JPWO2016035878A1 - ウエハー保持台及びその製法 - Google Patents
ウエハー保持台及びその製法 Download PDFInfo
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- JPWO2016035878A1 JPWO2016035878A1 JP2015562221A JP2015562221A JPWO2016035878A1 JP WO2016035878 A1 JPWO2016035878 A1 JP WO2016035878A1 JP 2015562221 A JP2015562221 A JP 2015562221A JP 2015562221 A JP2015562221 A JP 2015562221A JP WO2016035878 A1 JPWO2016035878 A1 JP WO2016035878A1
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- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
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- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
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- 229920000058 polyacrylate Polymers 0.000 description 7
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- 238000000034 method Methods 0.000 description 5
- 239000003507 refrigerant Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
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- 229910000838 Al alloy Inorganic materials 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
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- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
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- 238000002844 melting Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
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- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
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- 230000000007 visual effect Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
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- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
- B29C43/3642—Bags, bleeder sheets or cauls for isostatic pressing
- B29C2043/3644—Vacuum bags; Details thereof, e.g. fixing or clamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/18—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles incorporating preformed parts or layers, e.g. compression moulding around inserts or for coating articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
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- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
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- Microelectronics & Electronic Packaging (AREA)
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- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Laminated Bodies (AREA)
Abstract
Description
セラミック製の静電チャックと金属製の冷却板との間に樹脂製の接着層を備えたウエハー保持台であって、
前記接着層は、前記静電チャックに接する第1層と、前記冷却板に接する第2層と、前記第1層と前記第2層との間に位置する中間層とを含み、耐熱性については前記第1層及び前記中間層が前記第2層より高く、柔軟性については前記第2層が前記第1層及び前記中間層より高く、各層が気密に接している
ものである。
前記静電チャックの一方の面に前記第1層が熱硬化する前の第1層前駆体の層を設けると共に、前記冷却板の一方の面に前記第2層が熱硬化する前の第2層前駆体の層を設け、前記静電チャックの前記第1層前駆体の層と前記冷却板の前記第2層前駆体の層との間に前記中間層に相当する熱硬化済みの平坦な樹脂シートを挟み込むことで積層体とし、該積層体を袋内に入れて該袋内を減圧にしたあと該袋の外部から加圧しつつ加熱することにより、前記第1層前駆体の層及び前記第2層前駆体の層を熱硬化させる、
ものである。
[実験例1〜13]
実験例1〜13は、第1層及び中間層として耐熱性樹脂、第2層として柔軟性樹脂を用いた例である。各実験例のウエハー保持台のサンプルを以下の手順にしたがって作製した。このサンプルは、図1において給電部材13a,13bを省略したものである。まず、冷却水路を有する直径300mmのAl製の冷却板に応力緩和層の前駆体である未硬化で変形容易な接着剤シートを貼り付けた。ここでは、接着剤シートとして、発明の実施の形態の欄で説明した接着剤シート(3)を用いた。次に、その接着性シートの上に中間層となる平坦な樹脂シートを貼り合わせた。平坦な樹脂シートは、熱硬化後の耐熱性樹脂シートであって、接着性がなく、平坦を維持可能なものである。次に、平坦な樹脂シートの上に、耐熱層の前駆体である未硬化な接着性シートを貼り合わせた。但し、耐熱層の前駆体がペースト状の場合(例えばエポキシ系)には、平坦な樹脂シートの上にそのペーストを塗布した。次に、耐熱層の前駆体の上に、電極が埋設された直径300mm、厚み4〜5mmのセラミック基体を貼り合わせることにより、積層体を作製した。次に、この積層体を耐熱性の高い布で包んだ。これを更に樹脂製のバギング袋に入れ、袋内を真空引きした。真空引きした袋をオートクレーブにいれ、150〜180℃、1.0MPaにて接着した。これにより、応力緩和層の前駆体及び耐熱層の前駆体がそれぞれ熱硬化して応力緩和層及び耐熱層となり、ウエハー保持台のサンプルが完成した。その後、ウエハー保持台のサンプルをオートクレーブから取り出した。実験例1〜13で用いた各層の具体的な材料や厚みを表1に示す。
実験例14〜18は、接着層を耐熱性樹脂の第1層のみ(つまり単層)で構成した例である。これらは、冷却板に第2層の前駆体である接着性シートを貼り付けなかったこと、中間層となる平坦な樹脂シートを用いなかったこと以外は、実験例1〜13と同様にしてウエハー保持台のサンプルを作製した。実験例14〜18で用いた第1層の具体的な材料や厚みを表1に示す。
実験例19〜23は、接着層を耐熱性樹脂の第1層及び柔軟性樹脂の第2層(つまり2層)で構成した例である。これらは、中間層となる平坦な樹脂シートを用いなかったこと以外は、実験例1〜13と同様にしてウエハー保持台のサンプルを作成した。実験例19〜23で用いた各層の具体的な材料や厚みを表1に示す。
[反り量]
各実験例のウエハー保持台のサンプルをセラミック基体の表面が下になるように水平な台の上に置き、3次元測定器にて,セラミック基体の表面の85点につきZ座標を測定した。測定したZ座標の最大値と最小値との差を平面度(反り量(μm))として求めた。反り量が50μm以下のものを使用可能と判断した。各実験例の初期(作製直後)の反り量を表1に示す。
各実験例につき、セラミック基体の代わりにガラスを用いたもの(ガラスサンプル)を作製した。ガラスサンプルをガラス側から目視で観察し、気泡の有無を確認した。更に、ガラスサンプルを純水の中に入れ、超音波探傷装置にて気泡の有無を確認した。超音波探傷装置では、純水中の製品に25MHzのパルス波を当て、気泡がある部分は媒質の変化によって反射波が生じるため、反射波の有無により気泡の有無を確認した。具体的には、φ1mm以上の気泡がなく、かつφ1mm未満の気泡が706.5cm2あたり20個以下である場合について気泡なしと判断した。超音波探傷装置では、ディスプレイに現れる画像で気泡の直径や個数を確認した。なお、気泡の有無は、目視でも超音波探傷装置でも同じ結果が得られるため、目視及び超音波探傷装置の少なくとも一つで判断すればよい。各実験例の初期の気泡の有無を表1に示す。
各実験例のウエハー保持台のサンプルを真空チャンバー内にセットし、冷却板に冷却水を流した。セラミック基体の上面にヒーターをセットした。そして、セラミック下面が所定の高温(250℃又は200℃)になるように、また冷却板上面が100℃になるように調節し、その状態で1000時間放置した。ソーク後、各実験例のウエハー保持台の反り量と気泡を測定した。その結果を表1に示す。
実験例1〜10は、第1層及び中間層としてポリイミド系樹脂、第2層としてエポキシ−アクリル混合樹脂を用いた例である。実験例1〜10のいずれも、作製直後(初期)においては、気泡が無く第1層、中間層及び第2層が気密に接しており、割れや剥がれは見られなかった。
Claims (8)
- セラミック製の静電チャックと金属製の冷却板との間に樹脂製の接着層を備えたウエハー保持台であって、
前記接着層は、前記静電チャックに接する第1層と、前記冷却板に接する第2層と、前記第1層と前記第2層との間に位置する中間層とを含み、耐熱性については前記第1層及び前記中間層が前記第2層より高く、柔軟性については前記第2層が前記第1層及び前記中間層より高く、各層が気密に接している、
ウエハー保持台。 - 室温において前記第2層の弾性率が前記第1層及び前記中間層より小さい、
請求項1に記載のウエハー保持台。 - 前記第2層は、エポキシ−アクリル混合樹脂層であり、室温においてせん断の弾性率Z(MPa)が0.048≦Z≦2.350である、
請求項1又は2に記載のウエハー保持台。 - 前記第1層及び前記中間層は、200℃で耐熱を示すポリイミド系樹脂層、エポキシ系樹脂層又はPEEK樹脂層であり、
前記第2層は、エポキシ−アクリル混合樹脂層である、
請求項1〜3のいずれか1項に記載のウエハー保持台。 - 前記第1層及び前記中間層は、250℃で耐熱を示すポリイミド系樹脂層、エポキシ系樹脂層又はPEEK樹脂層である、
請求項4に記載のウエハー保持台。 - 前記第2層の厚みは、前記第1層と前記中間層の厚みの和よりも薄く、150〜400μmである、
請求項1〜5のいずれか1項に記載のウエハー保持台。 - 請求項1〜6のいずれか1項に記載のウエハー保持台を製造する方法であって、
前記静電チャックの一方の面に前記第1層が熱硬化する前の第1層前駆体の層を設けると共に、前記冷却板の一方の面に前記第2層が熱硬化する前の第2層前駆体の層を設け、前記静電チャックの前記第1層前駆体の層と前記冷却板の前記第2層前駆体の層との間に前記中間層に相当する熱硬化済みの平坦な樹脂シートを挟み込むことで積層体とし、該積層体を袋内に入れて該袋内を減圧にしたあと該袋の外部から加圧しつつ加熱することにより、前記第1層前駆体の層及び前記第2層前駆体の層を熱硬化させる、
ウエハー保持台の製法。 - 前記第2層前駆体の層は、(A)水素移動型の重付加が可能なエポキシ樹脂、(B)アクリル酸エステル又はメタクリル酸エステルの重合体、(C)硬化剤、を含む接着材の層である、
請求項7に記載のウエハー保持台の製法。
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