KR0165857B1 - 종형 열처리 장치 - Google Patents

종형 열처리 장치 Download PDF

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Publication number
KR0165857B1
KR0165857B1 KR1019920002283A KR920002283A KR0165857B1 KR 0165857 B1 KR0165857 B1 KR 0165857B1 KR 1019920002283 A KR1019920002283 A KR 1019920002283A KR 920002283 A KR920002283 A KR 920002283A KR 0165857 B1 KR0165857 B1 KR 0165857B1
Authority
KR
South Korea
Prior art keywords
heat treatment
clean gas
air space
exhaust
vertical heat
Prior art date
Application number
KR1019920002283A
Other languages
English (en)
Korean (ko)
Other versions
KR920017200A (ko
Inventor
가즈나리 사카타
Original Assignee
이노우에 다케시
도오교오 에레구토론 사가미 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이노우에 다케시, 도오교오 에레구토론 사가미 가부시끼 가이샤 filed Critical 이노우에 다케시
Publication of KR920017200A publication Critical patent/KR920017200A/ko
Application granted granted Critical
Publication of KR0165857B1 publication Critical patent/KR0165857B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Furnace Details (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Ventilation (AREA)
KR1019920002283A 1991-02-26 1992-02-15 종형 열처리 장치 KR0165857B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP91-103694 1991-02-26
JP03103694A JP3108460B2 (ja) 1991-02-26 1991-02-26 縦型熱処理装置

Publications (2)

Publication Number Publication Date
KR920017200A KR920017200A (ko) 1992-09-26
KR0165857B1 true KR0165857B1 (ko) 1999-02-01

Family

ID=14360891

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920002283A KR0165857B1 (ko) 1991-02-26 1992-02-15 종형 열처리 장치

Country Status (3)

Country Link
US (1) US5226812A (ja)
JP (1) JP3108460B2 (ja)
KR (1) KR0165857B1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100598430B1 (ko) * 2002-04-11 2006-07-10 에스펙 가부시키가이샤 필터발진 처리기능을 갖는 열처리장치
KR101108317B1 (ko) * 2004-12-31 2012-01-25 엘지디스플레이 주식회사 열처리 장치

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05217929A (ja) * 1992-01-31 1993-08-27 Tokyo Electron Tohoku Kk 酸化拡散処理装置
US5378145A (en) * 1992-07-15 1995-01-03 Tokyo Electron Kabushiki Kaisha Treatment system and treatment apparatus
JP3134137B2 (ja) * 1993-01-13 2001-02-13 東京エレクトロン株式会社 縦型処理装置
TW273574B (ja) * 1993-12-10 1996-04-01 Tokyo Electron Co Ltd
JP3982844B2 (ja) * 1995-01-12 2007-09-26 株式会社日立国際電気 半導体製造装置及び半導体の製造方法
US5662470A (en) * 1995-03-31 1997-09-02 Asm International N.V. Vertical furnace
KR100626386B1 (ko) * 2004-09-20 2006-09-20 삼성전자주식회사 반도체 기판 제조에 사용되는 기판 처리 장치 및 기판처리 방법
US9460945B2 (en) * 2006-11-06 2016-10-04 Hitachi Kokusai Electric Inc. Substrate processing apparatus for semiconductor devices
JP5144207B2 (ja) * 2006-11-06 2013-02-13 株式会社日立国際電気 基板処理装置および半導体装置の製造方法
KR101166659B1 (ko) 2010-01-07 2012-07-18 장종래 내지를 감싸는 표지구조를 갖는 졸업 앨범
JP5770042B2 (ja) * 2011-08-04 2015-08-26 東京エレクトロン株式会社 熱処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4610628A (en) * 1983-12-28 1986-09-09 Denkoh Co., Ltd. Vertical furnace for heat-treating semiconductor
KR960001161B1 (ko) * 1987-09-29 1996-01-19 도오교오 에레구토론 사가미 가부시끼가이샤 열처리장치
US4981436A (en) * 1988-08-08 1991-01-01 Tel Sagami Limited Vertical type heat-treatment apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100598430B1 (ko) * 2002-04-11 2006-07-10 에스펙 가부시키가이샤 필터발진 처리기능을 갖는 열처리장치
KR101108317B1 (ko) * 2004-12-31 2012-01-25 엘지디스플레이 주식회사 열처리 장치

Also Published As

Publication number Publication date
KR920017200A (ko) 1992-09-26
JPH04269825A (ja) 1992-09-25
JP3108460B2 (ja) 2000-11-13
US5226812A (en) 1993-07-13

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