KR0166396B1 - 방사 입사빔의 패턴화를 위한 레티클 - Google Patents

방사 입사빔의 패턴화를 위한 레티클 Download PDF

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Publication number
KR0166396B1
KR0166396B1 KR1019940036685A KR19940036685A KR0166396B1 KR 0166396 B1 KR0166396 B1 KR 0166396B1 KR 1019940036685 A KR1019940036685 A KR 1019940036685A KR 19940036685 A KR19940036685 A KR 19940036685A KR 0166396 B1 KR0166396 B1 KR 0166396B1
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KR
South Korea
Prior art keywords
radiation
pattern
reticle
disturbance
modulation pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019940036685A
Other languages
English (en)
Korean (ko)
Other versions
KR950020979A (ko
Inventor
에우겐 데이비스 도날드
Original Assignee
윌리암 티. 엘리스
인터내셔널 비지네스 머신즈 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 윌리암 티. 엘리스, 인터내셔널 비지네스 머신즈 코포레이션 filed Critical 윌리암 티. 엘리스
Publication of KR950020979A publication Critical patent/KR950020979A/ko
Application granted granted Critical
Publication of KR0166396B1 publication Critical patent/KR0166396B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H10P76/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31764—Dividing into sub-patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31788—Lithography by projection through mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31793—Problems associated with lithography
    • H01J2237/31794—Problems associated with lithography affecting masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1019940036685A 1993-12-23 1994-12-22 방사 입사빔의 패턴화를 위한 레티클 Expired - Fee Related KR0166396B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US8/173315 1993-12-23
US08/173,315 US5523580A (en) 1993-12-23 1993-12-23 Reticle having a number of subfields
US08/173315 1993-12-24

Publications (2)

Publication Number Publication Date
KR950020979A KR950020979A (ko) 1995-07-26
KR0166396B1 true KR0166396B1 (ko) 1999-02-01

Family

ID=22631464

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940036685A Expired - Fee Related KR0166396B1 (ko) 1993-12-23 1994-12-22 방사 입사빔의 패턴화를 위한 레티클

Country Status (6)

Country Link
US (1) US5523580A (enExample)
EP (1) EP0660371A3 (enExample)
JP (1) JP2730687B2 (enExample)
KR (1) KR0166396B1 (enExample)
CA (1) CA2131669C (enExample)
TW (1) TW256930B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5773837A (en) * 1994-11-22 1998-06-30 Nikon Corporation Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus
US5689117A (en) * 1994-11-22 1997-11-18 Nikon Corporation Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus
JPH0974064A (ja) * 1995-06-26 1997-03-18 Nikon Corp 荷電粒子線によるパターン転写方法及び転写装置
JP3601630B2 (ja) * 1995-11-01 2004-12-15 株式会社ニコン 荷電粒子線転写方法
JP4075019B2 (ja) * 1996-01-10 2008-04-16 株式会社ニコン 固体撮像装置
JP3125724B2 (ja) * 1997-08-22 2001-01-22 日本電気株式会社 荷電粒子線描画用のパターンデータ作成方法
JPH11162823A (ja) * 1997-12-01 1999-06-18 Nikon Corp マスク作製用部材、マスク及びそれらの製造方法
JPH11204423A (ja) 1998-01-14 1999-07-30 Nikon Corp パターン転写方法及びパターン転写用マスク
US6177218B1 (en) 1998-08-07 2001-01-23 Lucent Technologies Inc. Lithographic process for device fabrication using electron beam imaging
US6437352B1 (en) * 1999-06-01 2002-08-20 Nikon Corporation Charged particle beam projection lithography with variable beam shaping
US6090528A (en) * 1999-10-27 2000-07-18 Gordon; Michael S. Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge
US6472123B1 (en) 2000-05-15 2002-10-29 Micron Technology, Inc. Multiple pass write method and reticle
DE10044199B9 (de) 2000-09-07 2005-07-28 Carl Zeiss Smt Ag Ablenkanordnung und Projektionssystem für geladene Teilchen
DE10109965A1 (de) 2001-03-01 2002-09-12 Zeiss Carl Teilchenoptische Linsenanordnung und Verfahren unter Einsatz einer solchen Linsenanordnung
US6768125B2 (en) * 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
US6818910B2 (en) 2002-08-23 2004-11-16 Micron Technology, Inc. Writing methodology to reduce write time, and system for performing same
JP4328509B2 (ja) * 2002-10-10 2009-09-09 Ｎｅｃ液晶テクノロジー株式会社 基板の露光方法
US7692167B1 (en) * 2006-10-26 2010-04-06 Kla-Tencor Technologies Corporation High-fidelity reflection electron beam lithography
JP5243898B2 (ja) * 2008-09-19 2013-07-24 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置および荷電粒子ビーム描画方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2702445C3 (de) * 1977-01-20 1980-10-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Korpuskularstrahloptisches Gerät zur verkleinernden Abbildung einer Maske auf ein zu bestrahlendes Präparat
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
JPH0732108B2 (ja) * 1982-07-28 1995-04-10 株式会社日立製作所 電子線露光装置
US4544846A (en) * 1983-06-28 1985-10-01 International Business Machines Corporation Variable axis immersion lens electron beam projection system
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
US5364718A (en) * 1988-09-06 1994-11-15 Fujitsu Limited Method of exposing patttern of semiconductor devices and stencil mask for carrying out same
JP2706099B2 (ja) * 1988-09-06 1998-01-28 富士通株式会社 半導体装置の製造方法
DE68924122T2 (de) * 1988-10-20 1996-05-09 Fujitsu Ltd Herstellungsverfahren für Halbleitervorrichtungen und durchsichtige Maske für den geladenen Teilchenstrahl.
NL8903108A (nl) * 1989-12-20 1991-07-16 Philips Nv Werkwijze voor de vervaardiging van een inrichting en maskergroep voor de werkwijze.
JP2837515B2 (ja) * 1990-06-20 1998-12-16 富士通株式会社 電子ビーム露光装置
JP2798796B2 (ja) * 1990-07-18 1998-09-17 沖電気工業株式会社 パターン形成方法
JPH04212957A (ja) * 1990-10-19 1992-08-04 Fujitsu Ltd レチクル及び露光方法
DE69223759T2 (de) * 1992-01-31 1998-04-23 Mitsubishi Electric Corp Phasenverschiebungsmaske und Verfahren zur Erzeugung eines Fotolackmusters unter Verwendung dieser Maske

Also Published As

Publication number Publication date
US5523580A (en) 1996-06-04
EP0660371A2 (en) 1995-06-28
KR950020979A (ko) 1995-07-26
EP0660371A3 (en) 1995-08-23
TW256930B (enExample) 1995-09-11
CA2131669A1 (en) 1995-06-24
JP2730687B2 (ja) 1998-03-25
JPH07209855A (ja) 1995-08-11
CA2131669C (en) 1999-05-25

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