JPWO2022201253A5 - - Google Patents
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- Publication number
- JPWO2022201253A5 JPWO2022201253A5 JP2023508173A JP2023508173A JPWO2022201253A5 JP WO2022201253 A5 JPWO2022201253 A5 JP WO2022201253A5 JP 2023508173 A JP2023508173 A JP 2023508173A JP 2023508173 A JP2023508173 A JP 2023508173A JP WO2022201253 A5 JPWO2022201253 A5 JP WO2022201253A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- metal
- hole
- material containing
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/011752 WO2022201253A1 (ja) | 2021-03-22 | 2021-03-22 | 超電導デバイス、超電導デバイスの製造方法及び積層体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022201253A1 JPWO2022201253A1 (enExample) | 2022-09-29 |
| JPWO2022201253A5 true JPWO2022201253A5 (enExample) | 2023-09-12 |
| JP7563578B2 JP7563578B2 (ja) | 2024-10-08 |
Family
ID=83395369
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023508173A Active JP7563578B2 (ja) | 2021-03-22 | 2021-03-22 | 超電導デバイス、超電導デバイスの製造方法及び積層体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240237557A1 (enExample) |
| EP (1) | EP4318618B1 (enExample) |
| JP (1) | JP7563578B2 (enExample) |
| CN (1) | CN116897616A (enExample) |
| FI (1) | FI4318618T3 (enExample) |
| WO (1) | WO2022201253A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240155767A1 (en) * | 2022-11-09 | 2024-05-09 | Micron Technology, Inc. | Filling cracks on a substrate via |
| EP4626213A1 (en) * | 2022-11-22 | 2025-10-01 | Fujitsu Limited | Device and manufacturing method for device |
| WO2025046715A1 (ja) * | 2023-08-28 | 2025-03-06 | 富士通株式会社 | 量子ビットデバイス及び量子ビットデバイスの製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6029165B2 (ja) * | 1977-02-08 | 1985-07-09 | 三菱電機株式会社 | 超電導化合物線およびその製造方法 |
| JPH0269994A (ja) * | 1988-09-05 | 1990-03-08 | Mitsubishi Mining & Cement Co Ltd | セラミック超伝導体多層配線基板およびその製造方法 |
| JP3118562B2 (ja) * | 1997-12-08 | 2000-12-18 | 工業技術院長 | 超電導集積回路構造及びその製造方法 |
| US9836699B1 (en) * | 2015-04-27 | 2017-12-05 | Rigetti & Co. | Microwave integrated quantum circuits with interposer |
| US10242968B2 (en) * | 2015-11-05 | 2019-03-26 | Massachusetts Institute Of Technology | Interconnect structure and semiconductor structures for assembly of cryogenic electronic packages |
| KR102109070B1 (ko) * | 2015-12-15 | 2020-05-11 | 구글 엘엘씨 | 초전도 범프 본드 |
| US10291231B2 (en) * | 2016-07-20 | 2019-05-14 | Microsoft Technology Licensing, Llc | Superconducting device with dummy elements |
| US10325870B2 (en) | 2017-05-09 | 2019-06-18 | International Business Machines Corporation | Through-substrate-vias with self-aligned solder bumps |
-
2021
- 2021-03-22 FI FIEP21932866.3T patent/FI4318618T3/fi active
- 2021-03-22 JP JP2023508173A patent/JP7563578B2/ja active Active
- 2021-03-22 WO PCT/JP2021/011752 patent/WO2022201253A1/ja not_active Ceased
- 2021-03-22 CN CN202180091628.5A patent/CN116897616A/zh active Pending
- 2021-03-22 EP EP21932866.3A patent/EP4318618B1/en active Active
-
2023
- 2023-07-13 US US18/351,575 patent/US20240237557A1/en active Pending
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