JPWO2020046994A5 - - Google Patents
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- Publication number
- JPWO2020046994A5 JPWO2020046994A5 JP2021510328A JP2021510328A JPWO2020046994A5 JP WO2020046994 A5 JPWO2020046994 A5 JP WO2020046994A5 JP 2021510328 A JP2021510328 A JP 2021510328A JP 2021510328 A JP2021510328 A JP 2021510328A JP WO2020046994 A5 JPWO2020046994 A5 JP WO2020046994A5
- Authority
- JP
- Japan
- Prior art keywords
- contact device
- conduit
- ultrapure water
- ozone
- delivery system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 91
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 80
- 239000007789 gas Substances 0.000 claims description 78
- 239000012498 ultrapure water Substances 0.000 claims description 74
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 68
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical group O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 55
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 27
- 239000001569 carbon dioxide Substances 0.000 claims description 27
- 239000012528 membrane Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims 17
- 239000007864 aqueous solution Substances 0.000 claims 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims 2
- AZLYZRGJCVQKKK-UHFFFAOYSA-N dioxohydrazine Chemical compound O=NN=O AZLYZRGJCVQKKK-UHFFFAOYSA-N 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims 2
- 238000005086 pumping Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 4
- -1 hydroxide ions Chemical class 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862724368P | 2018-08-29 | 2018-08-29 | |
| US62/724,368 | 2018-08-29 | ||
| PCT/US2019/048411 WO2020046994A1 (fr) | 2018-08-29 | 2019-08-27 | Système d'administration d'eau ozonée et procédé d'utilisation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022502235A JP2022502235A (ja) | 2022-01-11 |
| JPWO2020046994A5 true JPWO2020046994A5 (fr) | 2022-06-02 |
| JP7422135B2 JP7422135B2 (ja) | 2024-01-25 |
Family
ID=69639551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021510328A Active JP7422135B2 (ja) | 2018-08-29 | 2019-08-27 | オゾン水デリバリシステム及び使用方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US11518696B2 (fr) |
| EP (1) | EP3814284A4 (fr) |
| JP (1) | JP7422135B2 (fr) |
| KR (2) | KR20230165878A (fr) |
| CN (1) | CN112601720A (fr) |
| IL (1) | IL281134A (fr) |
| SG (1) | SG11202100619PA (fr) |
| TW (1) | TW202023962A (fr) |
| WO (1) | WO2020046994A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024020126A1 (fr) * | 2022-07-20 | 2024-01-25 | Evoqua Water Technologies Llc | Système mobile pour eau ultra-pure |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5261966A (en) | 1991-01-28 | 1993-11-16 | Kabushiki Kaisha Toshiba | Method of cleaning semiconductor wafers using mixer containing a bundle of gas permeable hollow yarns |
| EP0598424A3 (fr) | 1992-11-16 | 1996-05-15 | Novellus Systems Inc | Appareil pour l'élimination de gaz dissous d'un liquide. |
| JP3174856B2 (ja) | 1993-05-07 | 2001-06-11 | 日本エア・リキード株式会社 | 混合ガス供給装置 |
| US6001223A (en) | 1995-07-07 | 1999-12-14 | Air Liquide America Corporation | On-site ammonia purification for semiconductor manufacture |
| DE69830121T2 (de) | 1997-10-31 | 2006-02-23 | Ebara Corp. | Polierschlamm Spendevorrichtung |
| US7980753B2 (en) | 1998-04-16 | 2011-07-19 | Air Liquide Electronics U.S. Lp | Systems and methods for managing fluids in a processing environment using a liquid ring pump and reclamation system |
| US20070119816A1 (en) | 1998-04-16 | 2007-05-31 | Urquhart Karl J | Systems and methods for reclaiming process fluids in a processing environment |
| JP2000037695A (ja) * | 1998-07-24 | 2000-02-08 | Kurita Water Ind Ltd | オゾン水供給装置 |
| US6247838B1 (en) | 1998-11-24 | 2001-06-19 | The Boc Group, Inc. | Method for producing a liquid mixture having a predetermined concentration of a specified component |
| JP2000262874A (ja) * | 1999-03-15 | 2000-09-26 | Mitsubishi Electric Corp | オゾン水の製造方法および製造装置 |
| JP3748731B2 (ja) | 1999-03-26 | 2006-02-22 | 株式会社荏原製作所 | 砥液供給装置 |
| AU1340301A (en) * | 1999-10-19 | 2001-04-30 | Phifer Smith Corporation | A method and apparatus for treating a substrate with an ozone-solvent solution |
| JP2001129376A (ja) * | 1999-11-08 | 2001-05-15 | Ishikawajima Harima Heavy Ind Co Ltd | オゾン水製造方法及び製造装置 |
| AU2001281373A1 (en) | 2000-07-31 | 2002-02-13 | Kinetics Chempure Systems, Inc. | Method and apparatus for blending process materials |
| US6805791B2 (en) | 2000-09-01 | 2004-10-19 | Applied Science And Technology, Inc. | Ozonated water flow and concentration control apparatus |
| US6884359B2 (en) * | 2000-09-27 | 2005-04-26 | Dainippon Ink And Chemicals, Inc. | Apparatus and method for controlling resistivity of ultra pure water |
| US6766818B2 (en) | 2001-04-06 | 2004-07-27 | Akrion, Llc | Chemical concentration control device |
| WO2003043059A2 (fr) | 2001-11-13 | 2003-05-22 | Fsi International, Inc. | Commande de processus avancee pour traitement par immersion |
| US6732017B2 (en) | 2002-02-15 | 2004-05-04 | Lam Research Corp. | System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system |
| JP2003334433A (ja) | 2002-05-16 | 2003-11-25 | Kurita Water Ind Ltd | 連続溶解装置、連続溶解方法及び気体溶解水供給装置 |
| EP1367149B1 (fr) | 2002-05-29 | 2011-11-16 | Toyo Tanso Co., Ltd. | Générateur de fluor gazeux |
| JP2005533639A (ja) | 2002-07-19 | 2005-11-10 | キネティック システムズ，インコーポレーテッド | プロセス材料を配合するための方法および装置 |
| AU2003254011A1 (en) | 2002-07-19 | 2004-02-09 | Mykrolis Corporation | Fluid flow measuring and proportional fluid flow control device |
| TWI294792B (en) | 2002-07-19 | 2008-03-21 | Mykrolis Corp | Liquid flow controller and precision dispense apparatus and system |
| JP3527735B1 (ja) | 2002-11-20 | 2004-05-17 | 東洋炭素株式会社 | フッ素ガス発生装置 |
| EP1704586A1 (fr) | 2003-12-30 | 2006-09-27 | Akrion Llc | Systeme et procede pour la gravure selective de nitrure de silicium lors du traitement de substrat |
| US7107128B2 (en) | 2004-02-13 | 2006-09-12 | Entegris, Inc. | System for controlling fluid flow |
| US20060080041A1 (en) | 2004-07-08 | 2006-04-13 | Anderson Gary R | Chemical mixing apparatus, system and method |
| US20060021634A1 (en) | 2004-07-08 | 2006-02-02 | Liu Zhi Lewis | Method and apparatus for creating ozonated process solutions having high ozone concentration |
| JP3777451B2 (ja) * | 2004-08-18 | 2006-05-24 | 株式会社プレテック | オゾン水生成方法及びオゾン水製造装置 |
| TWI552797B (zh) | 2005-06-22 | 2016-10-11 | 恩特葛瑞斯股份有限公司 | 整合式氣體混合用之裝置及方法 |
| TWI402423B (zh) | 2006-02-28 | 2013-07-21 | Entegris Inc | 用於一幫浦操作之系統及方法 |
| US7743783B2 (en) | 2006-04-04 | 2010-06-29 | Air Liquide Electronics U.S. Lp | Method and apparatus for recycling process fluids |
| JP4830731B2 (ja) | 2006-09-06 | 2011-12-07 | 栗田工業株式会社 | ガス溶解水供給装置 |
| US8448925B2 (en) | 2006-10-17 | 2013-05-28 | Mks Instruments, Inc. | Devices, systems, and methods for carbonation of deionized water |
| JP5466817B2 (ja) | 2007-09-03 | 2014-04-09 | シャープ株式会社 | オゾン水製造装置 |
| JP5020784B2 (ja) * | 2007-11-08 | 2012-09-05 | 野村マイクロ・サイエンス株式会社 | オゾン水の製造装置及び製造方法 |
| JP5412135B2 (ja) | 2009-02-23 | 2014-02-12 | 野村マイクロ・サイエンス株式会社 | オゾン水供給装置 |
| US8747762B2 (en) | 2009-12-03 | 2014-06-10 | Applied Materials, Inc. | Methods and apparatus for treating exhaust gas in a processing system |
| JP5779321B2 (ja) | 2010-06-18 | 2015-09-16 | シャープ株式会社 | 高濃度オゾン水の製造方法及び高濃度オゾン水の製造装置 |
| US9056262B2 (en) * | 2012-11-08 | 2015-06-16 | Mks Instruments, Inc. | Pressure-less ozonated Di-water (DIO3) recirculation reclaim system |
| JP7086068B2 (ja) | 2016-11-11 | 2022-06-17 | エムケイエス インストゥルメンツ， インコーポレイテッド | アンモニアガスをその中に溶解した脱イオン水を含む導電性液体を生成するためのシステム及び方法 |
-
2019
- 2019-08-27 EP EP19856235.7A patent/EP3814284A4/fr active Pending
- 2019-08-27 WO PCT/US2019/048411 patent/WO2020046994A1/fr active Application Filing
- 2019-08-27 KR KR1020237040837A patent/KR20230165878A/ko not_active Application Discontinuation
- 2019-08-27 JP JP2021510328A patent/JP7422135B2/ja active Active
- 2019-08-27 KR KR1020217008472A patent/KR20210038980A/ko active Application Filing
- 2019-08-27 SG SG11202100619PA patent/SG11202100619PA/en unknown
- 2019-08-27 CN CN201980054540.9A patent/CN112601720A/zh active Pending
- 2019-08-27 US US16/553,033 patent/US11518696B2/en active Active
- 2019-08-29 TW TW108130968A patent/TW202023962A/zh unknown
-
2021
- 2021-02-26 IL IL281134A patent/IL281134A/en unknown
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