JPWO2022014566A5 - - Google Patents

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Publication number
JPWO2022014566A5
JPWO2022014566A5 JP2022536370A JP2022536370A JPWO2022014566A5 JP WO2022014566 A5 JPWO2022014566 A5 JP WO2022014566A5 JP 2022536370 A JP2022536370 A JP 2022536370A JP 2022536370 A JP2022536370 A JP 2022536370A JP WO2022014566 A5 JPWO2022014566 A5 JP WO2022014566A5
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JP
Japan
Prior art keywords
layer
integrated intensity
laminate according
plane diffraction
plane
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JP2022536370A
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English (en)
Japanese (ja)
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JPWO2022014566A1 (enExample
JP7185100B2 (ja
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Priority claimed from PCT/JP2021/026244 external-priority patent/WO2022014566A1/ja
Publication of JPWO2022014566A1 publication Critical patent/JPWO2022014566A1/ja
Publication of JPWO2022014566A5 publication Critical patent/JPWO2022014566A5/ja
Application granted granted Critical
Publication of JP7185100B2 publication Critical patent/JP7185100B2/ja
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JP2022536370A 2020-07-13 2021-07-13 積層体 Active JP7185100B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020120131 2020-07-13
JP2020120131 2020-07-13
PCT/JP2021/026244 WO2022014566A1 (ja) 2020-07-13 2021-07-13 積層体

Publications (3)

Publication Number Publication Date
JPWO2022014566A1 JPWO2022014566A1 (enExample) 2022-01-20
JPWO2022014566A5 true JPWO2022014566A5 (enExample) 2022-09-09
JP7185100B2 JP7185100B2 (ja) 2022-12-06

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ID=79555554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022536370A Active JP7185100B2 (ja) 2020-07-13 2021-07-13 積層体

Country Status (5)

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JP (1) JP7185100B2 (enExample)
KR (1) KR102518575B1 (enExample)
CN (1) CN116234692B (enExample)
TW (2) TW202346090A (enExample)
WO (1) WO2022014566A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119191726A (zh) * 2023-06-14 2024-12-27 大金工业株式会社 基材处理方法
CN117721424A (zh) * 2023-12-21 2024-03-19 深圳市派恩新材料技术有限公司 含氟靶材、功能膜层及其真空溅射成型方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1171665A (ja) 1997-08-29 1999-03-16 Toppan Printing Co Ltd 防汚性薄膜の形成方法
JP4289935B2 (ja) * 2003-06-19 2009-07-01 三井化学株式会社 複合多層膜、その自己組織的な製造方法および電子部品
JP2005301208A (ja) * 2004-03-17 2005-10-27 Seiko Epson Corp 防汚性光学物品の製造方法
JP2006124417A (ja) * 2004-10-26 2006-05-18 Asahi Glass Co Ltd 防汚層形成用組成物および反射防止積層体
JP4589186B2 (ja) * 2005-07-04 2010-12-01 ディバーシー株式会社 清掃装置およびそれを取り付けた床洗浄機ならびにその床洗浄機を用いた床面管理作業方法
US8945684B2 (en) * 2005-11-04 2015-02-03 Essilor International (Compagnie Generale D'optique) Process for coating an article with an anti-fouling surface coating by vacuum evaporation
JP2009139530A (ja) * 2007-12-05 2009-06-25 Seiko Epson Corp 光学物品の製造方法
JP2009251008A (ja) * 2008-04-01 2009-10-29 Seiko Epson Corp 光学物品およびその製造方法
JP5387096B2 (ja) * 2008-08-27 2014-01-15 株式会社リコー 液体吐出ヘッド及び画像形成装置並びに液体吐出ヘッドの製造方法
JP5628491B2 (ja) * 2009-07-15 2014-11-19 日本ゼオン株式会社 樹脂表面改質方法および表面改質樹脂基材
JP2018004921A (ja) * 2016-06-30 2018-01-11 ホヤ レンズ タイランド リミテッドHOYA Lens Thailand Ltd 眼鏡レンズ及び眼鏡レンズの製造方法
KR102447314B1 (ko) * 2016-09-23 2022-09-26 다이킨 고교 가부시키가이샤 이소시아누르 골격을 갖는 신규 화합물 및 그것을 포함하는 조성물

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