JPWO2021255784A1 - - Google Patents

Info

Publication number
JPWO2021255784A1
JPWO2021255784A1 JP2021526327A JP2021526327A JPWO2021255784A1 JP WO2021255784 A1 JPWO2021255784 A1 JP WO2021255784A1 JP 2021526327 A JP2021526327 A JP 2021526327A JP 2021526327 A JP2021526327 A JP 2021526327A JP WO2021255784 A1 JPWO2021255784 A1 JP WO2021255784A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021526327A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021255784A1 publication Critical patent/JPWO2021255784A1/ja
Priority to JP2023095156A priority Critical patent/JP7716442B2/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/20—Administration of product repair or maintenance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32926—Software, data control or modelling
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/04—Forecasting or optimisation specially adapted for administrative or management purposes, e.g. linear programming or "cutting stock problem"
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/06—Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063—Operations research, analysis or management
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/06—Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063—Operations research, analysis or management
    • G06Q10/0637—Strategic management or analysis, e.g. setting a goal or target of an organisation; Planning actions based on goals; Analysis or evaluation of effectiveness of goals
    • G06Q10/06375—Prediction of business process outcome or impact based on a proposed change
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00—Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/04—Manufacturing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3288—Maintenance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/80—Management or planning

Landscapes

  • Engineering & Computer Science (AREA)
  • Business, Economics & Management (AREA)
  • Human Resources & Organizations (AREA)
  • Physics & Mathematics (AREA)
  • Economics (AREA)
  • Strategic Management (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Tourism & Hospitality (AREA)
  • Marketing (AREA)
  • General Business, Economics & Management (AREA)
  • Quality & Reliability (AREA)
  • Operations Research (AREA)
  • Game Theory and Decision Science (AREA)
  • Development Economics (AREA)
  • Educational Administration (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Primary Health Care (AREA)
  • Plasma Technology (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2021526327A 2020-06-15 2020-06-15 Pending JPWO2021255784A1 (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023095156A JP7716442B2 (ja) 2020-06-15 2023-06-09 装置診断装置、装置診断方法、プラズマ処理装置および半導体装置製造システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/023386 WO2021255784A1 (ja) 2020-06-15 2020-06-15 装置診断装置、装置診断方法、プラズマ処理装置および半導体装置製造システム

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023095156A Division JP7716442B2 (ja) 2020-06-15 2023-06-09 装置診断装置、装置診断方法、プラズマ処理装置および半導体装置製造システム

Publications (1)

Publication Number Publication Date
JPWO2021255784A1 true JPWO2021255784A1 (https=) 2021-12-23

Family

ID=79178432

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021526327A Pending JPWO2021255784A1 (https=) 2020-06-15 2020-06-15
JP2023095156A Active JP7716442B2 (ja) 2020-06-15 2023-06-09 装置診断装置、装置診断方法、プラズマ処理装置および半導体装置製造システム

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023095156A Active JP7716442B2 (ja) 2020-06-15 2023-06-09 装置診断装置、装置診断方法、プラズマ処理装置および半導体装置製造システム

Country Status (6)

Country Link
US (1) US12387921B2 (https=)
JP (2) JPWO2021255784A1 (https=)
KR (1) KR102648654B1 (https=)
CN (2) CN114096972A (https=)
TW (1) TWI780764B (https=)
WO (1) WO2021255784A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7311817B2 (ja) * 2021-06-16 2023-07-20 ダイキン工業株式会社 制御装置、及び制御システム
KR102800655B1 (ko) * 2022-02-25 2025-04-29 주식회사 테크위즈 환경안전관리 적용 장치에 대한 고장열화 예지보전 시스템 및 그 방법
US20230280736A1 (en) * 2022-03-02 2023-09-07 Applied Materials, Inc. Comprehensive analysis module for determining processing equipment performance
KR20230135558A (ko) * 2022-03-14 2023-09-25 주식회사 히타치하이테크 진단 장치, 반도체 제조 장치 시스템, 반도체 장치 제조 시스템 및 진단 방법
JP7564334B2 (ja) * 2022-03-24 2024-10-08 株式会社日立ハイテク 装置診断システム、装置診断装置、半導体装置製造システムおよび装置診断方法
KR20240131986A (ko) * 2023-02-21 2024-09-02 주식회사 히타치하이테크 이상 검출 장치 및 이상 검출 방법

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009124677A (ja) * 2007-11-15 2009-06-04 Toshiba Corp 保守計画システム、および保守計画方法
JP2009199596A (ja) * 2008-02-19 2009-09-03 Toshiba Corp 保守計画システム、保守計画方法及び画像形成装置
JP2015148867A (ja) * 2014-02-05 2015-08-20 株式会社日立パワーソリューションズ 情報処理装置、診断方法、およびプログラム
JP2016057736A (ja) * 2014-09-08 2016-04-21 富士ゼロックス株式会社 情報処理装置、及びプログラム。
JP2018036939A (ja) * 2016-09-01 2018-03-08 日立Ｇｅニュークリア・エナジー株式会社 プラント監視装置及びプラント監視方法
WO2018079778A1 (ja) * 2016-10-31 2018-05-03 日本電気株式会社 生産管理装置、方法、プログラム
JP2020034585A (ja) * 2018-08-27 2020-03-05 コニカミノルタ株式会社 画像形成装置、画像形成システム、およびメンテナンス支援システム

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004019396A1 (ja) * 2002-08-13 2004-03-04 Tokyo Electron Limited プラズマ処理方法及びプラズマ処理装置
JP2004334457A (ja) 2003-05-07 2004-11-25 Mitsubishi Electric Corp 点検計画作成装置及び点検計画作成方法
JP2005286206A (ja) * 2004-03-30 2005-10-13 Hitachi High-Technologies Corp 半導体製造装置およびその監視・解析支援方法
US7152011B2 (en) * 2004-08-25 2006-12-19 Lam Research Corporation Smart component-based management techniques in a substrate processing system
JP4776590B2 (ja) 2007-06-19 2011-09-21 株式会社日立製作所 保守管理支援装置およびその表示方法、保守管理支援システム
US20090132321A1 (en) 2007-11-15 2009-05-21 Kabushiki Kaisha Toshiba Maintenance planning system and maintenance planning method
US7586100B2 (en) * 2008-02-12 2009-09-08 Varian Semiconductor Equipment Associates, Inc. Closed loop control and process optimization in plasma doping processes using a time of flight ion detector
US8022718B2 (en) * 2008-02-29 2011-09-20 Lam Research Corporation Method for inspecting electrostatic chucks with Kelvin probe analysis
JP4977064B2 (ja) * 2008-03-12 2012-07-18 株式会社東芝 保守計画支援システム
US9831111B2 (en) * 2014-02-12 2017-11-28 Applied Materials, Inc. Apparatus and method for measurement of the thermal performance of an electrostatic wafer chuck
JP6418791B2 (ja) 2014-05-29 2018-11-07 株式会社日立製作所 冷却装置の異常検知システム
JP6394208B2 (ja) * 2014-09-08 2018-09-26 新日鐵住金株式会社 製鋼工場における操業スケジュール作成方法および作成装置
WO2016125248A1 (ja) 2015-02-03 2016-08-11 株式会社日立製作所 保守支援システム、保守支援方法、及び、保守支援プログラム
JP6723669B2 (ja) * 2016-09-27 2020-07-15 東京エレクトロン株式会社 異常検知プログラム、異常検知方法および異常検知装置
US11702748B2 (en) * 2017-03-03 2023-07-18 Lam Research Corporation Wafer level uniformity control in remote plasma film deposition
JP6926008B2 (ja) * 2018-01-31 2021-08-25 株式会社日立製作所 保守計画装置、及び保守計画方法
SG11202009105YA (en) 2018-03-20 2020-10-29 Tokyo Electron Ltd Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same
CN109019211B (zh) * 2018-08-02 2020-10-20 深圳爱梯物联网控股有限公司 一种电梯维修保养作业辅助装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009124677A (ja) * 2007-11-15 2009-06-04 Toshiba Corp 保守計画システム、および保守計画方法
JP2009199596A (ja) * 2008-02-19 2009-09-03 Toshiba Corp 保守計画システム、保守計画方法及び画像形成装置
JP2015148867A (ja) * 2014-02-05 2015-08-20 株式会社日立パワーソリューションズ 情報処理装置、診断方法、およびプログラム
JP2016057736A (ja) * 2014-09-08 2016-04-21 富士ゼロックス株式会社 情報処理装置、及びプログラム。
JP2018036939A (ja) * 2016-09-01 2018-03-08 日立Ｇｅニュークリア・エナジー株式会社 プラント監視装置及びプラント監視方法
WO2018079778A1 (ja) * 2016-10-31 2018-05-03 日本電気株式会社 生産管理装置、方法、プログラム
JP2020034585A (ja) * 2018-08-27 2020-03-05 コニカミノルタ株式会社 画像形成装置、画像形成システム、およびメンテナンス支援システム

Also Published As

Publication number Publication date
CN121563475A (zh) 2026-02-24
KR102648654B1 (ko) 2024-03-19
JP7716442B2 (ja) 2025-07-31
KR20210157392A (ko) 2021-12-28
JP2023105229A (ja) 2023-07-28
TW202201591A (zh) 2022-01-01
TWI780764B (zh) 2022-10-11
US20220399182A1 (en) 2022-12-15
US12387921B2 (en) 2025-08-12
CN114096972A (zh) 2022-02-25
WO2021255784A1 (ja) 2021-12-23

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