KR100395904B1 - 유기 반사방지 중합체 및 그의 제조방법 - Google Patents

유기 반사방지 중합체 및 그의 제조방법 Download PDF

Info

Publication number
KR100395904B1
KR100395904B1 KR10-1999-0014763A KR19990014763A KR100395904B1 KR 100395904 B1 KR100395904 B1 KR 100395904B1 KR 19990014763 A KR19990014763 A KR 19990014763A KR 100395904 B1 KR100395904 B1 KR 100395904B1
Authority
KR
South Korea
Prior art keywords
delete delete
formula
present
anthracene derivative
antireflection film
Prior art date
Application number
KR10-1999-0014763A
Other languages
English (en)
Korean (ko)
Other versions
KR20000067184A (ko
Inventor
정민호
홍성은
백기호
Original Assignee
주식회사 하이닉스반도체
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 하이닉스반도체 filed Critical 주식회사 하이닉스반도체
Priority to KR10-1999-0014763A priority Critical patent/KR100395904B1/ko
Priority to TW088120015A priority patent/TW546318B/zh
Priority to GB9927833A priority patent/GB2349148B/en
Priority to JP35449399A priority patent/JP3851476B2/ja
Priority to IT1999TO001099A priority patent/IT1308674B1/it
Priority to CNB991263812A priority patent/CN1215094C/zh
Priority to DE19962784A priority patent/DE19962784A1/de
Priority to DE19964382A priority patent/DE19964382B4/de
Priority to FR0000392A priority patent/FR2792633B1/fr
Priority to US09/501,049 priority patent/US6368768B1/en
Priority to NL1014997A priority patent/NL1014997C2/nl
Priority to FR0007516A priority patent/FR2793255B1/fr
Priority to FR0007511A priority patent/FR2793254B1/fr
Priority to FR0007514A priority patent/FR2793244A1/fr
Priority to CN 00122457 priority patent/CN1282550A/zh
Publication of KR20000067184A publication Critical patent/KR20000067184A/ko
Priority to US10/054,837 priority patent/US20020132183A1/en
Application granted granted Critical
Publication of KR100395904B1 publication Critical patent/KR100395904B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/017—Esters of hydroxy compounds having the esterified hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/24—Anthracenes; Hydrogenated anthracenes
KR10-1999-0014763A 1999-04-23 1999-04-23 유기 반사방지 중합체 및 그의 제조방법 KR100395904B1 (ko)

Priority Applications (16)

Application Number Priority Date Filing Date Title
KR10-1999-0014763A KR100395904B1 (ko) 1999-04-23 1999-04-23 유기 반사방지 중합체 및 그의 제조방법
TW088120015A TW546318B (en) 1999-04-23 1999-11-17 Organic anti-reflective coating material and its preparation
GB9927833A GB2349148B (en) 1999-04-23 1999-11-26 Organic anti-reflective coating material and its preparation
JP35449399A JP3851476B2 (ja) 1999-04-23 1999-12-14 有機反射防止重合体およびその製造方法
IT1999TO001099A IT1308674B1 (it) 1999-04-23 1999-12-15 Materiale organico di rivestimento anti-riflettente e procedimento per la sua preparazione.
CNB991263812A CN1215094C (zh) 1999-04-23 1999-12-15 有机抗反射涂料及其制备
DE19964382A DE19964382B4 (de) 1999-04-23 1999-12-23 Verwendung einer Beschichtungszusammensetzung zur Herstellung einer nicht reflektierenden Beschichtung und Verfahren zur Herstellung der Beschichtungszusammensetzung
DE19962784A DE19962784A1 (de) 1999-04-23 1999-12-23 Organisches, nicht reflektierendes Beschichtungsmaterial und dessen Herstellung
FR0000392A FR2792633B1 (fr) 1999-04-23 2000-01-13 Derive 9-anthracene alkylacrylate,procede de preparation et polymeres qu'il permet d'obtenir
US09/501,049 US6368768B1 (en) 1999-04-23 2000-02-09 Organic anti-reflective coating material and its preparation
NL1014997A NL1014997C2 (nl) 1999-04-23 2000-04-20 Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan.
FR0007516A FR2793255B1 (fr) 1999-04-23 2000-06-13 Composition de revetement anti-reflechissant, procede de preparation et dispositif a semiconducteur
FR0007511A FR2793254B1 (fr) 1999-04-23 2000-06-13 Composition de revetement anti-reflechissant, procede de preparation et dispositif a semiconducteur
FR0007514A FR2793244A1 (fr) 1999-04-23 2000-06-13 4-formylphenylmethacrylate, procede de preparation et polymeres qu'il permet d'obtenir
CN 00122457 CN1282550A (zh) 1999-04-23 2000-07-24 带照明灯的帽子
US10/054,837 US20020132183A1 (en) 1999-04-23 2002-01-22 Organic anti-reflective coating material and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-1999-0014763A KR100395904B1 (ko) 1999-04-23 1999-04-23 유기 반사방지 중합체 및 그의 제조방법

Related Child Applications (2)

Application Number Title Priority Date Filing Date
KR1020010030209A Division KR100351459B1 (ko) 2001-05-30 2001-05-30 유기 반사방지 중합체 및 그의 제조방법
KR1020010030208A Division KR100351458B1 (ko) 2001-05-30 2001-05-30 유기 반사방지 중합체 및 그의 제조방법

Publications (2)

Publication Number Publication Date
KR20000067184A KR20000067184A (ko) 2000-11-15
KR100395904B1 true KR100395904B1 (ko) 2003-08-27

Family

ID=19582078

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-1999-0014763A KR100395904B1 (ko) 1999-04-23 1999-04-23 유기 반사방지 중합체 및 그의 제조방법

Country Status (10)

Country Link
US (2) US6368768B1 (US06368768-20020409-C00052.png)
JP (1) JP3851476B2 (US06368768-20020409-C00052.png)
KR (1) KR100395904B1 (US06368768-20020409-C00052.png)
CN (1) CN1215094C (US06368768-20020409-C00052.png)
DE (2) DE19962784A1 (US06368768-20020409-C00052.png)
FR (4) FR2792633B1 (US06368768-20020409-C00052.png)
GB (1) GB2349148B (US06368768-20020409-C00052.png)
IT (1) IT1308674B1 (US06368768-20020409-C00052.png)
NL (1) NL1014997C2 (US06368768-20020409-C00052.png)
TW (1) TW546318B (US06368768-20020409-C00052.png)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6528235B2 (en) 1991-11-15 2003-03-04 Shipley Company, L.L.C. Antihalation compositions
US6773864B1 (en) * 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
US6472128B2 (en) * 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법
KR100427440B1 (ko) * 1999-12-23 2004-04-17 주식회사 하이닉스반도체 유기 반사방지 화합물 및 그의 제조방법
KR100355604B1 (ko) * 1999-12-23 2002-10-12 주식회사 하이닉스반도체 난반사 방지막용 중합체와 그 제조방법
KR100549574B1 (ko) * 1999-12-30 2006-02-08 주식회사 하이닉스반도체 유기 반사 방지막용 중합체 및 그의 제조방법
US6686124B1 (en) * 2000-03-14 2004-02-03 International Business Machines Corporation Multifunctional polymeric materials and use thereof
KR100687851B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687850B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100574486B1 (ko) * 2000-06-30 2006-04-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
TW576949B (en) 2000-08-17 2004-02-21 Shipley Co Llc Antireflective coatings with increased etch rates
KR100734249B1 (ko) * 2000-09-07 2007-07-02 삼성전자주식회사 축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
US6605394B2 (en) 2001-05-03 2003-08-12 Applied Materials, Inc. Organic bottom antireflective coating for high performance mask making using optical imaging
KR20020090489A (ko) * 2001-05-28 2002-12-05 금호석유화학 주식회사 화학증폭형 레지스트용 중합체 및 이를 함유한 화학증폭형레지스트 조성물
KR100351459B1 (ko) * 2001-05-30 2002-09-05 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100351458B1 (ko) * 2001-05-30 2002-09-05 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
US6703169B2 (en) 2001-07-23 2004-03-09 Applied Materials, Inc. Method of preparing optically imaged high performance photomasks
JP2004206082A (ja) * 2002-11-20 2004-07-22 Rohm & Haas Electronic Materials Llc 多層フォトレジスト系
EP1422566A1 (en) * 2002-11-20 2004-05-26 Shipley Company, L.L.C. Multilayer photoresist systems
US7361447B2 (en) 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
KR100636938B1 (ko) * 2003-09-29 2006-10-19 주식회사 하이닉스반도체 포토레지스트 조성물
JP2005314453A (ja) * 2004-04-27 2005-11-10 Sumitomo Chemical Co Ltd アクリル樹脂及び該樹脂を含有する粘着剤
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
EP1762895B1 (en) * 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
KR100703007B1 (ko) 2005-11-17 2007-04-06 삼성전자주식회사 감광성 유기 반사 방지막 형성용 조성물 및 이를 이용한패턴 형성 방법
KR100871770B1 (ko) * 2007-09-12 2008-12-05 주식회사 효성 안트라세닐 벤질기 발색단을 포함하는 공중합체, 상기공중합체의 제조방법, 상기 공중합체를 포함하는유기반사방지막 조성물 및 상기 조성물을 포함하는유기반사방지막
KR100920886B1 (ko) * 2007-12-13 2009-10-09 주식회사 효성 현상 가능한 유기 반사방지막 형성용 조성물 및 이로부터형성된 유기 반사방지막
KR100952465B1 (ko) * 2007-12-18 2010-04-13 제일모직주식회사 방향족 (메타)아크릴레이트 화합물 및 감광성 고분자, 및레지스트 조성물
KR101585992B1 (ko) * 2007-12-20 2016-01-19 삼성전자주식회사 반사방지 코팅용 고분자, 반사방지 코팅용 조성물 및 이를 이용한 반도체 장치의 패턴 형성 방법
KR100975913B1 (ko) * 2008-10-31 2010-08-13 한국전자통신연구원 유기 박막 트랜지스터용 조성물, 이를 이용하여 형성된 유기 박막 트랜지스터 및 그 형성방법
CN105732883B (zh) * 2016-03-01 2018-07-03 中国科学技术大学 一种发射室温磷光的水性聚丙烯酸酯的制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0439665A (ja) * 1990-06-05 1992-02-10 Fujitsu Ltd 放射線感光レジストとパターン形成方法
JPH08217815A (ja) * 1995-02-13 1996-08-27 Japan Synthetic Rubber Co Ltd 化学増幅型感放射線性樹脂組成物

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2415823A1 (fr) * 1978-01-27 1979-08-24 Eastman Kodak Co Composition photoreticulable contenant un polymere a groupe carbonyle, produit photosensible obtenu a partir de cette composition et procede de formation d'image qui utilise ce produit
DE2848967A1 (de) * 1978-11-11 1980-05-22 Basf Ag Aromatische aldehydgruppen enthaltende polymerisate
US4822718A (en) 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
US5674648A (en) 1984-08-06 1997-10-07 Brewer Science, Inc. Anti-reflective coating
DE3528930A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch
AU633624B2 (en) * 1989-09-22 1993-02-04 National Starch And Chemical Investment Holding Corporation Monomers and polymers containing acetal and aldehyde groups
US5258477A (en) * 1989-09-22 1993-11-02 National Starch And Chemical Investment Holding Corporation Monomers and polymers containing acetal and aldehyde groups
EP0659781A3 (de) * 1993-12-21 1995-09-27 Ciba Geigy Ag Maleinimidcopolymere, insbesonder für Photoresists.
FR2736061B1 (fr) * 1995-06-27 1997-08-08 Thomson Csf Materiau electroluminescent a base de polymere, procede de fabrication et diode electroluminescente utilisant ce materiau
CA2205099A1 (en) * 1996-05-24 1997-11-24 Patricia Marie Lesko Fluorescent polymers and coating compositions
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US5981145A (en) * 1997-04-30 1999-11-09 Clariant Finance (Bvi) Limited Light absorbing polymers
TW457403B (en) * 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0439665A (ja) * 1990-06-05 1992-02-10 Fujitsu Ltd 放射線感光レジストとパターン形成方法
JPH08217815A (ja) * 1995-02-13 1996-08-27 Japan Synthetic Rubber Co Ltd 化学増幅型感放射線性樹脂組成物

Also Published As

Publication number Publication date
JP2001098024A (ja) 2001-04-10
ITTO991099A0 (it) 1999-12-15
US6368768B1 (en) 2002-04-09
DE19964382B4 (de) 2008-08-14
FR2793254A1 (fr) 2000-11-10
ITTO991099A1 (it) 2001-06-15
US20020132183A1 (en) 2002-09-19
NL1014997C2 (nl) 2001-06-26
GB9927833D0 (en) 2000-01-26
DE19962784A1 (de) 2000-10-26
IT1308674B1 (it) 2002-01-09
FR2792633A1 (fr) 2000-10-27
FR2793254B1 (fr) 2006-09-22
GB2349148B (en) 2004-08-04
FR2793244A1 (fr) 2000-11-10
CN1215094C (zh) 2005-08-17
GB2349148A (en) 2000-10-25
TW546318B (en) 2003-08-11
FR2793255B1 (fr) 2006-09-22
NL1014997A1 (nl) 2000-10-24
FR2792633B1 (fr) 2007-06-08
CN1271720A (zh) 2000-11-01
FR2793255A1 (fr) 2000-11-10
JP3851476B2 (ja) 2006-11-29
KR20000067184A (ko) 2000-11-15

Similar Documents

Publication Publication Date Title
KR100395904B1 (ko) 유기 반사방지 중합체 및 그의 제조방법
JP4791433B2 (ja) 反射防止膜用組成物、反射防止膜の製造方法、および半導体素子の製造方法
JP4808597B2 (ja) 有機反射防止重合体およびその製造方法
KR100355604B1 (ko) 난반사 방지막용 중합체와 그 제조방법
KR100359862B1 (ko) 난반사 방지막용 중합체와 그 제조방법
KR100549574B1 (ko) 유기 반사 방지막용 중합체 및 그의 제조방법
KR100687850B1 (ko) 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) 유기반사방지막 조성물 및 그의 제조방법
KR20010057925A (ko) 유기 반사방지 화합물 및 그의 제조방법
KR100574486B1 (ko) 유기반사방지막 조성물 및 그의 제조방법
KR100687851B1 (ko) 유기반사방지막 조성물 및 그의 제조방법
KR100367399B1 (ko) 유기난반사방지중합체및그의제조방법
KR100351458B1 (ko) 유기 반사방지 중합체 및 그의 제조방법
KR100721181B1 (ko) 유기반사방지막 조성물 및 그의 제조방법
KR100351459B1 (ko) 유기 반사방지 중합체 및 그의 제조방법
KR100400242B1 (ko) 유기난반사방지중합체및그의제조방법
KR100355612B1 (ko) 난반사 방지막용 중합체와 그 제조방법
KR100423535B1 (ko) 유기 반사방지 화합물 및 그의 제조방법
KR100355611B1 (ko) 난반사 방지막용 중합체와 그 제조방법
KR20000046952A (ko) 유기 난반사방지 중합체 및 그의 제조방법

Legal Events

Date Code Title Description
A201 Request for examination
AMND Amendment
AMND Amendment
E902 Notification of reason for refusal
A107 Divisional application of patent
AMND Amendment
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
J201 Request for trial against refusal decision
AMND Amendment
E801 Decision on dismissal of amendment
S901 Examination by remand of revocation
GRNO Decision to grant (after opposition)
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20080728

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee