JPWO2023037948A5 - - Google Patents

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Publication number
JPWO2023037948A5
JPWO2023037948A5 JP2023546907A JP2023546907A JPWO2023037948A5 JP WO2023037948 A5 JPWO2023037948 A5 JP WO2023037948A5 JP 2023546907 A JP2023546907 A JP 2023546907A JP 2023546907 A JP2023546907 A JP 2023546907A JP WO2023037948 A5 JPWO2023037948 A5 JP WO2023037948A5
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JP
Japan
Prior art keywords
heater
vaporizer
flow path
gas flow
vaporizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023546907A
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English (en)
Japanese (ja)
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JPWO2023037948A1 (https=
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Priority claimed from PCT/JP2022/032835 external-priority patent/WO2023037948A1/ja
Publication of JPWO2023037948A1 publication Critical patent/JPWO2023037948A1/ja
Publication of JPWO2023037948A5 publication Critical patent/JPWO2023037948A5/ja
Pending legal-status Critical Current

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JP2023546907A 2021-09-09 2022-08-31 Pending JPWO2023037948A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021147115 2021-09-09
PCT/JP2022/032835 WO2023037948A1 (ja) 2021-09-09 2022-08-31 気化器

Publications (2)

Publication Number Publication Date
JPWO2023037948A1 JPWO2023037948A1 (https=) 2023-03-16
JPWO2023037948A5 true JPWO2023037948A5 (https=) 2024-06-03

Family

ID=85506656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023546907A Pending JPWO2023037948A1 (https=) 2021-09-09 2022-08-31

Country Status (5)

Country Link
US (1) US20240353094A1 (https=)
JP (1) JPWO2023037948A1 (https=)
KR (1) KR20240052767A (https=)
CN (1) CN117916864A (https=)
WO (1) WO2023037948A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250163884A (ko) * 2023-03-17 2025-11-21 구와나 메탈스, 엘티디. 기화기, 및 반도체 제조 장치에 재료 가스를 공급하는 방법
US20250259815A1 (en) * 2024-02-14 2025-08-14 Applied Materials, Inc. Thermoelectric control for a crucible for use with an ion source

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01163400A (ja) 1987-12-17 1989-06-27 Toshiba Corp トンネルの換気制御装置
JP2538042B2 (ja) 1989-03-29 1996-09-25 株式会社エステック 有機金属化合物の気化供給方法とその装置
US5451258A (en) * 1994-05-11 1995-09-19 Materials Research Corporation Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber
JP3828821B2 (ja) 2002-03-13 2006-10-04 株式会社堀場エステック 液体材料気化供給装置
WO2008045972A2 (en) * 2006-10-10 2008-04-17 Asm America, Inc. Precursor delivery system
JP5104151B2 (ja) 2007-09-18 2012-12-19 東京エレクトロン株式会社 気化装置、成膜装置、成膜方法及び記憶媒体
JP2011054789A (ja) * 2009-09-02 2011-03-17 Hitachi Kokusai Electric Inc 基板処理装置

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