JPWO2025238822A5 - - Google Patents

Info

Publication number
JPWO2025238822A5
JPWO2025238822A5 JP2025531200A JP2025531200A JPWO2025238822A5 JP WO2025238822 A5 JPWO2025238822 A5 JP WO2025238822A5 JP 2025531200 A JP2025531200 A JP 2025531200A JP 2025531200 A JP2025531200 A JP 2025531200A JP WO2025238822 A5 JPWO2025238822 A5 JP WO2025238822A5
Authority
JP
Japan
Prior art keywords
mass
coating agent
etching resist
forming
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2025531200A
Other languages
English (en)
Japanese (ja)
Other versions
JP7719988B1 (ja
JPWO2025238822A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/018227 external-priority patent/WO2025238822A1/ja
Application granted granted Critical
Publication of JP7719988B1 publication Critical patent/JP7719988B1/ja
Publication of JPWO2025238822A1 publication Critical patent/JPWO2025238822A1/ja
Publication of JPWO2025238822A5 publication Critical patent/JPWO2025238822A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2025531200A 2024-05-16 2024-05-16 エッチングレジスト被膜形成用被覆剤 Active JP7719988B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/018227 WO2025238822A1 (ja) 2024-05-16 2024-05-16 エッチングレジスト被膜形成用被覆剤

Publications (3)

Publication Number Publication Date
JP7719988B1 JP7719988B1 (ja) 2025-08-06
JPWO2025238822A1 JPWO2025238822A1 (https=) 2025-11-20
JPWO2025238822A5 true JPWO2025238822A5 (https=) 2026-04-21

Family

ID=96625336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025531200A Active JP7719988B1 (ja) 2024-05-16 2024-05-16 エッチングレジスト被膜形成用被覆剤

Country Status (3)

Country Link
EP (1) EP4675009A4 (https=)
JP (1) JP7719988B1 (https=)
WO (1) WO2025238822A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS504616B2 (https=) * 1971-08-31 1975-02-21
JPH086140B2 (ja) 1990-08-01 1996-01-24 川崎製鉄株式会社 低鉄損方向性電磁鋼板の製造方法
JP2942074B2 (ja) 1992-09-30 1999-08-30 川崎製鉄株式会社 低鉄損方向性電磁鋼板の製造方法
JP6410316B2 (ja) * 2015-03-27 2018-10-24 日本化薬株式会社 ポリエステル樹脂、それを用いた組成物、およびその用途
JP6501207B2 (ja) * 2016-08-03 2019-04-17 Ｊｆｅスチール株式会社 絶縁被膜付き電磁鋼板およびその製造方法、ならびに絶縁被膜形成用被覆剤
JP6304439B1 (ja) * 2017-03-24 2018-04-04 東洋インキＳｃホールディングス株式会社 顔料、顔料水性分散体、その用途及びその製造方法
JP6977814B2 (ja) * 2020-05-15 2021-12-08 Ｊｆｅスチール株式会社 線状溝形成方法および方向性電磁鋼板の製造方法

Similar Documents

Publication Publication Date Title
TW477796B (en) Improved thermosetting anti-reflective coatings
WO2011040340A1 (ja) パターン形成方法及びレジスト下層膜形成用組成物
DE1769495A1 (de) Wasserloesliche UEberzugsmassen
EP3040776B1 (en) Photomask blank, resist pattern forming process, and method for making photomask
JP2021120754A5 (https=)
JPWO2025238822A5 (https=)
US3749769A (en) Nail lacquer compositions and process for the preparation thereof
US9017923B2 (en) Negative resist composition and patterning process using the same
KR20010065739A (ko) 유기 반사 방지막용 중합체 및 그의 제조방법
JP2018044056A (ja) 易接着層形成用樹脂組成物及び易接着性材料
JPH01502032A (ja) 仕上シート及び継目なし縁取りの単層被覆のための水性の、着色２成分ラツカー
JPWO2025239439A5 (https=)
EP1235864B1 (en) No-rub finishing compositions
JPWO2020250825A5 (ja) 導電層付基板及びタッチパネル用部材
DE2263459C3 (de) Verfahren zum Herstellen von undurchsichtigen Überzügen oder Beschichtungen mit hohem Deckvermögen durch Strahlungshärtung von Kunstharzmassen und Überzugsmittel zur Durchführung des Verfahrens
CN103305044B (zh) 光固化罩光漆
GB776403A (en) Improvements in or relating to catalysts and to coating compositions containing the same
JPH0455480A (ja) 熱硬化被覆組成物
JPH03124776A (ja) メタクリル系ラッカー組成物
JPH08277321A (ja) 光硬化性樹脂組成物
JPWO2023042600A5 (https=)
ES369269A1 (es) Procedimiento para la preparacion de lacas compuestas.
TW201802601A (zh) 聚合物、負型光阻材料及圖案形成方法
JPWO2023053593A5 (https=)
CN104356378A (zh) 一种三维打印用低粘度光固化预聚物的制备方法