JPWO2022046448A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2022046448A5
JPWO2022046448A5 JP2021560930A JP2021560930A JPWO2022046448A5 JP WO2022046448 A5 JPWO2022046448 A5 JP WO2022046448A5 JP 2021560930 A JP2021560930 A JP 2021560930A JP 2021560930 A JP2021560930 A JP 2021560930A JP WO2022046448 A5 JPWO2022046448 A5 JP WO2022046448A5
Authority
JP
Japan
Prior art keywords
processing method
nanocrystalline diamond
depositing
diamond layer
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021560930A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022549044A5 (https=
JP7417627B2 (ja
JP2022549044A (ja
Publication date
Priority claimed from US17/007,441 external-priority patent/US11594416B2/en
Application filed filed Critical
Publication of JP2022549044A publication Critical patent/JP2022549044A/ja
Publication of JP2022549044A5 publication Critical patent/JP2022549044A5/ja
Publication of JPWO2022046448A5 publication Critical patent/JPWO2022046448A5/ja
Priority to JP2023161812A priority Critical patent/JP2024012282A/ja
Application granted granted Critical
Publication of JP7417627B2 publication Critical patent/JP7417627B2/ja
Priority to JP2025086973A priority patent/JP2025138631A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021560930A 2020-08-31 2021-08-16 ダイヤモンドフィルムのトライボロジー特性の改善 Active JP7417627B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2023161812A JP2024012282A (ja) 2020-08-31 2023-09-26 ダイヤモンドフィルムのトライボロジー特性の改善
JP2025086973A JP2025138631A (ja) 2020-08-31 2025-05-26 ダイヤモンドフィルムのトライボロジー特性の改善

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/007,441 US11594416B2 (en) 2020-08-31 2020-08-31 Tribological properties of diamond films
US17/007,441 2020-08-31
PCT/US2021/046095 WO2022046448A1 (en) 2020-08-31 2021-08-16 Improving tribological properties of diamond films

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023161812A Division JP2024012282A (ja) 2020-08-31 2023-09-26 ダイヤモンドフィルムのトライボロジー特性の改善

Publications (4)

Publication Number Publication Date
JP2022549044A JP2022549044A (ja) 2022-11-24
JP2022549044A5 JP2022549044A5 (https=) 2023-04-14
JPWO2022046448A5 true JPWO2022046448A5 (https=) 2023-04-14
JP7417627B2 JP7417627B2 (ja) 2024-01-18

Family

ID=80353808

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2021560930A Active JP7417627B2 (ja) 2020-08-31 2021-08-16 ダイヤモンドフィルムのトライボロジー特性の改善
JP2023161812A Pending JP2024012282A (ja) 2020-08-31 2023-09-26 ダイヤモンドフィルムのトライボロジー特性の改善
JP2025086973A Pending JP2025138631A (ja) 2020-08-31 2025-05-26 ダイヤモンドフィルムのトライボロジー特性の改善

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2023161812A Pending JP2024012282A (ja) 2020-08-31 2023-09-26 ダイヤモンドフィルムのトライボロジー特性の改善
JP2025086973A Pending JP2025138631A (ja) 2020-08-31 2025-05-26 ダイヤモンドフィルムのトライボロジー特性の改善

Country Status (4)

Country Link
US (2) US11594416B2 (https=)
JP (3) JP7417627B2 (https=)
CN (1) CN114503241B (https=)
WO (1) WO2022046448A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11594416B2 (en) * 2020-08-31 2023-02-28 Applied Materials, Inc. Tribological properties of diamond films
US12148617B2 (en) * 2021-11-01 2024-11-19 International Business Machines Corporation Structure and method to pattern pitch lines
US12442104B2 (en) 2023-04-20 2025-10-14 Applied Materials, Inc. Nanocrystalline diamond with amorphous interfacial layer

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2554100B2 (ja) * 1987-09-10 1996-11-13 三菱重工業株式会社 ダイヤモンド皮膜の研磨方法
JP4018856B2 (ja) * 1999-11-22 2007-12-05 京セラ株式会社 真空チャンバー構成部材
US7079740B2 (en) 2004-03-12 2006-07-18 Applied Materials, Inc. Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides
DE102004025669A1 (de) * 2004-05-21 2005-12-15 Diaccon Gmbh Funktionelle CVD-Diamantschichten auf großflächigen Substraten
JP5341774B2 (ja) * 2007-01-22 2013-11-13 エレメント シックス リミテッド ダイヤモンド表面のプラズマエッチング
US20090017258A1 (en) 2007-07-10 2009-01-15 Carlisle John A Diamond film deposition
US8007910B2 (en) 2007-07-19 2011-08-30 City University Of Hong Kong Ultrahard multilayer coating comprising nanocrystalline diamond and nanocrystalline cubic boron nitride
CN100575545C (zh) * 2008-05-19 2009-12-30 牡丹江师范学院 低成本生长高品质纳米金刚石膜的方法
US8460464B2 (en) * 2009-03-31 2013-06-11 Rajneesh Bhandari Method for producing single crystalline diamonds
US9449982B2 (en) * 2013-03-12 2016-09-20 Sandisk Technologies Llc Method of making a vertical NAND device using a sacrificial layer with air gap and sequential etching of multilayer stacks
EP2832899A1 (fr) 2013-08-02 2015-02-04 The Swatch Group Research and Development Ltd. Revêtement de diamant et procédé de dépôt d'un tel revêtement
US9382625B2 (en) * 2014-05-01 2016-07-05 Applied Materials, Inc. Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition
US9695503B2 (en) 2014-08-22 2017-07-04 Applied Materials, Inc. High power impulse magnetron sputtering process to achieve a high density high SP3 containing layer
TWI656575B (zh) * 2014-09-03 2019-04-11 美商應用材料股份有限公司 用於三維nand硬遮罩應用的奈米結晶鑽石碳膜
US10662523B2 (en) * 2015-05-27 2020-05-26 John Crane Inc. Extreme durability composite diamond film
US10584412B2 (en) 2016-03-08 2020-03-10 Ii-Vi Delaware, Inc. Substrate comprising a layer of silicon and a layer of diamond having an optically finished (or a dense) silicon-diamond interface
US10254445B2 (en) 2016-03-16 2019-04-09 Adam Khan Diamond coated antireflective window system and method
KR101865476B1 (ko) * 2016-10-28 2018-06-07 고려대학교 산학협력단 나노 다이아몬드를 계면 층으로 적용한 다이아몬드상 탄소막의 제조방법 및 이에 의해 제조된 다이아몬드상 탄소막
CN108060407B (zh) * 2017-11-09 2021-08-06 上海交通大学 一种微纳多层复合金刚石薄膜的制备方法
US11594416B2 (en) * 2020-08-31 2023-02-28 Applied Materials, Inc. Tribological properties of diamond films

Similar Documents

Publication Publication Date Title
Oehrlein et al. Foundations of low-temperature plasma enhanced materials synthesis and etching
US20150132212A1 (en) Method for forming conformal carbon films, structures and devices including a conformal carbon film, and system of forming same
Konyashin et al. Plasma‐assisted CVD of cubic boron nitride
JPH0499277A (ja) X線リソグラフィ用マスクの透過体の製造方法
JPWO2022046448A5 (https=)
Feng et al. A pretreatment process for enhanced diamond nucleation on smooth silicon substrates coated with hard carbon films
CN1294293C (zh) 制备纳米金刚石薄膜的辅助栅极热丝化学气相沉积法
Tzeng et al. Graphene induced diamond nucleation on tungsten
JP2021510934A5 (https=)
CN113699504B (zh) 金刚石基抗划伤复合基板及其制备方法
CN102560413B (zh) 类钻碳膜及其制作方法
CN115961243A (zh) 一种高致密度的Ta-C涂层的制备方法
CN113088921A (zh) 一种多孔金刚石膜/三维碳纳米线网络复合材料的制备方法及其产品
JP3898622B2 (ja) 炭素膜形成方法及びその装置、並びに炭素膜及びその炭素膜を被覆された製造物
TW201122143A (en) Method for forming smooth diamond thin film.
JP2009116949A (ja) パターンドメディア型の磁気記録媒体における凹凸パターンの形成方法
CN217499408U (zh) 抗电浆腐蚀薄膜结构
WO2009083673A1 (fr) Procede de realisation de revetement en carbone amorphe hydrogene
JP2798907B2 (ja) ダイヤモンド被膜の作製方法
Gamo et al. Ultrafine patterning of nanocrystalline diamond films grown by microwave plasma-assisted chemical vapor deposition
CN114107936B (zh) 一种基于反应回滞曲线制备TiN涂层的控制方法
CN115747752B (zh) 衬底的预处理方法及金刚石膜的制备方法
JPWO2022005703A5 (https=)
Zhang et al. Influence of geometry factors of in situ dc glow discharge on the diamond nucleation in a hot-filament chemical vapor deposition system
TWI799803B (zh) 再生靶材的方法及形成材料薄膜的方法