JPWO2016104563A1 - 立方晶窒化硼素焼結体および被覆立方晶窒化硼素焼結体 - Google Patents
立方晶窒化硼素焼結体および被覆立方晶窒化硼素焼結体 Download PDFInfo
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- JPWO2016104563A1 JPWO2016104563A1 JP2016544497A JP2016544497A JPWO2016104563A1 JP WO2016104563 A1 JPWO2016104563 A1 JP WO2016104563A1 JP 2016544497 A JP2016544497 A JP 2016544497A JP 2016544497 A JP2016544497 A JP 2016544497A JP WO2016104563 A1 JPWO2016104563 A1 JP WO2016104563A1
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- boron nitride
- cubic boron
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Abstract
Description
(1)40体積%以上85体積%以下の立方晶窒化硼素と、15体積%以上60体積%以下の結合相と、不可避的不純物とからなる立方晶窒化硼素焼結体であって、
前記結合相は、Al元素とN、OおよびBからなる群から選択される少なくとも1種の元素とからなるAl化合物と、
Zr元素とC、N、OおよびBからなる群から選択される少なくとも1種の元素とからなるZr化合物と
を含み、
前記Zr化合物は、ZrO、またはZrOとZrO2とを含み、
X線回折における、前記ZrOの(111)面のピーク強度をI1、正方晶ZrO2の(101)面のピーク強度をI2t、立方晶ZrO2の(111)面のピーク強度をI2cとしたとき、I1とI2tとI2cとの合計強度に対するI1の強度の比[I1/(I1+I2t+I2c)]が、0.6以上1.0以下であり、
前記Al化合物の平均粒径が、80nm以上300nm以下である立方晶窒化硼素焼結体。
(2)前記Al化合物は、Al2O3を含み、
前記Al2O3の結晶構造は、α-Al2O3であり、
X線回折における、前記α-Al2O3の(110)面のピーク強度をI3としたとき、I3の強度に対するI1の強度の比[I1/I3]が、0.3以上0.8以下である(1)の立方晶窒化硼素焼結体。
(3)前記Zr化合物は、前記立方晶窒化硼素焼結体全体に対して1体積%以上10体積%以下である(1)または(2)の立方晶窒化硼素焼結体。
(4)前記立方晶窒化硼素の平均粒径が、0.2μm以上2.0μm以下である(1)〜(3)のいずれかの立方晶窒化硼素焼結体。
(5)(1)〜(4)のいずれかの立方晶窒化硼素焼結体の表面に被膜を形成した被覆立方晶窒化硼素焼結体。
(6)前記被膜が、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、AlおよびSiからなる群から選択される少なくとも1種以上の元素と、C、N、OおよびBからなる群から選択される少なくとも1種以上の元素とからなる(5)の被覆立方晶窒化硼素焼結体。
(7)前記被膜が、単層膜または2層以上の積層膜である(5)または(6)の被覆立方晶窒化硼素焼結体。
(8)前記被膜全体の平均膜厚が0.5μm以上20μm以下である(5)〜(7)のいずれかの立方晶窒化硼素焼結体。
工程(A):平均粒径0.2〜2.0μmのZrO2粉末60〜80体積%と、平均粒径0.5〜5.0μmの、Al金属の粉末20〜40体積%とを配合(ただし、これらの合計は100体積%である)する工程と、
工程(B):前記工程(A)で配合した原料粉をZrO2製ボールにて5〜48時間の湿式ボールミルにより混合し、混合物を準備する第1混合工程と、
工程(C):得られた混合物を所定の形状に成形して仮焼結することにより、成形体を得る成形工程と、
工程(D):前記工程(C)で得られた成形体を焼結炉に入れて、0.1〜250.0×106PaのAr雰囲気にて1600〜1800℃の範囲の焼結温度で60分間保持して焼結する第1焼結工程と、
工程(E):前記工程(D)を経た複合体を超硬合金製乳鉢にて粉砕し、複合体粉末を作製する粉砕工程と、
工程(F):前記工程(E)で得られた複合体粉末を超硬合金製ボールにて24〜96時間の湿式ボールミルによりさらに複合体粉末を微粒にする粉砕工程と、
工程(G):前記工程(F)を経た複合体粉末を比重分離し、その後、酸処理により超硬合金由来成分を除去する超硬合金除去工程と、
工程(H):前記工程(G)を経た複合体粉末1〜10体積%と、平均粒径0.2〜2.0μmの立方晶窒化硼素40〜85体積%と、平均粒径0.05〜3.0μmの、Al元素の窒化物、酸化物および硼化物から成る群より選択された少なくとも1種の粉末14〜50体積%と、平均粒径0.5〜5.0μmの、Al粉末3〜13体積%とを配合(ただし、これらの合計は100体積%である)する工程と、
