KR100276861B1 - 컬러필터의 제조방법 - Google Patents

컬러필터의 제조방법 Download PDF

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Publication number
KR100276861B1
KR100276861B1 KR1019920002902A KR920002902A KR100276861B1 KR 100276861 B1 KR100276861 B1 KR 100276861B1 KR 1019920002902 A KR1019920002902 A KR 1019920002902A KR 920002902 A KR920002902 A KR 920002902A KR 100276861 B1 KR100276861 B1 KR 100276861B1
Authority
KR
South Korea
Prior art keywords
film
pattern
manufacturing
forming
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019920002902A
Other languages
English (en)
Korean (ko)
Inventor
히토시 가마모리
고지 이와사
다카카즈 후쿠치
미츠루 스기노야
츠토무 와타나베
도시아키 오타
준이치 야스카와
Original Assignee
핫토리 쥰이치
세이코 인스트루먼트 가부시키가이샤
이토 켄
가부시키가이샤 신토 케미트론
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 핫토리 쥰이치, 세이코 인스트루먼트 가부시키가이샤, 이토 켄, 가부시키가이샤 신토 케미트론 filed Critical 핫토리 쥰이치
Application granted granted Critical
Publication of KR100276861B1 publication Critical patent/KR100276861B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
KR1019920002902A 1991-02-25 1992-02-25 컬러필터의 제조방법 Expired - Fee Related KR100276861B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3030464A JPH04269713A (ja) 1991-02-25 1991-02-25 多色パターンの製造方法
JP91-30464 1991-02-25

Publications (1)

Publication Number Publication Date
KR100276861B1 true KR100276861B1 (ko) 2001-01-15

Family

ID=12304609

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920002902A Expired - Fee Related KR100276861B1 (ko) 1991-02-25 1992-02-25 컬러필터의 제조방법

Country Status (6)

Country Link
US (1) US6203950B1 (enExample)
EP (1) EP0501657B1 (enExample)
JP (1) JPH04269713A (enExample)
KR (1) KR100276861B1 (enExample)
DE (1) DE69225987T2 (enExample)
TW (1) TW216830B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07294725A (ja) * 1994-03-01 1995-11-10 Seiko Instr Inc カラーフィルター及び多色液晶表示装置の製造方法
RU2226293C2 (ru) * 2001-10-02 2004-03-27 ОПТИВА, Инк. Панель дисплея и многослойная пластина для ее изготовления
CN105527747A (zh) * 2016-02-18 2016-04-27 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示面板、显示装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8105071A (nl) * 1981-11-10 1983-06-01 Philips Nv Kleurenbeeldopneeminrichting.
EP0113237B1 (en) 1982-12-22 1987-11-25 Seiko Instruments Inc. Method for manufacturing a multicolour filter and a multicolour display device
JPS6033506A (ja) 1983-08-04 1985-02-20 Seiko Instr & Electronics Ltd カラ−固体撮像素子の製造方法
DE3688700T2 (de) 1985-12-18 1993-11-11 Canon Kk Flüssigkristallvorrichtung.
JP2640097B2 (ja) 1986-03-20 1997-08-13 セイコー電子工業株式会社 多色表示装置
JPS6432233A (en) * 1987-07-28 1989-02-02 Sharp Kk Liquid crystal display device
JP2593670B2 (ja) * 1987-11-26 1997-03-26 セイコー電子工業株式会社 カラー表示装置の製造方法
JPH01170902A (ja) * 1987-12-25 1989-07-06 Seiko Instr & Electron Ltd カラーフィルターの製造方法
EP0326112B1 (en) * 1988-01-29 1994-09-14 Toppan Printing Co., Ltd. Electrode plate for display device and method for preparation thereof
DE68921910T3 (de) * 1988-04-21 2000-08-17 Asahi Glass Co. Ltd., Tokio/Tokyo Farbflüssigkristall-Anzeigevorrichtung und ihr Ansteuerungsverfahren.
JPH0322221U (enExample) * 1989-07-14 1991-03-07

Also Published As

Publication number Publication date
JPH04269713A (ja) 1992-09-25
TW216830B (enExample) 1993-12-01
US6203950B1 (en) 2001-03-20
DE69225987T2 (de) 1998-10-22
EP0501657A1 (en) 1992-09-02
DE69225987D1 (de) 1998-07-30
EP0501657B1 (en) 1998-06-24

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