JPWO2020053973A1 - 強磁性材スパッタリングターゲット - Google Patents

強磁性材スパッタリングターゲット Download PDF

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Publication number
JPWO2020053973A1
JPWO2020053973A1 JP2019530516A JP2019530516A JPWO2020053973A1 JP WO2020053973 A1 JPWO2020053973 A1 JP WO2020053973A1 JP 2019530516 A JP2019530516 A JP 2019530516A JP 2019530516 A JP2019530516 A JP 2019530516A JP WO2020053973 A1 JPWO2020053973 A1 JP WO2020053973A1
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JP
Japan
Prior art keywords
mol
metal
powder
less
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2019530516A
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English (en)
Japanese (ja)
Inventor
真一 荻野
真一 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
Original Assignee
JX Nippon Mining and Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JX Nippon Mining and Metals Corp filed Critical JX Nippon Mining and Metals Corp
Publication of JPWO2020053973A1 publication Critical patent/JPWO2020053973A1/ja
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
JP2019530516A 2018-09-11 2018-09-11 強磁性材スパッタリングターゲット Abandoned JPWO2020053973A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2018/033698 WO2020053973A1 (fr) 2018-09-11 2018-09-11 Cible de pulvérisation cathodique en matériau ferromagnétique

Publications (1)

Publication Number Publication Date
JPWO2020053973A1 true JPWO2020053973A1 (ja) 2020-10-22

Family

ID=69776659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019530516A Abandoned JPWO2020053973A1 (ja) 2018-09-11 2018-09-11 強磁性材スパッタリングターゲット

Country Status (5)

Country Link
JP (1) JPWO2020053973A1 (fr)
CN (1) CN111183244B (fr)
MY (1) MY191072A (fr)
SG (1) SG11201906523QA (fr)
WO (1) WO2020053973A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115552052A (zh) * 2020-05-18 2022-12-30 田中贵金属工业株式会社 Pt-氧化物系溅射靶和垂直磁记录介质

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5111320B2 (ja) * 2008-10-03 2013-01-09 田中貴金属工業株式会社 Ｐｄ−Ｃｒ−Ｗ系スパッタリングターゲット及びその製造方法
JP2011174174A (ja) * 2010-01-26 2011-09-08 Mitsubishi Materials Corp 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
US8679268B2 (en) * 2010-07-20 2014-03-25 Jx Nippon Mining & Metals Corporation Sputtering target of ferromagnetic material with low generation of particles
WO2012077665A1 (fr) * 2010-12-09 2012-06-14 Jx日鉱日石金属株式会社 Cible de pulvérisation cathodique en matériau ferromagnétique
US20130213804A1 (en) * 2010-12-17 2013-08-22 Jx Nippon Mining & Metals Corporation Ferromagnetic material sputtering target
JP6305881B2 (ja) * 2014-09-05 2018-04-04 Ｊｘ金属株式会社 磁気記録媒体用スパッタリングターゲット

Also Published As

Publication number Publication date
WO2020053973A1 (fr) 2020-03-19
MY191072A (en) 2022-05-30
CN111183244B (zh) 2022-03-08
SG11201906523QA (en) 2020-04-29
CN111183244A (zh) 2020-05-19

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