工程(I):前記工程(H)で配合した原料粉をAl2O3製ボールにて5〜24時間の湿式ボールミルにより混合し、混合物を準備する第2混合工程と、
工程(J):得られた混合物を所定の形状に成形して成形体を得る成形工程と、
工程(K):前記工程(J)で得られた成形体を超高圧発生装置に入れて、4.5〜6.0GPaの圧力にて1300〜1500℃の範囲の焼結温度で所定の時間保持して焼結する第2焼結工程とを含む。
工程(A)では、ZrO2と、Al金属を含む複合体粉末を作製することができる。その中でも、ZrO2として、CeO2、Y2O3、MgO、および/またはCaOなどを添加して得られたZrO2粉末を用いる場合には、靱性に優れる正方晶または立方晶を形成することができる。ZrO2粉末の一次粒子の平均粒径が30〜50nmであると場合には、立方晶窒化硼素焼結体の組織中に微細なZrO2が分散しやすくなるという効果がある。しかしながら、取り扱いのしやすさから、平均粒径30〜50nmのZrO2の一次粒子が凝集した、平均粒径0.1〜2μmの二次粒子のZrO2粉末を用いることが好ましい。
3ZrO2+2Al→3ZrO+Al2O3 (1)
ZrO2全体に対して3mol%のY2O3が添加された平均粒径40nmのZrO2粒子(一次粒子)が凝集してできた平均粒径0.6μmのZrO2(PSZ)粉末、ZrO2全体に対して10mol%のY2O3が添加された平均粒径40nmのZrO2粒子(一次粒子)が凝集してできた平均粒径0.6μmのZrO2(FSZ)粉末、および平均粒径4.0μmのAl粉末、を用いて表1に示す配合組成に配合した。なお、比較品1〜4、8、10については、複合体粉末を作製しなかった。
外周連続切削(旋削)、
被削材:インコネル718、
被削材形状:円柱φ120mm×350mm、
切削速度:270m/min、
切込み:0.3mm、
送り:0.18mm/rev、
クーラント:湿式、
評価項目:試料が欠損または最大逃げ面摩耗幅が0.2mmに至ったときを工具寿命とし、工具寿命に達するまでの切削時間を測定した。
実施例1の発明品1〜15の表面にPVD装置を用いて被覆処理を行った。発明品1〜5の立方晶窒化硼素焼結体の表面に平均層厚3μmのTiN層を被覆したものを発明品16〜20とし、発明品6〜10の立方晶窒化硼素焼結体の表面に平均層厚3μmのTiAlN層を被覆したものを発明品21〜25とした。発明品11〜15の立方晶窒化硼素焼結体の表面に1層あたり3nmのTiAlNと、1層あたり3nmのTiAlNbWNとを交互に500層ずつ積層した交互積層を被覆したものを発明品26〜30とした。発明品16〜30について、実施例1と同じ切削試験を行った。その結果を表9に示す。
Claims (8)
- 40体積%以上85体積%以下の立方晶窒化硼素と、15体積%以上60体積%以下の結合相と、不可避的不純物とからなる立方晶窒化硼素焼結体であって、
前記結合相は、
Al元素とN、OおよびBからなる群から選択される少なくとも1種の元素とからなるAl化合物と、
Zr元素とC、N、OおよびBからなる群から選択される少なくとも1種の元素とからなるZr化合物と
を含み、
前記Zr化合物は、ZrO、またはZrOとZrO2とを含み、
X線回折における、前記ZrOの(111)面のピーク強度をI1、正方晶ZrO2の(101)面のピーク強度をI2t、立方晶ZrO2の(111)面のピーク強度をI2cとしたとき、I1とI2tとI2cとの合計強度に対するI1の強度の比[I1/(I1+I2t+I2c)]が、0.6以上1.0以下であり、
前記Al化合物の平均粒径が、80nm以上300nm以下である立方晶窒化硼素焼結体。 - 前記Al化合物は、Al2O3を含み、
前記Al2O3の結晶構造は、α-Al2O3であり、
X線回折における、前記α-Al2O3の(110)面のピーク強度をI3としたとき、I3の強度に対するI1の強度の比[I1/I3]が、0.3以上0.8以下である請求項1に記載の立方晶窒化硼素焼結体。 - 前記Zr化合物は、前記立方晶窒化硼素焼結体全体に対して1体積%以上10体積%以下である請求項1または2に記載の立方晶窒化硼素焼結体。
- 前記立方晶窒化硼素の平均粒径が、0.2μm以上2.0μm以下である請求項1〜3のいずれか1項に記載の立方晶窒化硼素焼結体。
- 請求項1〜4のいずれか1項に記載の立方晶窒化硼素焼結体の表面に被膜を形成した被覆立方晶窒化硼素焼結体。
- 前記被膜が、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、AlおよびSiからなる群から選択される少なくとも1種以上の元素と、C、N、OおよびBからなる群から選択される少なくとも1種以上の元素とからなる請求項5に記載の被覆立方晶窒化硼素焼結体。
- 前記被膜が、単層膜または2層以上の積層膜である請求項5または6に記載の被覆立方晶窒化硼素焼結体。
- 前記被膜全体の総膜厚が平均膜厚で0.5μm以上20μm以下である請求項5〜7のいずれか1項に記載の被覆立方晶窒化硼素焼結体。
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