JPWO2022118464A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2022118464A5 JPWO2022118464A5 JP2022566738A JP2022566738A JPWO2022118464A5 JP WO2022118464 A5 JPWO2022118464 A5 JP WO2022118464A5 JP 2022566738 A JP2022566738 A JP 2022566738A JP 2022566738 A JP2022566738 A JP 2022566738A JP WO2022118464 A5 JPWO2022118464 A5 JP WO2022118464A5
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- josephson junction
- conductors
- conductor layer
- quantum device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2020/045248 WO2022118464A1 (ja) | 2020-12-04 | 2020-12-04 | 量子デバイス及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022118464A1 JPWO2022118464A1 (https=) | 2022-06-09 |
| JPWO2022118464A5 true JPWO2022118464A5 (https=) | 2023-08-16 |
| JP7567934B2 JP7567934B2 (ja) | 2024-10-16 |
Family
ID=81854075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022566738A Active JP7567934B2 (ja) | 2020-12-04 | 2020-12-04 | 量子デバイス及びその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20230422636A1 (https=) |
| JP (1) | JP7567934B2 (https=) |
| WO (1) | WO2022118464A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115312656B (zh) * | 2022-09-02 | 2025-02-25 | 量子科技长三角产业创新中心 | 一种超导量子约瑟夫森结及其制备方法 |
| WO2025052597A1 (ja) * | 2023-09-06 | 2025-03-13 | 富士通株式会社 | 量子デバイス、量子デバイスの製造方法及び量子デバイスの検査方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59135783A (ja) * | 1983-01-24 | 1984-08-04 | Agency Of Ind Science & Technol | ジヨセフソン記憶装置 |
| JPS6474777A (en) * | 1987-09-17 | 1989-03-20 | Sanyo Electric Co | Manufacture of micro-bridge type josephson device |
| JP2727773B2 (ja) * | 1991-02-25 | 1998-03-18 | 日本電気株式会社 | ジョセフソン集積回路の製造方法 |
| WO2017015432A1 (en) | 2015-07-23 | 2017-01-26 | Massachusetts Institute Of Technology | Superconducting integrated circuit |
| WO2017217961A1 (en) | 2016-06-13 | 2017-12-21 | Intel Corporation | Josephson junctions made from refractory and noble metals |
| WO2019032115A1 (en) * | 2017-08-11 | 2019-02-14 | Intel Corporation | QUANTIC BIT DEVICES WITH JOSEPHSON JUNCTION CONNECTED BELOW SUPPORT CIRCUITS |
-
2020
- 2020-12-04 JP JP2022566738A patent/JP7567934B2/ja active Active
- 2020-12-04 US US18/039,207 patent/US20230422636A1/en active Pending
- 2020-12-04 WO PCT/JP2020/045248 patent/WO2022118464A1/ja not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101225601B1 (ko) | 대면적 나노스케일 패턴형성방법 | |
| JPWO2022118463A5 (https=) | ||
| CN108539004B (zh) | 亚微米约瑟夫森隧道结及其制备方法 | |
| JPWO2022118464A5 (https=) | ||
| CN105633268A (zh) | 一种超导电路结构及其制备方法 | |
| JP3247729B2 (ja) | 半導体装置の製造方法 | |
| CN114497344B (zh) | 深亚微米约瑟夫森隧道结及其制备方法 | |
| JPH01108748A (ja) | 多層配線構造を有する半導体装置 | |
| JPS63260054A (ja) | 半導体集積回路装置 | |
| JPH0228923A (ja) | 半導体装置の製造方法 | |
| CN115915908B (zh) | 一种超导集成电路器件的制备方法 | |
| JPH0612789B2 (ja) | 半導体装置 | |
| JPH0630352B2 (ja) | パタ−ン化層形成法 | |
| JPS5935165B2 (ja) | 多層薄膜コイルの製法 | |
| JP5481928B2 (ja) | 配線層レイアウト方法及び半導体装置 | |
| JPH02161755A (ja) | 半導体装置 | |
| JPS6156476A (ja) | ジヨセフソン接合素子 | |
| JPWO2023199181A5 (ja) | 積層体の作製方法 | |
| JPH0563250A (ja) | 薄膜素子製造方法 | |
| JP2959439B2 (ja) | 多層高温超伝導集積回路の形成方法 | |
| JPS63200578A (ja) | 超伝導回路装置 | |
| JP2843401B2 (ja) | 多層構造配線基板 | |
| JPS63216361A (ja) | 多層配線構造 | |
| JPH04186750A (ja) | 半導体装置の製造方法 | |
| JPH0438830A (ja) | 半導体装置 |