DE69119181D1 - Verfahren zur Herstellung eines Filters - Google Patents

Verfahren zur Herstellung eines Filters

Info

Publication number
DE69119181D1
DE69119181D1 DE69119181T DE69119181T DE69119181D1 DE 69119181 D1 DE69119181 D1 DE 69119181D1 DE 69119181 T DE69119181 T DE 69119181T DE 69119181 T DE69119181 T DE 69119181T DE 69119181 D1 DE69119181 D1 DE 69119181D1
Authority
DE
Germany
Prior art keywords
filter
making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69119181T
Other languages
English (en)
Other versions
DE69119181T2 (de
Inventor
Christopher R Needham
Carl A Chiulli
Stephen F Clark
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polaroid Corp
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polaroid Corp filed Critical Polaroid Corp
Application granted granted Critical
Publication of DE69119181D1 publication Critical patent/DE69119181D1/de
Publication of DE69119181T2 publication Critical patent/DE69119181T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Drying Of Semiconductors (AREA)
DE69119181T 1990-10-10 1991-07-19 Verfahren zur Herstellung eines Filters Expired - Fee Related DE69119181T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/595,211 US5059500A (en) 1990-10-10 1990-10-10 Process for forming a color filter

Publications (2)

Publication Number Publication Date
DE69119181D1 true DE69119181D1 (de) 1996-06-05
DE69119181T2 DE69119181T2 (de) 1996-08-14

Family

ID=24382240

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69119181T Expired - Fee Related DE69119181T2 (de) 1990-10-10 1991-07-19 Verfahren zur Herstellung eines Filters

Country Status (5)

Country Link
US (1) US5059500A (de)
EP (1) EP0481539B1 (de)
JP (1) JPH04234706A (de)
CA (1) CA2045249A1 (de)
DE (1) DE69119181T2 (de)

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US5240818A (en) * 1991-07-31 1993-08-31 Texas Instruments Incorporated Method for manufacturing a color filter for deformable mirror device
CA2087110A1 (en) * 1992-01-14 1993-07-15 Hiroshi Tsushima Method of forming color pattern
US5268245A (en) * 1992-07-09 1993-12-07 Polaroid Corporation Process for forming a filter on a solid state imager
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DE4407067C2 (de) * 1994-03-03 2003-06-18 Unaxis Balzers Ag Dielektrisches Interferenz-Filtersystem, LCD-Anzeige und CCD-Anordnung sowie Verfahren zur Herstellung eines dielektrischen Interferenz-Filtersystems
US5667920A (en) * 1996-03-11 1997-09-16 Polaroid Corporation Process for preparing a color filter
US6270948B1 (en) 1996-08-22 2001-08-07 Kabushiki Kaisha Toshiba Method of forming pattern
US5871871A (en) * 1996-09-20 1999-02-16 International Business Machines Corporation Stabilized multi-layered structure of color filters on a silicon chip and a method for making
US5756239A (en) * 1996-12-12 1998-05-26 Eastman Kodak Company Method of forming a color filter array with improved resolution
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
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JP4431336B2 (ja) * 2003-04-09 2010-03-10 株式会社日本触媒 樹脂組成物、光学フィルターおよびプラズマディスプレー
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
KR100568302B1 (ko) * 2004-05-17 2006-04-05 삼성전기주식회사 Ｓａｗ 소자의 제조방법
US7195848B2 (en) * 2004-08-30 2007-03-27 Eastman Kodak Company Method of making inlaid color filter arrays
DE102005026912A1 (de) * 2005-06-10 2006-12-14 Arnold & Richter Cine Technik Gmbh & Co. Betriebs Kg Filmscanner
JP4984634B2 (ja) * 2005-07-21 2012-07-25 ソニー株式会社 物理情報取得方法および物理情報取得装置
KR100660332B1 (ko) * 2005-12-28 2006-12-22 동부일렉트로닉스 주식회사 이미지 센서의 제조방법
JP2008046584A (ja) * 2006-07-19 2008-02-28 Fujifilm Corp カラーフィルタの製造方法
JP2008041362A (ja) * 2006-08-03 2008-02-21 Fuji Electric Holdings Co Ltd パターン化された色変換層の製造方法、およびそれを用いた色変換フィルターおよび有機ｅｌディスプレイの製造方法。
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
JP2008241744A (ja) * 2007-03-23 2008-10-09 Fujifilm Corp カラーフィルタの製造方法
EP1975702B1 (de) 2007-03-29 2013-07-24 FUJIFILM Corporation Farbige lichthärtbare Zusammensetzung für eine Festkörperbildaufnahmevorrichtung, Farbfilter und Verfahren zur Herstellung davon, sowie Festkörperbildaufnahmevorrichtung
KR101412719B1 (ko) 2007-07-17 2014-06-26 후지필름 가부시키가이샤 감광성 조성물, 경화성 조성물, 신규 화합물, 광중합성조성물, 컬러 필터, 및, 평판 인쇄판 원판
JP4890388B2 (ja) 2007-08-22 2012-03-07 富士フイルム株式会社 着色感光性組成物、カラーフィルタ及びその製造方法
KR20100061730A (ko) 2007-09-19 2010-06-08 후지필름 가부시키가이샤 아세틸렌 화합물, 그 염, 그 축합물 및 그 조성물
EP2055746B1 (de) 2007-10-31 2011-09-28 FUJIFILM Corporation Farbige härtbare Zusammensetzung, Farbfilter, Herstellungsverfahren dafür und Festzustand-Bildaufnahmevorrichtung
CN101842444B (zh) 2007-11-01 2013-06-05 富士胶片株式会社 颜料分散组合物、着色固化性组合物、滤色器及其制造方法
JP5068640B2 (ja) 2007-12-28 2012-11-07 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5052360B2 (ja) 2008-01-31 2012-10-17 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法
JP5448352B2 (ja) 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5305704B2 (ja) 2008-03-24 2013-10-02 富士フイルム株式会社 新規化合物、光重合性組成物、カラーフィルタ用光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5507054B2 (ja) 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
US7688524B2 (en) * 2008-04-24 2010-03-30 Sperian Eye & Face Protection, Inc. Laser protective eyewear having improved glare protection
JP2009271121A (ja) 2008-04-30 2009-11-19 Fujifilm Corp 着色光学異方性層を含む光学材料
JP2009289768A (ja) * 2008-05-27 2009-12-10 Panasonic Corp 固体撮像装置
JP5171506B2 (ja) 2008-06-30 2013-03-27 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP2010044273A (ja) 2008-08-14 2010-02-25 Fujifilm Corp カラーフィルタ及びその形成方法、並びに固体撮像素子
JP5393092B2 (ja) 2008-09-30 2014-01-22 富士フイルム株式会社 染料含有ネガ型硬化性組成物、これを用いたカラーフィルタ及びその製造方法、並びに固体撮像素子
WO2010119924A1 (ja) 2009-04-16 2010-10-21 富士フイルム株式会社 カラーフィルタ用重合性組成物、カラーフィルタ、及び固体撮像素子
JP5572332B2 (ja) * 2009-04-24 2014-08-13 凸版印刷株式会社 染料を含有する青色着色組成物、カラーフィルタ、それを具備する液晶表示装置並びに有機ｅｌディスプレイ
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
KR20110098638A (ko) 2010-02-26 2011-09-01 후지필름 가부시키가이샤 착색 경화성 조성물, 컬러필터와 그 제조방법, 고체촬상소자 및 액정표시장치
KR101830206B1 (ko) 2010-12-28 2018-02-20 후지필름 가부시키가이샤 차광막 형성용 티타늄 블랙 분산 조성물과 그 제조방법, 흑색 감방사선성 조성물, 흑색 경화막, 고체촬상소자, 및 흑색 경화막의 제조방법
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
WO2014087901A1 (ja) 2012-12-03 2014-06-12 富士フイルム株式会社 Ｉｒカットフィルタ及びその製造方法、固体撮像装置、遮光膜の形成方法
CN104854699B (zh) 2012-12-03 2017-09-01 富士胶片株式会社 固体摄影元件用保持基板及其制造方法、固体摄影装置
US9570491B2 (en) 2014-10-08 2017-02-14 Omnivision Technologies, Inc. Dual-mode image sensor with a signal-separating color filter array, and method for same
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen
KR20200026053A (ko) 2018-08-31 2020-03-10 주식회사 이엔에프테크놀로지 칼라 필터용 박리액 조성물 및 이를 이용한 방법

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Also Published As

Publication number Publication date
US5059500A (en) 1991-10-22
JPH04234706A (ja) 1992-08-24
EP0481539B1 (de) 1996-05-01
DE69119181T2 (de) 1996-08-14
CA2045249A1 (en) 1992-04-11
EP0481539A1 (de) 1992-04-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee