JPWO2023189058A5 - - Google Patents
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- Publication number
- JPWO2023189058A5 JPWO2023189058A5 JP2024511475A JP2024511475A JPWO2023189058A5 JP WO2023189058 A5 JPWO2023189058 A5 JP WO2023189058A5 JP 2024511475 A JP2024511475 A JP 2024511475A JP 2024511475 A JP2024511475 A JP 2024511475A JP WO2023189058 A5 JPWO2023189058 A5 JP WO2023189058A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- region
- trench structure
- sic semiconductor
- sidewall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022061146 | 2022-03-31 | ||
| PCT/JP2023/006637 WO2023189058A1 (ja) | 2022-03-31 | 2023-02-24 | SiC半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023189058A1 JPWO2023189058A1 (https=) | 2023-10-05 |
| JPWO2023189058A5 true JPWO2023189058A5 (https=) | 2024-12-10 |
Family
ID=88200452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024511475A Pending JPWO2023189058A1 (https=) | 2022-03-31 | 2023-02-24 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20250022916A1 (https=) |
| JP (1) | JPWO2023189058A1 (https=) |
| WO (1) | WO2023189058A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023015636A (ja) * | 2021-07-20 | 2023-02-01 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015103067B3 (de) * | 2015-03-03 | 2016-09-01 | Infineon Technologies Ag | Halbleitervorrichtung mit trenchgatestrukturen in einem halbleiterkörper mit hexagonalem kristallgitter |
| JP7067021B2 (ja) * | 2017-11-07 | 2022-05-16 | 富士電機株式会社 | 絶縁ゲート型半導体装置及びその製造方法 |
| US12080760B2 (en) * | 2018-08-07 | 2024-09-03 | Rohm Co., Ltd. | SiC semiconductor device |
| JP7246237B2 (ja) * | 2019-04-15 | 2023-03-27 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
-
2023
- 2023-02-24 JP JP2024511475A patent/JPWO2023189058A1/ja active Pending
- 2023-02-24 WO PCT/JP2023/006637 patent/WO2023189058A1/ja not_active Ceased
-
2024
- 2024-09-30 US US18/900,918 patent/US20250022916A1/en active Pending
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