JPWO2021199681A1 - - Google Patents

Info

Publication number
JPWO2021199681A1
JPWO2021199681A1 JP2022511608A JP2022511608A JPWO2021199681A1 JP WO2021199681 A1 JPWO2021199681 A1 JP WO2021199681A1 JP 2022511608 A JP2022511608 A JP 2022511608A JP 2022511608 A JP2022511608 A JP 2022511608A JP WO2021199681 A1 JPWO2021199681 A1 JP WO2021199681A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2022511608A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021199681A1 publication Critical patent/JPWO2021199681A1/ja
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/807Pixel isolation structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/811Interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/812Arrangements for transferring the charges in the image sensor perpendicular to the imaging plane, e.g. buried regions used to transfer generated charges to circuitry under the photosensitive region
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/199Back-illuminated image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/809Constructional details of image sensors of hybrid image sensors
JP2022511608A 2020-03-31 2021-02-08 Ceased JPWO2021199681A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020065335 2020-03-31
PCT/JP2021/004523 WO2021199681A1 (ja) 2020-03-31 2021-02-08 受光素子および電子機器

Publications (1)

Publication Number Publication Date
JPWO2021199681A1 true JPWO2021199681A1 (https=) 2021-10-07

Family

ID=77928496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022511608A Ceased JPWO2021199681A1 (https=) 2020-03-31 2021-02-08

Country Status (5)

Country Link
US (1) US20230178576A1 (https=)
EP (1) EP4131430A4 (https=)
JP (1) JPWO2021199681A1 (https=)
CN (1) CN115191034A (https=)
WO (1) WO2021199681A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12218165B2 (en) * 2021-06-18 2025-02-04 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor image sensor and method of manufacturing the same
US12563852B2 (en) * 2022-01-20 2026-02-24 Taiwan Semiconductor Manufacturing Company, Ltd. Uniform trenches in semiconductor devices and manufacturing method thereof
CN114500868B (zh) * 2022-04-18 2022-07-12 深圳锐视智芯科技有限公司 一种evs像素工作方法及相关装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006190891A (ja) * 2005-01-07 2006-07-20 Sony Corp 固体撮像素子及び固体撮像素子の製造方法
WO2018150902A1 (ja) * 2017-02-17 2018-08-23 ソニーセミコンダクタソリューションズ株式会社 撮像素子および電子機器
JP2018201005A (ja) * 2016-10-18 2018-12-20 ソニーセミコンダクタソリューションズ株式会社 光検出器
WO2019138923A1 (ja) * 2018-01-11 2019-07-18 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、電子機器
WO2019146527A1 (ja) * 2018-01-23 2019-08-01 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子、撮像装置、および、固体撮像素子の制御方法
WO2019155782A1 (ja) * 2018-02-09 2019-08-15 ソニーセミコンダクタソリューションズ株式会社 半導体装置および半導体装置の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004319784A (ja) * 2003-04-16 2004-11-11 Sanyo Electric Co Ltd 固体撮像素子及びその製造方法
KR101232282B1 (ko) * 2011-04-27 2013-02-12 에스케이하이닉스 주식회사 이미지 센서 및 그 제조방법
US9484376B2 (en) * 2014-05-30 2016-11-01 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor isolation structure and manufacturing method thereof
CN107949913B (zh) * 2015-09-09 2019-04-19 松下知识产权经营株式会社 固体摄像元件
US10418407B2 (en) * 2015-11-06 2019-09-17 Artilux, Inc. High-speed light sensing apparatus III
KR102430496B1 (ko) * 2017-09-29 2022-08-08 삼성전자주식회사 이미지 센싱 장치 및 그 제조 방법
JP7250427B2 (ja) * 2018-02-09 2023-04-03 キヤノン株式会社 光電変換装置、撮像システム、および移動体
KR102553314B1 (ko) * 2018-08-29 2023-07-10 삼성전자주식회사 이미지 센서
KR102646903B1 (ko) * 2018-09-04 2024-03-12 삼성전자주식회사 이미지 센서

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006190891A (ja) * 2005-01-07 2006-07-20 Sony Corp 固体撮像素子及び固体撮像素子の製造方法
JP2018201005A (ja) * 2016-10-18 2018-12-20 ソニーセミコンダクタソリューションズ株式会社 光検出器
WO2018150902A1 (ja) * 2017-02-17 2018-08-23 ソニーセミコンダクタソリューションズ株式会社 撮像素子および電子機器
WO2019138923A1 (ja) * 2018-01-11 2019-07-18 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、電子機器
WO2019146527A1 (ja) * 2018-01-23 2019-08-01 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子、撮像装置、および、固体撮像素子の制御方法
WO2019155782A1 (ja) * 2018-02-09 2019-08-15 ソニーセミコンダクタソリューションズ株式会社 半導体装置および半導体装置の製造方法

Also Published As

Publication number Publication date
WO2021199681A1 (ja) 2021-10-07
CN115191034A (zh) 2022-10-14
EP4131430A4 (en) 2023-08-09
US20230178576A1 (en) 2023-06-08
EP4131430A1 (en) 2023-02-08

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