DE69225987D1 - Verfahren zur Herstellung eines Farbfilters - Google Patents

Verfahren zur Herstellung eines Farbfilters

Info

Publication number
DE69225987D1
DE69225987D1 DE69225987T DE69225987T DE69225987D1 DE 69225987 D1 DE69225987 D1 DE 69225987D1 DE 69225987 T DE69225987 T DE 69225987T DE 69225987 T DE69225987 T DE 69225987T DE 69225987 D1 DE69225987 D1 DE 69225987D1
Authority
DE
Germany
Prior art keywords
producing
color filter
color
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69225987T
Other languages
English (en)
Other versions
DE69225987T2 (de
Inventor
Hitoshi Kamamori
Mitsuru Suginoya
Tsutomu Watanabe
Toshiaki Ota
Koji Iwasa
Takakazu Fukuchi
Junichi Yasumawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Shinto Chemitron Co Ltd
Original Assignee
Seiko Instruments Inc
Shinto Chemitron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc, Shinto Chemitron Co Ltd filed Critical Seiko Instruments Inc
Publication of DE69225987D1 publication Critical patent/DE69225987D1/de
Application granted granted Critical
Publication of DE69225987T2 publication Critical patent/DE69225987T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
DE69225987T 1991-02-25 1992-02-19 Verfahren zur Herstellung eines Farbfilters Expired - Fee Related DE69225987T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3030464A JPH04269713A (ja) 1991-02-25 1991-02-25 多色パターンの製造方法

Publications (2)

Publication Number Publication Date
DE69225987D1 true DE69225987D1 (de) 1998-07-30
DE69225987T2 DE69225987T2 (de) 1998-10-22

Family

ID=12304609

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69225987T Expired - Fee Related DE69225987T2 (de) 1991-02-25 1992-02-19 Verfahren zur Herstellung eines Farbfilters

Country Status (6)

Country Link
US (1) US6203950B1 (de)
EP (1) EP0501657B1 (de)
JP (1) JPH04269713A (de)
KR (1) KR100276861B1 (de)
DE (1) DE69225987T2 (de)
TW (1) TW216830B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07294725A (ja) * 1994-03-01 1995-11-10 Seiko Instr Inc カラーフィルター及び多色液晶表示装置の製造方法
RU2226293C2 (ru) * 2001-10-02 2004-03-27 ОПТИВА, Инк. Панель дисплея и многослойная пластина для ее изготовления
CN105527747A (zh) * 2016-02-18 2016-04-27 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示面板、显示装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8105071A (nl) * 1981-11-10 1983-06-01 Philips Nv Kleurenbeeldopneeminrichting.
DE3374726D1 (en) 1982-12-22 1988-01-07 Seiko Instr Inc Method for manufacturing a multicolour filter and a multicolour display device
JPS6033506A (ja) 1983-08-04 1985-02-20 Seiko Instr & Electronics Ltd カラ−固体撮像素子の製造方法
ES2043600T3 (es) 1985-12-18 1994-01-01 Canon Kk Dispositivo de cristal liquido.
JP2640097B2 (ja) 1986-03-20 1997-08-13 セイコー電子工業株式会社 多色表示装置
JPS6432233A (en) * 1987-07-28 1989-02-02 Sharp Kk Liquid crystal display device
JP2593670B2 (ja) * 1987-11-26 1997-03-26 セイコー電子工業株式会社 カラー表示装置の製造方法
JPH01170902A (ja) * 1987-12-25 1989-07-06 Seiko Instr & Electron Ltd カラーフィルターの製造方法
EP0326112B1 (de) * 1988-01-29 1994-09-14 Toppan Printing Co., Ltd. Elektrodenstruktur für Anzeigevorrichtungen und ihr Herstellungsverfahren
EP0338412B2 (de) * 1988-04-21 2000-05-10 Asahi Glass Company Ltd. Farbflüssigkristall-Anzeigevorrichtung und ihr Ansteuerungsverfahren
JPH0322221U (de) * 1989-07-14 1991-03-07

Also Published As

Publication number Publication date
JPH04269713A (ja) 1992-09-25
KR100276861B1 (ko) 2001-01-15
US6203950B1 (en) 2001-03-20
TW216830B (de) 1993-12-01
EP0501657B1 (de) 1998-06-24
DE69225987T2 (de) 1998-10-22
EP0501657A1 (de) 1992-09-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee