|
US4645714A
(en)
*
|
1984-12-24 |
1987-02-24 |
Minnesota Mining And Manufacturing Company |
Corrosion-resistant silver mirror
|
|
US5939188A
(en)
*
|
1991-07-15 |
1999-08-17 |
Pilkington Aerospace, Inc. |
Transparent coating systems for improving the environmental durability of transparency substrates
|
|
JP3283668B2
(ja)
|
1993-11-17 |
2002-05-20 |
富士通株式会社 |
半導体装置
|
|
TW590890B
(en)
*
|
2001-09-03 |
2004-06-11 |
Teijin Ltd |
Transparent electroconductive laminate and transparent touch panel using the same
|
|
WO2003032332A1
(en)
*
|
2001-10-05 |
2003-04-17 |
Bridgestone Corporation |
Transparent electroconductive film, method for manufacture thereof, and touch panel
|
|
JP4837654B2
(ja)
*
|
2005-02-17 |
2011-12-14 |
旭硝子株式会社 |
導電性積層体、プラズマディスプレイ用電磁波遮蔽フィルムおよびプラズマディスプレイ用保護板
|
|
JP2007090803A
(ja)
*
|
2005-09-30 |
2007-04-12 |
Fujifilm Corp |
ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子
|
|
US9822454B2
(en)
*
|
2006-12-28 |
2017-11-21 |
3M Innovative Properties Company |
Nucleation layer for thin film metal layer formation
|
|
JP2008234902A
(ja)
*
|
2007-03-19 |
2008-10-02 |
Konica Minolta Business Technologies Inc |
光電変換素子及び太陽電池
|
|
EP2212726A1
(en)
*
|
2007-10-30 |
2010-08-04 |
3M Innovative Properties Company |
Multi-stack optical bandpass film with electro magnetic interference shielding for optical display filters
|
|
KR101236072B1
(ko)
*
|
2008-01-11 |
2013-02-22 |
주식회사 엘지화학 |
유기-무기 하이브리드 버퍼층을 갖는 투명도전성 적층체
|
|
EP2347895A4
(en)
*
|
2008-11-11 |
2013-02-20 |
Asahi Glass Co Ltd |
ELECTRICALLY CONDUCTIVE COATING AND PROTECTIVE PLATE FOR A PLASMA INDICATOR
|
|
US9040119B2
(en)
*
|
2008-12-01 |
2015-05-26 |
Sumitomo Metal Mining Co., Ltd. |
Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising the same
|
|
CN102474999B
(zh)
*
|
2009-08-03 |
2016-09-07 |
3M创新有限公司 |
用于形成光学透明的导电金属或金属合金薄膜的方法以及由其制成的膜
|
|
WO2011017039A2
(en)
*
|
2009-08-03 |
2011-02-10 |
3M Innovative Properties Company |
Antireflective transparent emi shielding optical filter
|
|
CN101697289A
(zh)
*
|
2009-10-15 |
2010-04-21 |
浙江大学 |
一种透明导电膜及其制备方法
|
|
US9011985B2
(en)
*
|
2009-10-30 |
2015-04-21 |
Sumitomo Chemical Company, Limited |
Method of manufacture of multilayer film
|
|
EP2360293A1
(en)
|
2010-02-11 |
2011-08-24 |
Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO |
Method and apparatus for depositing atomic layers on a substrate
|
|
JP5728816B2
(ja)
*
|
2010-03-26 |
2015-06-03 |
東洋インキＳｃホールディングス株式会社 |
無機酸化物分散用ビニル重合体、およびそれを含んでなる導電性無機酸化物分散体
|
|
US8920912B2
(en)
*
|
2010-05-13 |
2014-12-30 |
Lg Chem, Ltd. |
Multilayer structured transparent electrically-conductive film and method of manufacturing the same
|
|
KR101279586B1
(ko)
*
|
2011-01-20 |
2013-06-27 |
한국과학기술연구원 |
플렉서블 광전극과 그 제조방법, 및 이를 이용한 염료감응 태양전지
|
|
RU2672962C2
(ru)
*
|
2013-08-30 |
2018-11-21 |
Июкф-Хю (Индастри-Юниверсити-Кооперейшн Фаундейшн Ханян Юниверсити) |
Структура подложки и способ ее изготовления
|
|
SG11201605730RA
(en)
*
|
2014-01-13 |
2016-09-29 |
Agency Science Tech & Res |
Method for forming low emissivity doped zinc oxide films on a substrate
|
|
DE102014102360A1
(de)
*
|
2014-02-24 |
2015-08-27 |
Osram Opto Semiconductors Gmbh |
Laserdiodenchip
|
|
JP6048529B2
(ja)
*
|
2014-06-02 |
2016-12-21 |
Tdk株式会社 |
透明導電性フィルム及びタッチパネル
|
|
CN106414799A
(zh)
*
|
2014-06-12 |
2017-02-15 |
巴斯夫涂料有限公司 |
用于制造可挠性有机‑无机层合物的方法
|
|
KR20160009120A
(ko)
|
2014-07-15 |
2016-01-26 |
한양대학교 산학협력단 |
유기 링킹 물질을 갖는 무기막 구조체, 및 그 제조 방법
|
|
WO2016144869A1
(en)
*
|
2015-03-12 |
2016-09-15 |
Ppg Industries Ohio, Inc. |
Optoelectronic device and method of making the same
|
|
BR112017020245A2
(pt)
*
|
2015-03-25 |
2018-06-05 |
Basf Coatings Gmbh |
?processo para produção de um laminado, laminado, película de barreira, uso da película de barreira, e, dispositivo eletrônico?.
|
|
JP6628974B2
(ja)
*
|
2015-03-30 |
2020-01-15 |
リンテック株式会社 |
透明導電性フィルム
|
|
JPWO2017006634A1
(ja)
*
|
2015-07-08 |
2018-04-19 |
ソニー株式会社 |
電子デバイス及び固体撮像装置
|
|
JP6783294B2
(ja)
*
|
2016-02-26 |
2020-11-11 |
コニカミノルタ株式会社 |
透明電極及びこれを備えた有機電子デバイス
|