DE 60102523 D1 DE60102523 D1 DE 60102523D1
Authority
DE
Germany
Prior art keywords
exposure process
auxiliary pattern
lithographic exposure
lithographic
auxiliary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60102523T
Other languages
English (en)
Other versions
DE60102523T2 (de
Inventor
Johannes Jacobus Met Baselmans
Markus Schluter
Donis George Flagello
Robert John Socha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML MaskTools Netherlands BV
ASML Netherlands BV
Original Assignee
ASML MaskTools Netherlands BV
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML MaskTools Netherlands BV, ASML Netherlands BV filed Critical ASML MaskTools Netherlands BV
Application granted granted Critical
Publication of DE60102523D1 publication Critical patent/DE60102523D1/de
Publication of DE60102523T2 publication Critical patent/DE60102523T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60102523T 2000-07-21 2001-07-19 Hilfsmuster für lithographisches Belichtungsverfahren Expired - Fee Related DE60102523T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP00306237 2000-07-21
EP00306237 2000-07-21
US24465700P 2000-11-01 2000-11-01
US244657P 2000-11-01

Publications (2)

Publication Number Publication Date
DE60102523D1 true DE60102523D1 (de) 2004-05-06
DE60102523T2 DE60102523T2 (de) 2005-04-07

Family

ID=26073249

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60102523T Expired - Fee Related DE60102523T2 (de) 2000-07-21 2001-07-19 Hilfsmuster für lithographisches Belichtungsverfahren

Country Status (3)

Country Link
JP (1) JP3996360B2 (de)
KR (1) KR100452732B1 (de)
DE (1) DE60102523T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002116529A (ja) * 2000-10-06 2002-04-19 Dainippon Printing Co Ltd 半導体回路設計パタンデータの補正方法、該補正方法により得られたパタンデータにより作製されたフォトマスク
US7217503B2 (en) 2001-04-24 2007-05-15 Canon Kabushiki Kaisha Exposure method and apparatus
JP4790350B2 (ja) * 2005-08-31 2011-10-12 富士通セミコンダクター株式会社 露光用マスク及び露光用マスクの製造方法
JP4635085B2 (ja) * 2008-03-03 2011-02-16 株式会社東芝 半導体装置の製造方法
KR101061357B1 (ko) * 2009-02-17 2011-08-31 주식회사 하이닉스반도체 포토 마스크
SG185228A1 (en) * 2011-04-25 2012-11-29 Ultratech Inc Phase-shift mask with assist phase regions
KR101694275B1 (ko) 2013-03-14 2017-01-23 에이에스엠엘 네델란즈 비.브이. 패터닝 디바이스, 기판에 마커를 생성하는 방법 및 디바이스 제조 방법

Also Published As

Publication number Publication date
JP2002090979A (ja) 2002-03-27
DE60102523T2 (de) 2005-04-07
KR100452732B1 (ko) 2004-10-12
KR20020009430A (ko) 2002-02-01
JP3996360B2 (ja) 2007-10-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee