KR100375559B1 - 공정장치의 제어방법 - Google Patents

공정장치의 제어방법 Download PDF

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Publication number
KR100375559B1
KR100375559B1 KR10-2001-0039371A KR20010039371A KR100375559B1 KR 100375559 B1 KR100375559 B1 KR 100375559B1 KR 20010039371 A KR20010039371 A KR 20010039371A KR 100375559 B1 KR100375559 B1 KR 100375559B1
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KR
South Korea
Prior art keywords
value
correction value
component
bias
process data
Prior art date
Application number
KR10-2001-0039371A
Other languages
English (en)
Korean (ko)
Other versions
KR20030003803A (ko
Inventor
전경식
박찬훈
박일석
조봉수
강현태
제영호
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR10-2001-0039371A priority Critical patent/KR100375559B1/ko
Priority to TW090126637A priority patent/TWI221948B/zh
Priority to US10/072,901 priority patent/US6700648B2/en
Priority to GB0205159A priority patent/GB2377278B/en
Priority to DE10213285A priority patent/DE10213285B4/de
Priority to CNB021087997A priority patent/CN1214301C/zh
Priority to JP2002192055A priority patent/JP3883914B2/ja
Publication of KR20030003803A publication Critical patent/KR20030003803A/ko
Application granted granted Critical
Publication of KR100375559B1 publication Critical patent/KR100375559B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
    • G05B13/027—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion using neural networks only

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  • Engineering & Computer Science (AREA)
  • Artificial Intelligence (AREA)
  • Evolutionary Computation (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Software Systems (AREA)
  • Medical Informatics (AREA)
  • Health & Medical Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Complex Calculations (AREA)
KR10-2001-0039371A 2001-07-03 2001-07-03 공정장치의 제어방법 KR100375559B1 (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR10-2001-0039371A KR100375559B1 (ko) 2001-07-03 2001-07-03 공정장치의 제어방법
TW090126637A TWI221948B (en) 2001-07-03 2001-10-26 Method for controlling a processing apparatus
US10/072,901 US6700648B2 (en) 2001-07-03 2002-02-12 Method for controlling a processing apparatus
GB0205159A GB2377278B (en) 2001-07-03 2002-03-05 Method for controlling a processing apparatus
DE10213285A DE10213285B4 (de) 2001-07-03 2002-03-25 Verfahren zur Steuerung eines fotolithografischen Gerätes
CNB021087997A CN1214301C (zh) 2001-07-03 2002-04-02 控制处理装置的方法
JP2002192055A JP3883914B2 (ja) 2001-07-03 2002-07-01 工程装置の制御方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2001-0039371A KR100375559B1 (ko) 2001-07-03 2001-07-03 공정장치의 제어방법

Publications (2)

Publication Number Publication Date
KR20030003803A KR20030003803A (ko) 2003-01-14
KR100375559B1 true KR100375559B1 (ko) 2003-03-10

Family

ID=19711692

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-0039371A KR100375559B1 (ko) 2001-07-03 2001-07-03 공정장치의 제어방법

Country Status (7)

Country Link
US (1) US6700648B2 (ja)
JP (1) JP3883914B2 (ja)
KR (1) KR100375559B1 (ja)
CN (1) CN1214301C (ja)
DE (1) DE10213285B4 (ja)
GB (1) GB2377278B (ja)
TW (1) TWI221948B (ja)

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KR20210093587A (ko) * 2020-01-20 2021-07-28 두산중공업 주식회사 인공지능 알고리즘을 이용한 물리적 모델의 오차 감소를 위한 장치 및 이를 위한 방법

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TW594434B (en) * 2003-04-30 2004-06-21 Nanya Technology Corp Exposure system and method
US7627029B2 (en) 2003-05-20 2009-12-01 Rambus Inc. Margin test methods and circuits
US7590175B2 (en) 2003-05-20 2009-09-15 Rambus Inc. DFE margin test methods and circuits that decouple sample and feedback timing
JP4737968B2 (ja) 2004-10-13 2011-08-03 株式会社東芝 補正装置、補正方法、補正プログラム及び半導体装置の製造方法
DE102005009071B4 (de) * 2005-02-28 2008-06-26 Advanced Micro Devices, Inc., Sunnyvale Verfahren zur Prozesssteuerung
JP4281719B2 (ja) * 2005-08-10 2009-06-17 コニカミノルタビジネステクノロジーズ株式会社 ファイル処理装置、ファイル処理方法、およびファイル処理プログラム
JP2008122929A (ja) * 2006-10-20 2008-05-29 Toshiba Corp シミュレーションモデルの作成方法
WO2008117444A1 (ja) * 2007-03-27 2008-10-02 Fujitsu Limited リソグラフィ処理の露光位置アライメント方法
TWI338916B (en) * 2007-06-08 2011-03-11 Univ Nat Cheng Kung Dual-phase virtual metrology method
US8666532B2 (en) * 2007-07-22 2014-03-04 Camtek Ltd. Method and system for controlling a manufacturing process
WO2009058412A1 (en) * 2007-10-29 2009-05-07 Nec Laboratories America, Inc. Discovering optimal system configurations using decentralized probability based active sampling
JP2009224374A (ja) * 2008-03-13 2009-10-01 Oki Semiconductor Co Ltd Ｐｅｂ装置及びその制御方法
US8260732B2 (en) 2009-11-24 2012-09-04 King Fahd University Of Petroleum And Minerals Method for identifying Hammerstein models
CN103293878B (zh) * 2013-05-31 2015-07-15 上海华力微电子有限公司 光刻机产能监测系统
JP6528775B2 (ja) * 2014-09-04 2019-06-12 株式会社ニコン 処理システムおよびデバイス製造方法
CN107003618B (zh) 2014-12-02 2019-03-15 Asml荷兰有限公司 光刻方法和设备
JP2017538156A (ja) * 2014-12-02 2017-12-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ方法及び装置
JP2018529996A (ja) 2015-09-24 2018-10-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィプロセスにおけるレチクル加熱及び／又は冷却の影響を低減する方法
US10684600B2 (en) * 2015-11-19 2020-06-16 Dspace Digital Signal Processing And Control Engineering Gmbh Method for operating a control device and for external bypassing of a configured control device
KR20190048491A (ko) 2017-10-31 2019-05-09 삼성전자주식회사 식각 효과 예측 방법 및 입력 파라미터 결정 방법
JP7262921B2 (ja) * 2017-11-28 2023-04-24 キヤノン株式会社 情報処理装置、プログラム、リソグラフィ装置、リソグラフィシステム、および物品の製造方法
WO2021225587A1 (en) * 2020-05-06 2021-11-11 Kla Corporation Inter-step feedforward process control in the manufacture of semiconductor devices
KR102271975B1 (ko) * 2021-01-13 2021-07-02 (주)에이피에스티 공정 관리를 위한 동특성 해석 시스템 및 방법
US20230107813A1 (en) * 2021-10-06 2023-04-06 Applied Materials, Inc. Time constraint management at a manufacturing system

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KR19990054210A (ko) * 1997-12-26 1999-07-15 윤종용 반도체 제조용 증착설비의 막두께 조절방법
KR19990074610A (ko) * 1998-03-12 1999-10-05 김규현 반도체 웨이퍼의 오버레이 보정 방법
KR19990074611A (ko) * 1998-03-12 1999-10-05 김규현 반도체 웨이퍼의 노광 시간 보정 방법
KR100249436B1 (ko) * 1996-11-29 2000-03-15 가네꼬 히사시 반도체 장치 제조 장치

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KR0166321B1 (ko) * 1996-03-14 1999-01-15 김광호 스테퍼별 정렬노광조건 설정방법
KR100249436B1 (ko) * 1996-11-29 2000-03-15 가네꼬 히사시 반도체 장치 제조 장치
KR19990054210A (ko) * 1997-12-26 1999-07-15 윤종용 반도체 제조용 증착설비의 막두께 조절방법
KR19990074610A (ko) * 1998-03-12 1999-10-05 김규현 반도체 웨이퍼의 오버레이 보정 방법
KR19990074611A (ko) * 1998-03-12 1999-10-05 김규현 반도체 웨이퍼의 노광 시간 보정 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210093587A (ko) * 2020-01-20 2021-07-28 두산중공업 주식회사 인공지능 알고리즘을 이용한 물리적 모델의 오차 감소를 위한 장치 및 이를 위한 방법
KR102468295B1 (ko) * 2020-01-20 2022-11-16 두산에너빌리티 주식회사 인공지능 알고리즘을 이용한 물리적 모델의 오차 감소를 위한 장치 및 이를 위한 방법

Also Published As

Publication number Publication date
KR20030003803A (ko) 2003-01-14
US6700648B2 (en) 2004-03-02
GB2377278B (en) 2003-11-19
GB2377278A (en) 2003-01-08
CN1214301C (zh) 2005-08-10
JP2003124110A (ja) 2003-04-25
TWI221948B (en) 2004-10-11
DE10213285B4 (de) 2007-02-01
US20030058428A1 (en) 2003-03-27
GB0205159D0 (en) 2002-04-17
DE10213285A1 (de) 2003-01-23
JP3883914B2 (ja) 2007-02-21
CN1393747A (zh) 2003-01-29

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