JPWO2019150995A1 - 熱硬化性樹脂組成物、フィルム状接着剤、接着シート、及び半導体装置の製造方法 - Google Patents
熱硬化性樹脂組成物、フィルム状接着剤、接着シート、及び半導体装置の製造方法 Download PDFInfo
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- JPWO2019150995A1 JPWO2019150995A1 JP2019569003A JP2019569003A JPWO2019150995A1 JP WO2019150995 A1 JPWO2019150995 A1 JP WO2019150995A1 JP 2019569003 A JP2019569003 A JP 2019569003A JP 2019569003 A JP2019569003 A JP 2019569003A JP WO2019150995 A1 JPWO2019150995 A1 JP WO2019150995A1
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- 239000011342 resin composition Substances 0.000 title claims abstract description 46
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 45
- 239000000853 adhesive Substances 0.000 title claims description 141
- 230000001070 adhesive effect Effects 0.000 title claims description 141
- 239000004065 semiconductor Substances 0.000 title claims description 120
- 238000000034 method Methods 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 36
- 239000003822 epoxy resin Substances 0.000 claims abstract description 33
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 33
- 229920001971 elastomer Polymers 0.000 claims abstract description 32
- 239000000806 elastomer Substances 0.000 claims abstract description 32
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 28
- 125000000524 functional group Chemical group 0.000 claims abstract description 14
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 27
- 239000004925 Acrylic resin Substances 0.000 claims description 20
- 229920000178 Acrylic resin Polymers 0.000 claims description 20
- 239000005011 phenolic resin Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- 238000010030 laminating Methods 0.000 claims description 10
- 239000011256 inorganic filler Substances 0.000 claims description 8
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 8
- 238000002788 crimping Methods 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 3
- 239000004848 polyfunctional curative Substances 0.000 claims description 2
- 238000011156 evaluation Methods 0.000 description 15
- 238000011282 treatment Methods 0.000 description 15
- 239000002966 varnish Substances 0.000 description 15
- 230000000740 bleeding effect Effects 0.000 description 13
- -1 polycyclic aromatic diglycidyl ether compounds Chemical class 0.000 description 13
- 239000002904 solvent Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 10
- 229920000800 acrylic rubber Polymers 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 229920000058 polyacrylate Polymers 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- 208000029497 Elastoma Diseases 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- 239000002313 adhesive film Substances 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 239000000378 calcium silicate Substances 0.000 description 2
- 229910052918 calcium silicate Inorganic materials 0.000 description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 229910002026 crystalline silica Inorganic materials 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- 239000001095 magnesium carbonate Substances 0.000 description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000391 magnesium silicate Substances 0.000 description 2
- 229910052919 magnesium silicate Inorganic materials 0.000 description 2
- 235000019792 magnesium silicate Nutrition 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 2
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000306 polymethylpentene Polymers 0.000 description 2
- 239000011116 polymethylpentene Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 238000002059 diagnostic imaging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002987 primer (paints) Substances 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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Abstract
Description
本実施形態に係る熱硬化性樹脂組成物は、(A)エポキシ樹脂と、(B)硬化剤と、(C)カルボキシ基及び水酸基からなる群より選ばれる少なくとも1種の官能基を有する第1のエラストマと、(D)カルボキシ基及び水酸基を有しない第2のエラストマと、を含有する。熱硬化性樹脂組成物は、半硬化(Bステージ)状態を経て、硬化処理後に完全硬化物(Cステージ)状態となり得る。
(A)成分は、分子内にエポキシ基を有するものであれば、特に制限なく用いることができる。(A)成分としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、ジシクロペンタジエン骨格含有エポキシ樹脂、スチルベン型エポキシ樹脂、トリアジン骨格含有エポキシ樹脂、フルオレン骨格含有エポキシ樹脂、トリフェノールフェノールメタン型エポキシ樹脂、ビフェニル型エポキシ樹脂、キシリレン型エポキシ樹脂、フェニルアラルキル型エポキシ樹脂、ビフェニルアラルキル型エポキシ樹脂、ナフタレン型エポキシ樹脂、多官能フェノール類、アントラセン等の多環芳香族類のジグリシジルエーテル化合物などが挙げられる。これらは、1種を単独で又は2種以上を組み合わせて用いてもよい。これらの中でも、(A)成分は、流動性の観点から、150℃溶融粘度が1.0Pa・s以下であるものが好ましい。また、(A)成分は、エポキシ樹脂が25℃で液体のエポキシ樹脂を含んでいてもよい。
(C)成分は、重量平均分子量が20万〜130万であり、カルボキシ基及び水酸基からなる群より選ばれる少なくとも1種の官能基を有するエラストマである。(C)成分は、カルボキシ基を有するエラストマであってよい。熱硬化性樹脂組成物が(C)成分を含有することによって、熱圧着時に架橋反応が進行し、熱硬化性樹脂組成物が増粘して、高温加圧処理時のブリード量の増加を抑制することが可能となり得る。(C)成分は、エラストマを構成する重合体のガラス転移温度(Tg)が50℃以下であるものが好ましい。
(D)成分は、重量平均分子量が20万〜130万であり、カルボキシ基及び水酸基を有しないエラストマである。(D)成分は、カルボキシ基及び水酸基以外の官能基(例えば、グリシジル基等)を有するエラストマであってよい。熱硬化性樹脂組成物が(D)成分を含有することによって、経時安定性が良好となり得る。(D)成分は、エラストマを構成する重合体のガラス転移温度(Tg)が50℃以下であるものが好ましい。
本実施形態に係る熱硬化性樹脂組成物は、(E)無機フィラーをさらに含有していてもよい。無機フィラーとしては、例えば、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、ケイ酸カルシウム、ケイ酸マグネシウム、酸化カルシウム、酸化マグネシウム、酸化アルミニウム、窒化アルミニウム、ホウ酸アルミウィスカ、窒化ホウ素、結晶性シリカ、非晶性シリカ等が挙げられる。これらは1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。得られるフィルム状接着剤の熱伝導性がより向上する観点から、無機フィラーは、酸化アルミニウム、窒化アルミニウム、窒化ホウ素、結晶性シリカ又は非晶性シリカを含んでいてよい。また、熱硬化性樹脂組成物の溶融粘度を調整する観点及び熱硬化性樹脂組成物にチキソトロピック性を付与する観点から、無機フィラーは、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、ケイ酸カルシウム、ケイ酸マグネシウム、酸化カルシウム、酸化マグネシウム、酸化アルミニウム、結晶性シリカ又は非晶性シリカを含んでいてよい。
