JPWO2021229373A1 - - Google Patents

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Publication number
JPWO2021229373A1
JPWO2021229373A1 JP2022522079A JP2022522079A JPWO2021229373A1 JP WO2021229373 A1 JPWO2021229373 A1 JP WO2021229373A1 JP 2022522079 A JP2022522079 A JP 2022522079A JP 2022522079 A JP2022522079 A JP 2022522079A JP WO2021229373 A1 JPWO2021229373 A1 JP WO2021229373A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022522079A
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Japanese (ja)
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JP7578683B2 (ja
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Publication of JPWO2021229373A1 publication Critical patent/JPWO2021229373A1/ja
Priority to JP2024187737A priority Critical patent/JP2025010202A/ja
Application granted granted Critical
Publication of JP7578683B2 publication Critical patent/JP7578683B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/06Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/10Arrangements for interconnecting storage elements electrically, e.g. by wiring for interconnecting capacitors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/54Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using elements simulating biological cells, e.g. neuron
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B53/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H10B53/30Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the memory core region
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06GANALOGUE COMPUTERS
    • G06G7/00Devices in which the computing operation is performed by varying electric or magnetic quantities
    • G06G7/12Arrangements for performing computing operations, e.g. operational amplifiers specially adapted therefor
    • G06G7/16Arrangements for performing computing operations, e.g. operational amplifiers specially adapted therefor for multiplication or division
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06GANALOGUE COMPUTERS
    • G06G7/00Devices in which the computing operation is performed by varying electric or magnetic quantities
    • G06G7/48Analogue computers for specific processes, systems or devices, e.g. simulators
    • G06G7/60Analogue computers for specific processes, systems or devices, e.g. simulators for living beings, e.g. their nervous systems ; for problems in the medical field
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06NCOMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00Computing arrangements based on biological models
    • G06N3/02Neural networks
    • G06N3/06Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons
    • G06N3/063Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/221Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements using ferroelectric capacitors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/225Auxiliary circuits
    • G11C11/2273Reading or sensing circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/225Auxiliary circuits
    • G11C11/2293Timing circuits or methods
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B53/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H10B53/40Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the peripheral circuit region
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B53/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H10B53/50Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the boundary region between the core and peripheral circuit regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0415Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having ferroelectric gate insulators
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/701IGFETs having ferroelectric gate insulators, e.g. ferroelectric FETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6729Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/6733Multi-gate TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6757Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Power Engineering (AREA)
  • Biomedical Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Neurology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biophysics (AREA)
  • Molecular Biology (AREA)
  • Software Systems (AREA)
  • Evolutionary Computation (AREA)
  • Computing Systems (AREA)
  • Computational Linguistics (AREA)
  • Data Mining & Analysis (AREA)
  • Artificial Intelligence (AREA)
  • General Engineering & Computer Science (AREA)
  • Physiology (AREA)
  • Neurosurgery (AREA)
  • Dram (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Amplifiers (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
  • Electronic Switches (AREA)
  • Control Of El Displays (AREA)
JP2022522079A 2020-05-15 2021-05-06 半導体装置、及び電子機器 Active JP7578683B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024187737A JP2025010202A (ja) 2020-05-15 2024-10-24 半導体装置

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP2020085737 2020-05-15
JP2020085737 2020-05-15
JP2020129929 2020-07-31
JP2020129885 2020-07-31
JP2020129929 2020-07-31
JP2020129885 2020-07-31
JP2020131822 2020-08-03
JP2020131822 2020-08-03
JP2021023247 2021-02-17
JP2021023247 2021-02-17
PCT/IB2021/053819 WO2021229373A1 (ja) 2020-05-15 2021-05-06 半導体装置、及び電子機器

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024187737A Division JP2025010202A (ja) 2020-05-15 2024-10-24 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2021229373A1 true JPWO2021229373A1 (https=) 2021-11-18
JP7578683B2 JP7578683B2 (ja) 2024-11-06

Family

ID=78525448

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022522079A Active JP7578683B2 (ja) 2020-05-15 2021-05-06 半導体装置、及び電子機器
JP2024187737A Withdrawn JP2025010202A (ja) 2020-05-15 2024-10-24 半導体装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024187737A Withdrawn JP2025010202A (ja) 2020-05-15 2024-10-24 半導体装置

