JPWO2022123814A1 - - Google Patents

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Publication number
JPWO2022123814A1
JPWO2022123814A1 JP2022520559A JP2022520559A JPWO2022123814A1 JP WO2022123814 A1 JPWO2022123814 A1 JP WO2022123814A1 JP 2022520559 A JP2022520559 A JP 2022520559A JP 2022520559 A JP2022520559 A JP 2022520559A JP WO2022123814 A1 JPWO2022123814 A1 JP WO2022123814A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022520559A
Other versions
JP7218478B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022123814A1 publication Critical patent/JPWO2022123814A1/ja
Application granted granted Critical
Publication of JP7218478B2 publication Critical patent/JP7218478B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437—Multilayer systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Electrostatic Separation (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Chemical Vapour Deposition (AREA)
JP2022520559A 2020-12-07 2021-06-25 活性ガス生成装置 Active JP7218478B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPPCT/JP2020/045380 2020-12-07
PCT/JP2020/045380 WO2022123615A1 (ja) 2020-12-07 2020-12-07 活性ガス生成装置
PCT/JP2021/024082 WO2022123814A1 (ja) 2020-12-07 2021-06-25 活性ガス生成装置

Publications (2)

Publication Number Publication Date
JPWO2022123814A1 true JPWO2022123814A1 (ja) 2022-06-16
JP7218478B2 JP7218478B2 (ja) 2023-02-06

Family

ID=81974288

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021521448A Active JP7114212B1 (ja) 2020-12-07 2020-12-07 活性ガス生成装置
JP2022520559A Active JP7218478B2 (ja) 2020-12-07 2021-06-25 活性ガス生成装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2021521448A Active JP7114212B1 (ja) 2020-12-07 2020-12-07 活性ガス生成装置

Country Status (7)

Country Link
US (2) US20230034041A1 (ja)
EP (2) EP4258822A1 (ja)
JP (2) JP7114212B1 (ja)
KR (2) KR20220104228A (ja)
CN (2) CN114916255A (ja)
TW (2) TWI788034B (ja)
WO (2) WO2022123615A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021095120A1 (ja) 2019-11-12 2021-05-20 東芝三菱電機産業システム株式会社 活性ガス生成装置
EP3886540B1 (en) * 2019-11-27 2023-05-03 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation device
KR20210127087A (ko) * 2020-04-10 2021-10-21 에이에스엠 아이피 홀딩 비.브이. 기체 공급 유닛 및 이를 포함하는 기판 처리 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108482A (ja) * 2003-09-29 2005-04-21 E Square:Kk プラズマ表面処理装置
JP2007294229A (ja) * 2006-04-25 2007-11-08 Sharp Corp 大気圧プラズマ生成用電極
JP2010521808A (ja) * 2007-03-16 2010-06-24 ソースル シーオー エルティディー プラズマ処理装置及びプラズマ処理方法
JP2016085935A (ja) * 2014-10-29 2016-05-19 東芝三菱電機産業システム株式会社 窒素ラジカル生成システム
WO2019229873A1 (ja) * 2018-05-30 2019-12-05 東芝三菱電機産業システム株式会社 活性ガス生成装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406600B (zh) * 2007-04-30 2013-08-21 K C Tech Co Ltd 電漿產生裝置
CN101835339B (zh) * 2010-05-20 2012-05-23 大连理工大学 常压下平板电极射频电容耦合氩氧/氩氮等离子体发生器
CN103782663B (zh) * 2011-09-08 2016-05-11 东芝三菱电机产业系统株式会社 等离子体产生装置、cvd装置及等离子体处理粒子生成装置
CN104103484B (zh) * 2013-04-15 2017-07-25 中微半导体设备(上海)有限公司 气体供应装置及等离子体处理装置
KR101913978B1 (ko) * 2014-07-25 2018-10-31 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 라디칼 가스 발생 시스템
JP6661283B2 (ja) * 2015-05-14 2020-03-11 東京エレクトロン株式会社 クリーニング方法及びプラズマ処理方法
JP6651652B2 (ja) * 2016-12-05 2020-02-19 東芝三菱電機産業システム株式会社 活性ガス生成装置
EP3641506B1 (en) * 2017-09-06 2023-12-06 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generating device
EP3740045B1 (en) * 2018-01-10 2022-09-28 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
JP7153574B2 (ja) * 2019-01-17 2022-10-14 東京エレクトロン株式会社 上部電極構造、プラズマ処理装置、及び上部電極構造を組み立てる方法
CN111836916B (zh) * 2019-02-13 2022-06-14 东芝三菱电机产业系统株式会社 活性气体生成装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108482A (ja) * 2003-09-29 2005-04-21 E Square:Kk プラズマ表面処理装置
JP2007294229A (ja) * 2006-04-25 2007-11-08 Sharp Corp 大気圧プラズマ生成用電極
JP2010521808A (ja) * 2007-03-16 2010-06-24 ソースル シーオー エルティディー プラズマ処理装置及びプラズマ処理方法
JP2016085935A (ja) * 2014-10-29 2016-05-19 東芝三菱電機産業システム株式会社 窒素ラジカル生成システム
WO2019229873A1 (ja) * 2018-05-30 2019-12-05 東芝三菱電機産業システム株式会社 活性ガス生成装置

Also Published As

Publication number Publication date
CN114916255A (zh) 2022-08-16
TW202222425A (zh) 2022-06-16
TW202228842A (zh) 2022-08-01
EP4072249A4 (en) 2024-01-03
WO2022123615A1 (ja) 2022-06-16
EP4072249A1 (en) 2022-10-12
TWI803076B (zh) 2023-05-21
JP7114212B1 (ja) 2022-08-08
US20230013017A1 (en) 2023-01-19
TWI788034B (zh) 2022-12-21
WO2022123814A1 (ja) 2022-06-16
CN114916256A (zh) 2022-08-16
KR20220104227A (ko) 2022-07-26
KR20220104228A (ko) 2022-07-26
US20230034041A1 (en) 2023-02-02
JPWO2022123615A1 (ja) 2022-06-16
JP7218478B2 (ja) 2023-02-06
EP4258822A1 (en) 2023-10-11

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