JPWO2021075393A1 - - Google Patents

Info

Publication number
JPWO2021075393A1
JPWO2021075393A1 JP2021552374A JP2021552374A JPWO2021075393A1 JP WO2021075393 A1 JPWO2021075393 A1 JP WO2021075393A1 JP 2021552374 A JP2021552374 A JP 2021552374A JP 2021552374 A JP2021552374 A JP 2021552374A JP WO2021075393 A1 JPWO2021075393 A1 JP WO2021075393A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021552374A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021075393A1 publication Critical patent/JPWO2021075393A1/ja
Priority to JP2023091766A priority Critical patent/JP7451807B2/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/20—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/24—Homopolymers or copolymers of amides or imides
    • C09D133/26—Homopolymers or copolymers of acrylamide or methacrylamide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2021552374A 2019-10-17 2020-10-12 Pending JPWO2021075393A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023091766A JP7451807B2 (ja) 2019-10-17 2023-06-02 組成物、膜、硬化膜及びその製造方法、近赤外線透過フィルタ、固体撮像素子、並びに、赤外線センサ

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019189941 2019-10-17
PCT/JP2020/038426 WO2021075393A1 (ja) 2019-10-17 2020-10-12 組成物、膜、硬化膜及びその製造方法、近赤外線透過フィルタ、固体撮像素子、並びに、赤外線センサ

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023091766A Division JP7451807B2 (ja) 2019-10-17 2023-06-02 組成物、膜、硬化膜及びその製造方法、近赤外線透過フィルタ、固体撮像素子、並びに、赤外線センサ

Publications (1)

Publication Number Publication Date
JPWO2021075393A1 true JPWO2021075393A1 (ja) 2021-04-22

Family

ID=75538494

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021552374A Pending JPWO2021075393A1 (ja) 2019-10-17 2020-10-12
JP2023091766A Active JP7451807B2 (ja) 2019-10-17 2023-06-02 組成物、膜、硬化膜及びその製造方法、近赤外線透過フィルタ、固体撮像素子、並びに、赤外線センサ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023091766A Active JP7451807B2 (ja) 2019-10-17 2023-06-02 組成物、膜、硬化膜及びその製造方法、近赤外線透過フィルタ、固体撮像素子、並びに、赤外線センサ

Country Status (6)

Country Link
US (1) US20220244637A1 (ja)
JP (2) JPWO2021075393A1 (ja)
KR (1) KR20220063238A (ja)
CN (1) CN114556215A (ja)
TW (1) TW202124469A (ja)
WO (1) WO2021075393A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114556215A (zh) * 2019-10-17 2022-05-27 富士胶片株式会社 组合物、膜、固化膜及其制造方法、近红外线透射滤波器、固体摄像元件以及红外线传感器

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0743512A (ja) * 1993-07-30 1995-02-14 Nissha Printing Co Ltd 前面パネルと前面パネル用転写材
WO2003067941A2 (en) * 2002-02-05 2003-08-14 Logicvision, Inc. Circuit and method for determining the location of defect in a circuit
WO2008026397A1 (fr) * 2006-08-31 2008-03-06 Jsr Corporation Composition de résine isolante sensible aux radiations, article durci et dispositif électronique
JP2013205654A (ja) * 2012-03-28 2013-10-07 Fujifilm Corp 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、及び表示装置
JP2014130332A (ja) * 2012-11-27 2014-07-10 Jsr Corp 感光性組成物、着色剤分散液、光フィルター及び光センサー
JP2016177079A (ja) * 2015-03-19 2016-10-06 Jsr株式会社 硬化性組成物、硬化膜、赤外光透過フィルタ及び固体撮像装置
WO2018030247A1 (ja) * 2016-08-10 2018-02-15 富士フイルム株式会社 近赤外線カットフィルタ、固体撮像素子、カメラモジュールおよび画像表示装置
JP2019031627A (ja) * 2017-08-09 2019-02-28 昭和電工株式会社 アルカリ可溶性樹脂、それを含むカラーフィルター用感光性樹脂組成物及びカラーフィルター
WO2019176975A1 (ja) * 2018-03-16 2019-09-19 富士フイルム株式会社 構造体、近赤外線カットフィルタ用組成物、ドライフィルム、構造体の製造方法、光センサおよび画像表示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07311461A (ja) 1994-05-17 1995-11-28 Dainippon Printing Co Ltd 水溶性着色感光性樹脂組成物
JP7016891B2 (ja) * 2017-12-27 2022-02-07 富士フイルム株式会社 組成物、膜、カラーフィルタ、固体撮像素子、画像表示装置および化合物の製造方法
CN114556215A (zh) * 2019-10-17 2022-05-27 富士胶片株式会社 组合物、膜、固化膜及其制造方法、近红外线透射滤波器、固体摄像元件以及红外线传感器

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0743512A (ja) * 1993-07-30 1995-02-14 Nissha Printing Co Ltd 前面パネルと前面パネル用転写材
WO2003067941A2 (en) * 2002-02-05 2003-08-14 Logicvision, Inc. Circuit and method for determining the location of defect in a circuit
WO2008026397A1 (fr) * 2006-08-31 2008-03-06 Jsr Corporation Composition de résine isolante sensible aux radiations, article durci et dispositif électronique
JP2013205654A (ja) * 2012-03-28 2013-10-07 Fujifilm Corp 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、及び表示装置
JP2014130332A (ja) * 2012-11-27 2014-07-10 Jsr Corp 感光性組成物、着色剤分散液、光フィルター及び光センサー
JP2016177079A (ja) * 2015-03-19 2016-10-06 Jsr株式会社 硬化性組成物、硬化膜、赤外光透過フィルタ及び固体撮像装置
WO2018030247A1 (ja) * 2016-08-10 2018-02-15 富士フイルム株式会社 近赤外線カットフィルタ、固体撮像素子、カメラモジュールおよび画像表示装置
JP2019031627A (ja) * 2017-08-09 2019-02-28 昭和電工株式会社 アルカリ可溶性樹脂、それを含むカラーフィルター用感光性樹脂組成物及びカラーフィルター
WO2019176975A1 (ja) * 2018-03-16 2019-09-19 富士フイルム株式会社 構造体、近赤外線カットフィルタ用組成物、ドライフィルム、構造体の製造方法、光センサおよび画像表示装置

Also Published As

Publication number Publication date
US20220244637A1 (en) 2022-08-04
KR20220063238A (ko) 2022-05-17
CN114556215A (zh) 2022-05-27
JP2023123480A (ja) 2023-09-05
WO2021075393A1 (ja) 2021-04-22
TW202124469A (zh) 2021-07-01
JP7451807B2 (ja) 2024-03-18

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