JPWO2023079787A5 - - Google Patents
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- JPWO2023079787A5 JPWO2023079787A5 JP2023557620A JP2023557620A JPWO2023079787A5 JP WO2023079787 A5 JPWO2023079787 A5 JP WO2023079787A5 JP 2023557620 A JP2023557620 A JP 2023557620A JP 2023557620 A JP2023557620 A JP 2023557620A JP WO2023079787 A5 JPWO2023079787 A5 JP WO2023079787A5
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- substrate
- top plate
- area
- mist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021179788 | 2021-11-02 | ||
| JP2021179788 | 2021-11-02 | ||
| PCT/JP2022/026034 WO2023079787A1 (ja) | 2021-11-02 | 2022-06-29 | 成膜装置及び成膜方法並びに酸化物半導体膜及び積層体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023079787A1 JPWO2023079787A1 (https=) | 2023-05-11 |
| JPWO2023079787A5 true JPWO2023079787A5 (https=) | 2024-07-24 |
| JP7762218B2 JP7762218B2 (ja) | 2025-10-29 |
Family
ID=86241027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023557620A Active JP7762218B2 (ja) | 2021-11-02 | 2022-06-29 | 成膜装置及び成膜方法並びに積層体 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240425982A1 (https=) |
| EP (1) | EP4428902A4 (https=) |
| JP (1) | JP7762218B2 (https=) |
| KR (1) | KR20240101567A (https=) |
| CN (1) | CN118235232A (https=) |
| TW (1) | TW202319580A (https=) |
| WO (1) | WO2023079787A1 (https=) |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5397794U (https=) | 1977-01-12 | 1978-08-08 | ||
| JP2671367B2 (ja) | 1988-04-06 | 1997-10-29 | 富士通株式会社 | 気相エピタキシャル成長装置 |
| JPH11274024A (ja) * | 1998-03-18 | 1999-10-08 | Tokyo Electron Ltd | 処理液供給装置及び処理液供給方法 |
| JP5124760B2 (ja) | 2004-04-19 | 2013-01-23 | 静雄 藤田 | 成膜方法及び成膜装置 |
| JP2012046772A (ja) | 2010-08-24 | 2012-03-08 | Sharp Corp | ミストｃｖｄ装置及びミスト発生方法 |
| US9490152B2 (en) * | 2012-05-29 | 2016-11-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Asymmetrical chamber configuration |
| JP5397794B1 (ja) | 2013-06-04 | 2014-01-22 | Ｒｏｃａ株式会社 | 酸化物結晶薄膜の製造方法 |
| JP6503730B2 (ja) * | 2014-12-22 | 2019-04-24 | 東京エレクトロン株式会社 | 成膜装置 |
| CN108699692B (zh) * | 2016-04-26 | 2021-03-02 | 东芝三菱电机产业系统株式会社 | 成膜装置 |
| US9972501B1 (en) * | 2017-03-14 | 2018-05-15 | Nano-Master, Inc. | Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD) |
| JP6934852B2 (ja) * | 2018-12-18 | 2021-09-15 | 信越化学工業株式会社 | 酸化ガリウム膜の製造方法 |
| JP7301966B2 (ja) | 2019-06-25 | 2023-07-03 | 日本碍子株式会社 | 半導体膜 |
| KR102849602B1 (ko) * | 2019-09-30 | 2025-08-21 | 가부시키가이샤 플로스피아 | 적층 구조체 및 반도체 장치 |
| JP6925548B1 (ja) * | 2020-07-08 | 2021-08-25 | 信越化学工業株式会社 | 酸化ガリウム半導体膜の製造方法及び成膜装置 |
| TWM636275U (zh) * | 2021-03-12 | 2023-01-11 | 日商信越化學工業股份有限公司 | 成膜系統及成膜裝置 |
| EP4417732A1 (en) * | 2021-10-14 | 2024-08-21 | Shin-Etsu Chemical Co., Ltd. | Film deposition device and manufacturing method |
-
2022
- 2022-06-29 US US18/705,777 patent/US20240425982A1/en active Pending
- 2022-06-29 KR KR1020247014135A patent/KR20240101567A/ko not_active Withdrawn
- 2022-06-29 WO PCT/JP2022/026034 patent/WO2023079787A1/ja not_active Ceased
- 2022-06-29 CN CN202280073199.3A patent/CN118235232A/zh active Pending
- 2022-06-29 JP JP2023557620A patent/JP7762218B2/ja active Active
- 2022-06-29 EP EP22889612.2A patent/EP4428902A4/en active Pending
- 2022-07-05 TW TW111125085A patent/TW202319580A/zh unknown
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