KR100240566B1 - 펠리클 - Google Patents

펠리클 Download PDF

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Publication number
KR100240566B1
KR100240566B1 KR1019970002210A KR19970002210A KR100240566B1 KR 100240566 B1 KR100240566 B1 KR 100240566B1 KR 1019970002210 A KR1019970002210 A KR 1019970002210A KR 19970002210 A KR19970002210 A KR 19970002210A KR 100240566 B1 KR100240566 B1 KR 100240566B1
Authority
KR
South Korea
Prior art keywords
pellicle
frame
pressure
sensitive adhesive
adhesive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019970002210A
Other languages
English (en)
Korean (ko)
Other versions
KR970058797A (ko
Inventor
메구루 가시다
Original Assignee
카나가와 치히로
신에쓰 가가꾸 고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 카나가와 치히로, 신에쓰 가가꾸 고교 가부시끼가이샤 filed Critical 카나가와 치히로
Publication of KR970058797A publication Critical patent/KR970058797A/ko
Application granted granted Critical
Publication of KR100240566B1 publication Critical patent/KR100240566B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24132—Structurally defined web or sheet [e.g., overall dimension, etc.] including grain, strips, or filamentary elements in different layers or components parallel

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Prevention Of Fouling (AREA)
  • Adhesive Tapes (AREA)
KR1019970002210A 1996-01-30 1997-01-27 펠리클 Expired - Fee Related KR100240566B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3553696A JP3209073B2 (ja) 1996-01-30 1996-01-30 ペリクル
JP96-35536 1996-01-30

Publications (2)

Publication Number Publication Date
KR970058797A KR970058797A (ko) 1997-08-12
KR100240566B1 true KR100240566B1 (ko) 2000-01-15

Family

ID=12444465

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970002210A Expired - Fee Related KR100240566B1 (ko) 1996-01-30 1997-01-27 펠리클

Country Status (6)

Country Link
US (1) US5729325A (https=)
EP (1) EP0788028B1 (https=)
JP (1) JP3209073B2 (https=)
KR (1) KR100240566B1 (https=)
DE (1) DE69700845T2 (https=)
TW (1) TW322449B (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182373A (ja) * 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
US20020089656A1 (en) * 2001-01-09 2002-07-11 Cheng Guo Containers for lithography mask and method of use
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6623893B1 (en) 2001-01-26 2003-09-23 Advanced Micro Devices, Inc. Pellicle for use in EUV lithography and a method of making such a pellicle
US6544693B2 (en) 2001-01-26 2003-04-08 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle
US6593035B1 (en) 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
US7138640B1 (en) 2002-10-17 2006-11-21 Kla-Tencor Technologies, Corporation Method and apparatus for protecting surfaces of optical components
JP4358683B2 (ja) * 2004-05-31 2009-11-04 信越化学工業株式会社 ペリクルフレーム及びフォトリソグラフィー用ペリクル
KR101524104B1 (ko) 2008-05-13 2015-05-29 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 박리 방법 및 이 방법에 사용하는 박리 장치
JP2011028091A (ja) * 2009-07-28 2011-02-10 Shin-Etsu Chemical Co Ltd ペリクル
JP5199217B2 (ja) * 2009-11-02 2013-05-15 信越化学工業株式会社 ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
CN102971673B (zh) * 2010-07-09 2015-10-07 三井化学株式会社 防护膜组件及用于防护膜组件的掩模粘接剂
JP6519190B2 (ja) * 2015-01-16 2019-05-29 日本軽金属株式会社 ペリクル用支持枠
JP2016139103A (ja) * 2015-01-29 2016-08-04 日本軽金属株式会社 ペリクル用支持枠

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0325442A (ja) * 1989-06-22 1991-02-04 Matsushita Electron Corp ペリクルフレーム
DE4021863A1 (de) * 1990-07-09 1992-01-16 Buchtal Gmbh Verfahren zur verlegung eines fussbodenbelags, insbesondere fussbodenplatten, sowie fussbodenbelag
JPH05289314A (ja) * 1992-04-08 1993-11-05 Fujitsu Ltd ペリクル
JPH0619124A (ja) * 1992-07-01 1994-01-28 Seiko Epson Corp ペリクルフレーム及び半導体装置の製造方法
JP3071348B2 (ja) * 1993-10-21 2000-07-31 信越化学工業株式会社 ペリクルおよびその剥離方法
US5529819A (en) * 1995-04-17 1996-06-25 Inko Industrial Corporation Pellicle assembly with vent structure
JP3025442U (ja) 1995-12-04 1996-06-21 株式会社産陽商事 クリップ付きタバコパイプ

Also Published As

Publication number Publication date
DE69700845T2 (de) 2000-05-18
JPH09206723A (ja) 1997-08-12
KR970058797A (ko) 1997-08-12
US5729325A (en) 1998-03-17
DE69700845D1 (de) 2000-01-05
EP0788028A2 (en) 1997-08-06
JP3209073B2 (ja) 2001-09-17
TW322449B (https=) 1997-12-11
EP0788028A3 (https=) 1997-08-27
EP0788028B1 (en) 1999-12-01

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