KR100285219B1 - 비휘발성 메모리 셀의 스트레스 감소 방법 - Google Patents
비휘발성 메모리 셀의 스트레스 감소 방법 Download PDFInfo
- Publication number
- KR100285219B1 KR100285219B1 KR1019950000816A KR19950000816A KR100285219B1 KR 100285219 B1 KR100285219 B1 KR 100285219B1 KR 1019950000816 A KR1019950000816 A KR 1019950000816A KR 19950000816 A KR19950000816 A KR 19950000816A KR 100285219 B1 KR100285219 B1 KR 100285219B1
- Authority
- KR
- South Korea
- Prior art keywords
- memory cell
- transistor
- word line
- line
- sense
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/08—Address circuits; Decoders; Word-line control circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0483—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/30—Power supply circuits
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8/184,227 | 1994-01-19 | ||
| US08/184,227 US5434815A (en) | 1994-01-19 | 1994-01-19 | Stress reduction for non-volatile memory cell |
| US8/184227 | 1994-01-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950034268A KR950034268A (ko) | 1995-12-28 |
| KR100285219B1 true KR100285219B1 (ko) | 2001-04-02 |
Family
ID=22676058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950000816A Expired - Fee Related KR100285219B1 (ko) | 1994-01-19 | 1995-01-19 | 비휘발성 메모리 셀의 스트레스 감소 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5434815A (enExample) |
| EP (1) | EP0664544B1 (enExample) |
| JP (2) | JPH07254295A (enExample) |
| KR (1) | KR100285219B1 (enExample) |
| CN (1) | CN1039172C (enExample) |
| DE (1) | DE69517060T2 (enExample) |
| TW (1) | TW281763B (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617350A (en) * | 1995-08-01 | 1997-04-01 | Roohparvar; Frankie F. | Flash memory system having reduced disturb and method |
| US5657268A (en) * | 1995-11-20 | 1997-08-12 | Texas Instruments Incorporated | Array-source line, bitline and wordline sequence in flash operations |
| US5959891A (en) * | 1996-08-16 | 1999-09-28 | Altera Corporation | Evaluation of memory cell characteristics |
| US5852306A (en) | 1997-01-29 | 1998-12-22 | Micron Technology, Inc. | Flash memory with nanocrystalline silicon film floating gate |
| US5754477A (en) * | 1997-01-29 | 1998-05-19 | Micron Technology, Inc. | Differential flash memory cell and method for programming |
| US5740104A (en) * | 1997-01-29 | 1998-04-14 | Micron Technology, Inc. | Multi-state flash memory cell and method for programming single electron differences |
| US5801401A (en) * | 1997-01-29 | 1998-09-01 | Micron Technology, Inc. | Flash memory with microcrystalline silicon carbide film floating gate |
| US6232643B1 (en) | 1997-11-13 | 2001-05-15 | Micron Technology, Inc. | Memory using insulator traps |
| US6493270B2 (en) | 1999-07-01 | 2002-12-10 | Micron Technology, Inc. | Leakage detection in programming algorithm for a flash memory device |
| US6108241A (en) * | 1999-07-01 | 2000-08-22 | Micron Technology, Inc. | Leakage detection in flash memory cell |
| US7193893B2 (en) | 2002-06-21 | 2007-03-20 | Micron Technology, Inc. | Write once read only memory employing floating gates |
| US6804136B2 (en) * | 2002-06-21 | 2004-10-12 | Micron Technology, Inc. | Write once read only memory employing charge trapping in insulators |
| US7154140B2 (en) | 2002-06-21 | 2006-12-26 | Micron Technology, Inc. | Write once read only memory with large work function floating gates |
| US6996009B2 (en) * | 2002-06-21 | 2006-02-07 | Micron Technology, Inc. | NOR flash memory cell with high storage density |
| US6888739B2 (en) * | 2002-06-21 | 2005-05-03 | Micron Technology Inc. | Nanocrystal write once read only memory for archival storage |
| US7221586B2 (en) | 2002-07-08 | 2007-05-22 | Micron Technology, Inc. | Memory utilizing oxide nanolaminates |
| US7221017B2 (en) * | 2002-07-08 | 2007-05-22 | Micron Technology, Inc. | Memory utilizing oxide-conductor nanolaminates |
| US7847344B2 (en) * | 2002-07-08 | 2010-12-07 | Micron Technology, Inc. | Memory utilizing oxide-nitride nanolaminates |
| JP4314056B2 (ja) * | 2003-04-17 | 2009-08-12 | パナソニック株式会社 | 半導体記憶装置 |
| US7054216B2 (en) * | 2004-03-17 | 2006-05-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Programmable MOS device formed by hot carrier effect |
| US7927948B2 (en) | 2005-07-20 | 2011-04-19 | Micron Technology, Inc. | Devices with nanocrystals and methods of formation |
| JP2007193928A (ja) * | 2005-12-19 | 2007-08-02 | Matsushita Electric Ind Co Ltd | 半導体記憶装置 |
| US7709402B2 (en) | 2006-02-16 | 2010-05-04 | Micron Technology, Inc. | Conductive layers for hafnium silicon oxynitride films |
| JP4504397B2 (ja) | 2007-05-29 | 2010-07-14 | 株式会社東芝 | 半導体記憶装置 |
| CN103943136B (zh) * | 2013-01-17 | 2017-09-08 | 旺宏电子股份有限公司 | 一种存储器电路及其操作方法 |
| JP6166810B1 (ja) * | 2016-03-08 | 2017-07-19 | 力晶科技股▲ふん▼有限公司 | 半導体記憶装置 |
| FR3136583A1 (fr) | 2022-06-08 | 2023-12-15 | Stmicroelectronics (Rousset) Sas | Dispositif de verrou, en particulier pour le décodage rangée et le décodage colonne d’un plan mémoire EEPROM |
| FR3139658B1 (fr) * | 2022-09-08 | 2025-05-23 | St Microelectronics Rousset | Dispositif de du type mémoire EEPROM à architecture du type à « tension partagée ». |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4179626A (en) * | 1978-06-29 | 1979-12-18 | Westinghouse Electric Corp. | Sense circuit for use in variable threshold transistor memory arrays |
| JPS62266798A (ja) * | 1986-05-13 | 1987-11-19 | Mitsubishi Electric Corp | 不揮発性半導体記憶装置 |
| US5033023A (en) * | 1988-04-08 | 1991-07-16 | Catalyst Semiconductor, Inc. | High density EEPROM cell and process for making the cell |
| JP2685966B2 (ja) * | 1990-06-22 | 1997-12-08 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| KR920006988A (ko) * | 1990-09-25 | 1992-04-28 | 아오이 죠이치 | 불휘발성 반도체메모리 |
| JPH0721790A (ja) * | 1993-07-05 | 1995-01-24 | Mitsubishi Electric Corp | 半導体集積回路 |
-
1994
- 1994-01-19 US US08/184,227 patent/US5434815A/en not_active Expired - Lifetime
-
1995
- 1995-01-17 TW TW084100369A patent/TW281763B/zh not_active IP Right Cessation
- 1995-01-18 EP EP95100621A patent/EP0664544B1/en not_active Expired - Lifetime
- 1995-01-18 DE DE69517060T patent/DE69517060T2/de not_active Expired - Fee Related
- 1995-01-19 KR KR1019950000816A patent/KR100285219B1/ko not_active Expired - Fee Related
- 1995-01-19 JP JP654495A patent/JPH07254295A/ja active Pending
- 1995-01-19 CN CN95100271A patent/CN1039172C/zh not_active Expired - Fee Related
-
2005
- 2005-04-18 JP JP2005120021A patent/JP2005228475A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE69517060D1 (de) | 2000-06-29 |
| EP0664544A2 (en) | 1995-07-26 |
| EP0664544A3 (en) | 1996-10-02 |
| JPH07254295A (ja) | 1995-10-03 |
| TW281763B (enExample) | 1996-07-21 |
| DE69517060T2 (de) | 2001-02-15 |
| EP0664544B1 (en) | 2000-05-24 |
| CN1039172C (zh) | 1998-07-15 |
| KR950034268A (ko) | 1995-12-28 |
| US5434815A (en) | 1995-07-18 |
| JP2005228475A (ja) | 2005-08-25 |
| CN1117644A (zh) | 1996-02-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
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| PR1002 | Payment of registration fee |
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| R18-X000 | Changes to party contact information recorded |
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