Country Status (6)

Country Link
US (2) US12136465B2 (https=)
JP (2) JP7578683B2 (https=)
KR (1) KR20230023620A (https=)
CN (1) CN115552408A (https=)
TW (1) TWI865775B (https=)
WO (1) WO2021229373A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI865775B (zh) * 2020-05-15 2024-12-11 日商半導體能源研究所股份有限公司 半導體裝置及電子裝置
JP7596386B2 (ja) 2020-08-03 2024-12-09 株式会社半導体エネルギー研究所 半導体装置、及び電子機器
JP7723677B2 (ja) * 2020-10-20 2025-08-14 株式会社半導体エネルギー研究所 半導体装置、及び電子機器
JPWO2023161757A1 (https=) * 2022-02-25 2023-08-31
WO2023209485A1 (ja) * 2022-04-29 2023-11-02 株式会社半導体エネルギー研究所 半導体装置、及び電子機器
US20230386997A1 (en) * 2022-05-26 2023-11-30 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor devices with reduced effect of capacitive coupling

Citations (2)

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JP2017194963A (ja) * 2016-04-14 2017-10-26 株式会社半導体エネルギー研究所 半導体装置
WO2019207404A1 (ja) * 2018-04-26 2019-10-31 株式会社半導体エネルギー研究所 半導体装置

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JPH0467259A (ja) 1990-07-09 1992-03-03 Hitachi Ltd 情報処理装置
WO2017068478A1 (en) * 2015-10-22 2017-04-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device or memory device including the semiconductor device
TWI751990B (zh) * 2015-12-24 2022-01-11 美商英特爾股份有限公司 衝突罩生成
CN108701480B (zh) 2016-03-10 2022-10-14 株式会社半导体能源研究所 半导体装置
KR102382727B1 (ko) * 2016-03-18 2022-04-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 이를 사용한 시스템
TW201809815A (zh) * 2016-09-06 2018-03-16 Semiconductor Energy Lab 顯示面板、顯示裝置、輸入輸出裝置、資料處理裝置
WO2018069785A1 (en) * 2016-10-12 2018-04-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and system using the same
WO2018073708A1 (en) * 2016-10-20 2018-04-26 Semiconductor Energy Laboratory Co., Ltd. Storage device, driving method thereof, semiconductor device, electronic component, and electronic device
US11037614B2 (en) * 2017-07-28 2021-06-15 Intel Corporation Imprint-free write driver for ferroelectric memory
US11139298B2 (en) * 2017-09-06 2021-10-05 Semiconductor Energy Laboratory Co., Ltd. Electronic device
CN119947090A (zh) * 2017-11-24 2025-05-06 株式会社半导体能源研究所 半导体装置及动态逻辑电路
EP3506265A1 (en) * 2017-12-29 2019-07-03 IMEC vzw A memory device
JP2020155186A (ja) * 2019-03-22 2020-09-24 キオクシア株式会社 メモリデバイス
WO2020254909A1 (ja) * 2019-06-21 2020-12-24 株式会社半導体エネルギー研究所 半導体装置、及び電子機器
WO2021009607A1 (ja) * 2019-07-12 2021-01-21 株式会社半導体エネルギー研究所 記憶装置、半導体装置、及び電子機器
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TWI865775B (zh) * 2020-05-15 2024-12-11 日商半導體能源研究所股份有限公司 半導體裝置及電子裝置
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JP2017194963A (ja) * 2016-04-14 2017-10-26 株式会社半導体エネルギー研究所 半導体装置
WO2019207404A1 (ja) * 2018-04-26 2019-10-31 株式会社半導体エネルギー研究所 半導体装置

Also Published As

Publication number Publication date
US20250054523A1 (en) 2025-02-13
TWI865775B (zh) 2024-12-11
JP2025010202A (ja) 2025-01-20
US12136465B2 (en) 2024-11-05
KR20230023620A (ko) 2023-02-17
JP7578683B2 (ja) 2024-11-06
WO2021229373A1 (ja) 2021-11-18
CN115552408A (zh) 2022-12-30
US20230326491A1 (en) 2023-10-12
TW202145080A (zh) 2021-12-01

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