JP7719988B1 - エッチングレジスト被膜形成用被覆剤 - Google Patents

エッチングレジスト被膜形成用被覆剤

Info

Publication number
JP7719988B1
JP7719988B1 JP2025531200A JP2025531200A JP7719988B1 JP 7719988 B1 JP7719988 B1 JP 7719988B1 JP 2025531200 A JP2025531200 A JP 2025531200A JP 2025531200 A JP2025531200 A JP 2025531200A JP 7719988 B1 JP7719988 B1 JP 7719988B1
Authority
JP
Japan
Prior art keywords
resist film
etching resist
forming
coating agent
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2025531200A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025238822A5 (https=
JPWO2025238822A1 (https=
Inventor
暢子 中川
直樹 村松
千代子 多田
健吾 中村
智則 杉下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Dai Nippon Toryo Co Ltd
Original Assignee
JFE Steel Corp
Dai Nippon Toryo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JFE Steel Corp, Dai Nippon Toryo Co Ltd filed Critical JFE Steel Corp
Application granted granted Critical
Publication of JP7719988B1 publication Critical patent/JP7719988B1/ja
Publication of JPWO2025238822A1 publication Critical patent/JPWO2025238822A1/ja
Publication of JPWO2025238822A5 publication Critical patent/JPWO2025238822A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/24—Acids; Salts thereof
    • C08K3/26—Carbonates; Bicarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C08L61/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D167/08—Polyesters modified with higher fatty oils or their acids, or with natural resins or resin acids
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/06—Etching of iron or steel
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/24—Acids; Salts thereof
    • C08K3/26—Carbonates; Bicarbonates
    • C08K2003/262—Alkali metal carbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C08K2003/3045—Sulfates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Paints Or Removers (AREA)
JP2025531200A 2024-05-16 2024-05-16 エッチングレジスト被膜形成用被覆剤 Active JP7719988B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/018227 WO2025238822A1 (ja) 2024-05-16 2024-05-16 エッチングレジスト被膜形成用被覆剤

Publications (3)

Publication Number Publication Date
JP7719988B1 true JP7719988B1 (ja) 2025-08-06
JPWO2025238822A1 JPWO2025238822A1 (https=) 2025-11-20
JPWO2025238822A5 JPWO2025238822A5 (https=) 2026-04-21

Family

ID=96625336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025531200A Active JP7719988B1 (ja) 2024-05-16 2024-05-16 エッチングレジスト被膜形成用被覆剤

Country Status (3)

Country Link
EP (1) EP4675009A4 (https=)
JP (1) JP7719988B1 (https=)
WO (1) WO2025238822A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832739A (https=) * 1971-08-31 1973-05-02
JP2016183310A (ja) * 2015-03-27 2016-10-20 日本化薬株式会社 ポリエステル樹脂、それを用いた組成物、およびその用途
JP2018021120A (ja) * 2016-08-03 2018-02-08 Ｊｆｅスチール株式会社 絶縁被膜付き電磁鋼板およびその製造方法、ならびに絶縁被膜形成用被覆剤
JP2018162430A (ja) * 2017-03-24 2018-10-18 東洋インキＳｃホールディングス株式会社 顔料、顔料水性分散体、その用途及びその製造方法
WO2021229933A1 (ja) * 2020-05-15 2021-11-18 Ｊｆｅスチール株式会社 線状溝形成方法および方向性電磁鋼板の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH086140B2 (ja) 1990-08-01 1996-01-24 川崎製鉄株式会社 低鉄損方向性電磁鋼板の製造方法
JP2942074B2 (ja) 1992-09-30 1999-08-30 川崎製鉄株式会社 低鉄損方向性電磁鋼板の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832739A (https=) * 1971-08-31 1973-05-02
JP2016183310A (ja) * 2015-03-27 2016-10-20 日本化薬株式会社 ポリエステル樹脂、それを用いた組成物、およびその用途
JP2018021120A (ja) * 2016-08-03 2018-02-08 Ｊｆｅスチール株式会社 絶縁被膜付き電磁鋼板およびその製造方法、ならびに絶縁被膜形成用被覆剤
JP2018162430A (ja) * 2017-03-24 2018-10-18 東洋インキＳｃホールディングス株式会社 顔料、顔料水性分散体、その用途及びその製造方法
WO2021229933A1 (ja) * 2020-05-15 2021-11-18 Ｊｆｅスチール株式会社 線状溝形成方法および方向性電磁鋼板の製造方法

Also Published As

Publication number Publication date
WO2025238822A1 (ja) 2025-11-20
EP4675009A1 (en) 2026-01-07
EP4675009A4 (en) 2026-05-06
JPWO2025238822A1 (https=) 2025-11-20

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