本実施形態に係る熱硬化性樹脂組成物は、(F)硬化促進剤をさらに含有していてもよい。硬化促進剤は、特に限定されず、一般に使用されるものを用いることができる。(F)成分としては、例えば、イミダゾール類及びその誘導体、有機リン系化合物、第二級アミン類、第三級アミン類、第四級アンモニウム塩等が挙げられる。これらは、1種を単独で又は2種以上を組み合わせて用いてもよい。これらの中でも、反応性の観点から(F)成分はイミダゾール類及びその誘導体であってよい。
本実施形態に係る熱硬化性樹脂組成物は、その他の成分として、抗酸化剤、シランカップリング剤、レオロジーコントロール剤等をさらに含有していてもよい。これらの成分の含有量は、(A)成分、(B)成分、(C)成分、及び(D)成分の総量100質量部に対して、0.02〜3質量部であってよい。
図1は、一実施形態に係るフィルム状接着剤を示す模式断面図である。フィルム状接着剤10は、上述の接着剤組成物をフィルム状に形成してなるものである。フィルム状接着剤10は、半硬化(Bステージ)状態であってよい。このようなフィルム状接着剤10は、接着剤組成物を支持フィルムに塗布することによって形成することができる。接着剤ワニスを用いる場合は、接着剤ワニスを支持フィルムに塗布し、溶剤を加熱乾燥して除去することによってフィルム状接着剤10を形成することができる。
図2は、一実施形態に係る接着シートを示す模式断面図である。接着シート100は、基材20と基材上に設けられた上述のフィルム状接着剤10とを備える。
図4は、一実施形態に係る半導体装置を示す模式断面図である。半導体装置200は、基板14に、第1のワイヤ88を介して1段目の第1の半導体素子Waがワイヤボンディング接続されると共に、第1の半導体素子Wa上に、第2の半導体素子Waaがフィルム状接着剤10を介して圧着されることで、第1のワイヤ88の少なくとも一部がフィルム状接着剤10に埋め込まれてなる半導体装置である。半導体装置は、第1のワイヤ88の少なくとも一部が埋め込まれてなるワイヤ埋め込み型の半導体装置であっても、第1のワイヤ88及び第1の半導体素子Waが埋め込まれてなる半導体装置であってもよい。また、半導体装置200では、基板14と第2の半導体素子Waaとがさらに第2のワイヤ98を介して電気的に接続されると共に、第2の半導体素子Waaが封止材42により封止されている。
本実施形態に係る半導体装置の製造方法は、基板上に第1のワイヤを介して第1の半導体素子を電気的に接続する第1のワイヤボンディング工程と、第2の半導体素子の片面に、上述のフィルム状接着剤を貼付するラミネート工程と、フィルム状接着剤が貼付された第2の半導体素子を、フィルム状接着剤を介して圧着することで、第1のワイヤの少なくとも一部をフィルム状接着剤に埋め込むダイボンド工程と、を備える。
<接着シートの作製>
以下に示す各成分を表1に示した配合割合(質量部)で混合し、溶媒としてシクロヘキサノンを用いて固形分40質量%の熱硬化性樹脂組成物のワニスを調製した。次に、得られたワニスを100メッシュのフィルターでろ過し、真空脱泡した。真空脱泡後のワニスを、基材フィルムとして、厚さ38μmの離型処理を施したポリエチレンテレフタレート(PET)フィルム上に塗布した。塗布したワニスを、90℃で5分間、続いて140℃で5分間の2段階で加熱乾燥した。このようにして、基材フィルム上に、半硬化(Bステージ)状態にある厚さ110μmのフィルム状接着剤を備える接着シートを得た。
A−1:ジシクロペンタジエン骨格含有エポキシ樹脂、DIC株式会社製、商品名:HP−7200L、エポキシ当量:242〜252g/eq
A−2:クレゾールノボラック型エポキシ樹脂、新日鉄住金化学株式会社製、商品名:YDCN−700−10、エポキシ当量:209g/eq
A−3:ビスフェノールF型エポキシ樹脂(25℃で液体)、DIC株式会社製、商品名:EXA−830CRP、エポキシ当量:159g/eq
(B)硬化剤
B−1:ビフェニルアラルキル型フェノール樹脂、エア・ウォーター株式会社製、商品名:HE−200C−10、水酸基当量:205g/eq
B−2:フェニルアラルキル型フェノール樹脂、エア・ウォーター株式会社製、商品名:HE100C−30、水酸基当量:175g/eq
(C)第1のエラストマ(カルボキシ基及び水酸基からなる群より選ばれる少なくとも1種の官能基を有するエラストマ)
C−1:アクリルゴム、ナガセケムテックス株式会社製、商品名:WS−023 EK30、重量平均分子量:50万、酸価:20mgKOH/g、Tg:−10℃
C−2:アクリルゴム、ナガセケムテックス株式会社製、商品名:SG−708−6、重量平均分子量:70万、酸価:9mgKOH/g、Tg:4℃
C−3:アクリルゴム、ナガセケムテックス株式会社製、商品名:SG−280 EK23、重量平均分子量:90万、酸価:30mgKOH/g、Tg:−29℃
(D)第2のエラストマ(カルボキシ基及び水酸基を有しないエラストマ)
D−1:アクリルゴム、ナガセケムテックス株式会社製、商品名:HTR−860P−3CSP、重量平均分子量:80万、グリシジル基含有モノマー比率:3%、Tg:−7℃
D−2:アクリルゴム、ナガセケムテックス株式会社製、商品名:HTR−860P−30B−CHN、重量平均分子量:23万、グリシジル基含有モノマー比率:8%、Tg:−7℃
D−3:アクリルゴム、ナガセケムテックス株式会社製、HTR−860P−3CSP改良品(商品名:HTR−860P−3CSP、ナガセケムテックス株式会社製のアクリルゴムにおいて、アクリルニトリルに由来する構成単位を除いたもの)、重量平均分子量:60万、Tg:12℃
(E)無機フィラー
E−1:シリカフィラー分散液、溶融シリカ、株式会社アドマテックス製、商品名:SC2050−HLG、平均粒径:0.50μm
(F)硬化促進剤
F−1:1−シアノエチル−2−フェニルイミダゾール、四国化成工業株式会社製、商品名:キュアゾール2PZ−CN
得られた実施例1〜7及び比較例1〜3の接着シートについて、埋め込み性及びブリード量の評価を行った。
接着シートの埋め込み性を以下の評価サンプルを作製して評価した。上記で得られたフィルム状接着剤(厚さ110μm)を、基材フィルムを剥がし、ダイシングテープに貼り付け、ダイシングダイボンディング一体型接着シートを得た。次に、厚さ100μmの半導体ウェハ(8インチ)を、接着剤側に70℃に加熱して貼り付けた。その後、この半導体ウェハを7.5mm角にダイシングすることによって、半導体チップAを得た。次に、ダイシングダイボンディング一体型接着シート(日立化成株式会社、商品名:HR9004−10)(厚さ10μm)を用意し、厚さ50μmの半導体ウェハ(8インチ)に70℃に加熱して貼り付けた。その後、この半導体ウェハを4.5mm角にダイシングすることによって、ダイボンディングフィルム付きの半導体チップBを得た。次いで、ソルダーレジスト(太陽日酸株式会社、商品名:AUS308)を塗布した総厚さ260μmの評価用基板を用意し、ダイボンディングフィルム付きの半導体チップBのダイボンディングフィルムと評価用基板のソルダーレジストとが接するように、120℃、0.20MPa、2秒間の条件で圧着した。その後、半導体チップAのフィルム状接着剤と半導体チップBの半導体ウェハとが接するように、120℃、0.20MPa、1.5秒間の条件で圧着し、評価サンプルを得た。この際、先に圧着している半導体チップBが半導体チップAの中央となるように位置合わせを行った。このようにして得られた評価サンプルを超音波デジタル画像診断装置(インサイト株式会社製、プローブ:75MHz)にてボイドの観測の有無を観測し、ボイドが観測された場合は、単位面積あたりのボイドの面積の割合を算出し、これらの分析結果を埋め込み性として評価した。評価基準は、以下のとおりである。結果を表1に示す。
A:ボイドが観測されなかった。
B:ボイドが観測されたが、その割合が5面積%未満であった。
C:ボイドが観測され、その割合が5面積%以上であった。
上記埋め込み性評価で「A」又は「B」評価であったものについてのみ、ブリード量評価を行った。上記埋め込み性評価で作製した評価サンプルと同様の手順で、評価サンプルを作製した。半導体チップAのフィルム状接着剤と半導体チップBの半導体ウェハとを、120℃、0.20MPa、1.5秒間の条件で圧着した。次いで、加圧オーブンを用いて、140℃、0.7MPa、30分の条件で高温加圧処理(加圧キュア)を行い、加圧キュア前後において、評価サンプルを顕微鏡で観察し、評価サンプルの4辺の中心から、フィルム状接着剤のブリード量(はみ出し量)をそれぞれ測定した。加圧キュア前のブリード量をL1、加圧キュア後のブリード量をL2とし、以下の式に基づき、ブリード量増加率を算出した。結果を表1に示す。
ブリード量増加率(%)=(L2−L1)/L1×100
Claims (12)
- エポキシ樹脂と、
硬化剤と、
重量平均分子量が20万〜130万であり、カルボキシ基及び水酸基からなる群より選ばれる少なくとも1種の官能基を有する第1のエラストマと、
重量平均分子量が20万〜130万であり、カルボキシ基及び水酸基を有しない第2のエラストマと、
を含有し、
前記第1のエラストマ及び前記第2のエラストマの合計の含有量が、熱硬化性樹脂組成物全量を基準として、40質量%以下である、熱硬化性樹脂組成物。 - 前記硬化剤がフェノール樹脂を含む、請求項1に記載の熱硬化性樹脂組成物。
- 前記第1のエラストマがカルボキシ基及び水酸基からなる群より選ばれる少なくとも1種の官能基を有するアクリル樹脂である、請求項1又は2に記載の熱硬化性樹脂組成物。
- 前記第2のエラストマがカルボキシ基及び水酸基を有しないアクリル樹脂である、請求項1〜3のいずれか一項に記載の熱硬化性樹脂組成物。
- 前記エポキシ樹脂が25℃で液体のエポキシ樹脂を含む、請求項1〜4のいずれか一項に記載の熱硬化性樹脂組成物。
- 無機フィラーをさらに含有する、請求項1〜5のいずれか一項に記載の熱硬化性樹脂組成物。
- 硬化促進剤をさらに含有する、請求項1〜6のいずれか一項に記載の熱硬化性樹脂組成物。
- 請求項1〜7のいずれか一項に記載の熱硬化性樹脂組成物をフィルム状に形成してなる、フィルム状接着剤。
- 基材と、
前記基材上に設けられた、請求項8に記載のフィルム状接着剤と、
を備える、接着シート。 - 前記基材がダイシングテープである、請求項9に記載の接着シート。
- 前記フィルム状接着剤の前記基材とは反対側の面に積層された保護フィルムをさらに備える、請求項9又は10に記載の接着シート。
- 基板上に第1のワイヤを介して第1の半導体素子を電気的に接続するワイヤボンディング工程と、
第2の半導体素子の片面に、請求項8に記載のフィルム状接着剤を貼付するラミネート工程と、
前記フィルム状接着剤が貼付された第2の半導体素子を、前記フィルム状接着剤を介して圧着することで、前記第1のワイヤの少なくとも一部を前記フィルム状接着剤に埋め込むダイボンド工程と、
を備える、半導体装置の製造方法。
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TW201940635A (zh) | 2019-10-16 |
CN111630643B (zh) | 2023-07-07 |
TWI785196B (zh) | 2022-12-01 |
SG11202006827RA (en) | 2020-08-28 |
CN111630643A (zh) | 2020-09-04 |
KR20200115515A (ko) | 2020-10-07 |
JP7283399B2 (ja) | 2023-05-30 |
KR102561428B1 (ko) | 2023-07-31 |
WO2019150995A1 (ja) | 2019-08-08 |
WO2019150433A1 (ja) | 2019-08-08 |
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