JPWO2016031167A1 - 反射防止膜および反射防止膜を備えた光学部材 - Google Patents
反射防止膜および反射防止膜を備えた光学部材 Download PDFInfo
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Abstract
Description
本発明は、本発明者らが新たに見出した上記知見に基づいてなされたものである。
複数の層が、少なくとも2種の金属元素種の酸化膜もしくはケイ素と少なくとも1種の金属元素種の酸化膜により構成された相対的に高い屈折率を有する層と、酸窒化膜により構成された相対的に低い屈折率を有する層とを含む。
また、少なくとも2種の金属元素種の酸化膜とは、金属元素種の他は酸素元素のみを含む膜であり、ケイ素と少なくとも1種の金属元素種の酸化膜とは、ケイ素と金属元素種の他は酸素元素のみを含む膜であり、酸窒化膜とは、酸素元素と窒素元素の両元素を含む膜である。
そして、薄膜多層膜20は、屈折率nより高い屈折率を有する酸化膜21と、屈折率nより低い屈折率を有する酸窒化膜22とからなり、基板側に屈折率の高い酸化膜21、微細凹凸層30側に屈折率の低い酸窒化膜22が備えられている。
本例においては、薄膜多層膜20は、相対的に高い屈折率を有する酸化膜21と相対的に低い屈折率を有する酸窒化膜22とが、この順に基材5側から配置されているが、薄膜多層膜20の構成はこれに限るものではなく、3以上の層を備えていてもよいし、屈折率の高い層が基材側に配置される構成に限るものでもない。
図3に示す設計変更例1において、薄膜多層膜20は、図2に示した実施形態と同様に、屈折率nより高い屈折率を有する酸化膜21と、屈折率nより低い屈折率を有する酸窒化膜22とからなる。しかし、基材5側に低い屈折率を有する酸窒化膜22、微細凹凸層30側に高い屈折率を有する酸化膜21を備えている点が図2と相違する。
この設計変更例2で示すように、薄膜多層膜20は、酸化膜、酸窒化膜をそれぞれ複数層備えていてもよい。ここでは、3層ずつとしたが、酸化膜と酸窒化膜で異なる層数であってもよい。
しかしながら、既述の通り本発明者らは、SiON膜をスパッタ法により成膜する際に、設計屈折率に対し、実際に成膜された膜の屈折率にばらつきが生じ、そのばらつきが設計屈折率1.6近傍で急激に大きくなることを見出した。SiON膜の高屈折率側における大きな屈折率ばらつきを見出すに至った試験について以下に説明する。
Si基板上にスパッタ法を用いて種々の屈折率のSiONを成膜した。
スパッタ装置において、Siターゲットを用い、RF(Radio Frequency:高周波)パワー:500W、Ar流量:26sccm(ml/min)、N2流量:15sccmにそれぞれを固定し、O2流量を変化させることにより、Si:O:Nの比率が異なる、すなわち屈折率が異なるSiON膜を多数成膜した。一般に酸窒化物においては、窒素(N)の比率が大きくなるほど屈折率は大きくなる。成膜したSiON膜は、80nm〜120nmの範囲の厚みとした。
この試験により、SiONは、屈折率1.66程度までの比較的低い屈折率層を得るためにのみ用いるのが好ましいことが明らかになった。すなわち、SiONは、1.66未満、1.61未満、あるいは1.58未満の屈折率の層を構成するために好適である。
Si基板上にスパッタ法により種々の屈折率のNbSiO膜を成膜した。
SiターゲットとNbターゲットを用い、Ar流量:26sccm、O2流量:5sccmにそれぞれを固定してSiターゲット側を120W〜500W、Nbターゲット側を120W〜500Wまでそれぞれ個別に変化させて成膜を行った。各ターゲットの成膜レートを個別に制御し、NbターゲットおよびSiターゲットのそれぞれに加えるRFパワー(すなわちそれぞれのターゲット毎の成膜レート)を相対的に変化させることにより、屈折率nが1.6〜2.2の範囲のNbSiO膜を得た。得られた屈折率範囲において、O2流量に対する屈折率のばらつきは±0.02であった。また、得られたNbSiO膜は屈折率にかかわらず消衰係数kは測定限界以下であった。
本発明の実施例として薄膜多層膜を酸窒化ケイ素膜およびNbSiO膜により形成した反射防止膜を備えた光学部材を作製した。
まず、レンズ硝材(S-LAH60;オハラ社製)から研磨によって単品のレンズを形成し、そのレンズの一方の面には反射防止機能を有する誘電体多層膜を形成した。
各光学部材の反射率を検査した結果、異なる製造ロットで作製された光学部材間においても反射率のばらつきは小さかった。
次に、比較例として、薄膜多層膜を酸窒化ケイ素(SiON)のみで形成した反射防止膜を備えた光学部材を作製した。
レンズ硝材(S-LAH60)から研磨することによってレンズ単品を形成した。そのレンズの一方の面には反射防止機能を有する誘電多層膜を形成した。
各光学部材の反射率を検査した結果、同一条件で作製したにも関わらず複数の光学部材間で反射率が大きく異なっていた。
上記実施例および比較例の光学部材の各反射防止膜について、それぞれの屈折率ばらつき範囲での反射率の波長依存性をシミュレーションした。多層膜の計算は薄膜計算ソフト「Essential Macleod」(シグマ光機社製)で行った。
また、50nmのアルミニウム膜を成膜後に温水処理して得られたベーマイト層の屈折率については、Si基板上に同一条件で50nmのアルミニウム膜を成膜後、同一条件で温水処理を行った際に形成された水酸化アルミニウム層について、実際に分光エリプソ装置で屈折率を測定し、膜厚方向の屈折率を図7に示すように5nm100層にフィッティングさせた。図7において、屈折率n=1は空気側であり、膜厚の増加方向が基材に近づく方向である。このフィッティング結果をシミュレーションに用いた。
Claims (6)
- 透光性を有する基材の表面に設けられる反射防止膜であって、前記基材の側から順に積層された、複数の層から構成される薄膜多層膜と、使用光の波長より短い平均ピッチの凹凸構造を表面に有し、該凹凸構造における前記薄膜多層膜の膜厚方向での空間占有率の連続的な変化に応じて、前記使用光に対する屈折率が連続的に変化する微細凹凸層とを含み、
前記複数の層が、少なくとも2種の金属元素種の酸化膜もしくはケイ素と少なくとも1種の金属元素種の酸化膜により構成された相対的に高い屈折率を有する層と、酸窒化膜により構成された相対的に低い屈折率を有する層とを含む反射防止膜。 - 前記薄膜多層膜において、屈折率n以上の層が前記少なくとも2種の金属元素種の酸化膜もしくはケイ素と少なくとも1種の金属元素種の酸化膜により形成されており、前記屈折率n未満の層が酸窒化膜により形成されここで、1.58≦n≦1.66である請求項1記載の反射防止膜。
- 前記屈折率nが1.61である請求項2記載の反射防止膜。
- 前記相対的に低い屈折率を有する層が、酸窒化ケイ素からなる膜である請求項1から3いずれか1項記載の反射防止膜。
- 前記相対的に高い屈折率を有する層が、ニオブケイ素酸化膜である請求項1から4いずれか1項記載の反射防止膜。
- 透光性を有する基材の表面に請求項1から5のいずれか1項記載の反射防止膜を備えた光学部材。
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6480904A (en) * | 1987-09-22 | 1989-03-27 | Nippon Sheet Glass Co Ltd | Transparent plate stuck with conductive antireflection film |
JP2000160331A (ja) * | 1998-02-16 | 2000-06-13 | Asahi Glass Co Ltd | 酸化物膜、その形成方法、スパッタリングタ―ゲットおよび積層体 |
JP2014081522A (ja) * | 2012-10-17 | 2014-05-08 | Fujifilm Corp | 反射防止膜を備えた光学部材およびその製造方法 |
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JP4520418B2 (ja) * | 2005-02-18 | 2010-08-04 | キヤノン株式会社 | 光学用透明部材及びそれを用いた光学系 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6480904A (en) * | 1987-09-22 | 1989-03-27 | Nippon Sheet Glass Co Ltd | Transparent plate stuck with conductive antireflection film |
JP2000160331A (ja) * | 1998-02-16 | 2000-06-13 | Asahi Glass Co Ltd | 酸化物膜、その形成方法、スパッタリングタ―ゲットおよび積層体 |
JP2014081522A (ja) * | 2012-10-17 | 2014-05-08 | Fujifilm Corp | 反射防止膜を備えた光学部材およびその製造方法 |
Non-Patent Citations (1)
Title |
---|
M. SERENYI, M. RACZ, T. LOHNER: "Refractive index of sputtered silicon oxynitride layers for antireflection coating", VACUUM, vol. 61, JPN6015050900, 2001, pages 245 - 249, ISSN: 0003868021 * |
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