JPWO2021206044A5 - - Google Patents
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- Publication number
- JPWO2021206044A5 JPWO2021206044A5 JP2022514057A JP2022514057A JPWO2021206044A5 JP WO2021206044 A5 JPWO2021206044 A5 JP WO2021206044A5 JP 2022514057 A JP2022514057 A JP 2022514057A JP 2022514057 A JP2022514057 A JP 2022514057A JP WO2021206044 A5 JPWO2021206044 A5 JP WO2021206044A5
- Authority
- JP
- Japan
- Prior art keywords
- mark
- substrate
- pattern forming
- reference index
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims description 51
- 238000001514 detection method Methods 0.000 claims description 24
- 230000003287 optical effect Effects 0.000 claims description 22
- 230000007261 regionalization Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 230000002194 synthesizing effect Effects 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- 238000003384 imaging method Methods 0.000 claims 13
- 238000005286 illumination Methods 0.000 claims 11
- 238000005259 measurement Methods 0.000 claims 5
- 238000000059 patterning Methods 0.000 claims 5
- 239000000956 alloy Substances 0.000 claims 2
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 238000009434 installation Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910001374 Invar Inorganic materials 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 229910052878 cordierite Inorganic materials 0.000 claims 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 claims 1
- 239000002241 glass-ceramic Substances 0.000 claims 1
- 229910000833 kovar Inorganic materials 0.000 claims 1
- 239000005304 optical glass Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020068034 | 2020-04-06 | ||
| JP2020068034 | 2020-04-06 | ||
| PCT/JP2021/014467 WO2021206044A1 (ja) | 2020-04-06 | 2021-04-05 | パターン形成装置、並びにパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021206044A1 JPWO2021206044A1 (https=) | 2021-10-14 |
| JPWO2021206044A5 true JPWO2021206044A5 (https=) | 2022-09-15 |
| JP7435748B2 JP7435748B2 (ja) | 2024-02-21 |
Family
ID=78023054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022514057A Active JP7435748B2 (ja) | 2020-04-06 | 2021-04-05 | パターン形成装置、並びにパターン形成方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7435748B2 (https=) |
| KR (2) | KR102853866B1 (https=) |
| CN (1) | CN115380253A (https=) |
| TW (2) | TWI781572B (https=) |
| WO (1) | WO2021206044A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102515305B1 (ko) * | 2022-05-18 | 2023-03-29 | 에스케이엔펄스 주식회사 | 섀도우 마스크 및 이를 이용한 블랭크 마스크의 제조방법 |
| JP2024014031A (ja) | 2022-07-21 | 2024-02-01 | キヤノン株式会社 | 検出装置、リソグラフィー装置および物品製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0677116A (ja) * | 1992-08-27 | 1994-03-18 | Nikon Corp | 位置検出装置 |
| JP3445100B2 (ja) * | 1997-06-02 | 2003-09-08 | キヤノン株式会社 | 位置検出方法及び位置検出装置 |
| JP4046323B2 (ja) | 2002-08-08 | 2008-02-13 | フジノン株式会社 | 平行度測定方法 |
| JP2006098726A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | アライメント部の校正方法と、アライメント校正可能な描画装置と、搬送装置 |
| JP2014081452A (ja) * | 2012-10-16 | 2014-05-08 | Nikon Corp | 露光装置、およびデバイス製造方法 |
| NL2013745A (en) | 2013-12-05 | 2015-06-08 | Asml Netherlands Bv | Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods & apparatus. |
| JP2015125424A (ja) * | 2013-12-27 | 2015-07-06 | キヤノン株式会社 | 光学装置、リソグラフィ装置、及び物品の製造方法 |
| CN110083018A (zh) * | 2014-04-01 | 2019-08-02 | 株式会社尼康 | 基板处理装置的调整方法 |
| TWI709006B (zh) * | 2014-04-01 | 2020-11-01 | 日商尼康股份有限公司 | 圖案描繪裝置及圖案描繪方法 |
| JP6465591B2 (ja) * | 2014-08-27 | 2019-02-06 | 株式会社オーク製作所 | 描画装置 |
| CN107329379B (zh) * | 2016-04-29 | 2019-01-18 | 上海微电子装备（集团）股份有限公司 | 双层对准装置和双层对准方法 |
-
2021
- 2021-04-05 KR KR1020227034595A patent/KR102853866B1/ko active Active
- 2021-04-05 WO PCT/JP2021/014467 patent/WO2021206044A1/ja not_active Ceased
- 2021-04-05 JP JP2022514057A patent/JP7435748B2/ja active Active
- 2021-04-05 CN CN202180025936.8A patent/CN115380253A/zh active Pending
- 2021-04-05 KR KR1020257028795A patent/KR20250133998A/ko active Pending
- 2021-04-06 TW TW110112367A patent/TWI781572B/zh active
- 2021-04-06 TW TW111136244A patent/TWI869708B/zh active
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