JPWO2014006813A1 - 半導体発光素子 - Google Patents
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Abstract
Description
はじめに、本発明の基礎となった知見について、図面を参照しながら説明する。
以下、実施の形態1にかかる半導体発光素子100について説明する。本実施の形態においては、半導体発光素子100の実施の形態として、六方晶III族窒化物系半導体を用いる緑色(波長520nm)半導体レーザを用いて説明する。以下、図を参照しながら説明する。
以下、実施の形態2にかかる半導体発光素子200について説明する。本実施の形態の半導体発光素子200について、六方晶III族窒化物系半導体を用いた発光波長が波長520nm付近の緑色面発光型半導体レーザ(VCSEL)を例に、図を参照しながら説明する。
以下、実施の形態3にかかる半導体発光素子300について説明する。本実施の形態においては、半導体発光素子300の例として、六方晶III族窒化物系半導体を用いる緑色(波長520nm)半導体レーザを用いて説明する。
2 半導体超格子層
3 n型光ガイド層
4 活性層
5 p型光ガイド層
6 電子障壁層
7 p型クラッド層
8 p型コンタクト層
9 絶縁膜
10 p電極
11 配線電極
12 パッド電極
13 フロントコート膜
14 リアコート膜
15 n電極
100 半導体発光素子
Claims (9)
- III族窒化物半導体で構成されるn型層と、活性層と、p型層とを備え、
前記n型層は、III族窒化物半導体AとIII族窒化物半導体Bとを繰り返し積層した半導体超格子を含み、
前記III族窒化物半導体AおよびIII族窒化物半導体Bの禁制帯幅をそれぞれEg(A)およびEg(B)とすると、Eg(A)>Eg(B)であって、
前記III族窒化物半導体Aは、膜中に酸素(O)を1×1018cm−3以上含むAlInNで構成され、
前記半導体超格子の積層方向に電流が注入される
半導体発光素子。 - 請求項1に記載の半導体発光素子であって、
前記III族窒化物半導体Bは、n型GaNまたはn型InGaNで構成される
半導体発光素子。 - 請求項1または2に記載の半導体発光素子であって、
前記III族窒化物半導体Bは、酸素(O)または珪素(Si)を含む
半導体発光素子。 - 請求項1から3の何れか1項に記載の半導体発光素子であって、
基板上に前記n型層、活性層およびp型層が、この順に積層されている
半導体発光素子。 - 請求項1から3の何れか1項に記載の半導体発光素子であって、
基板上に前記p型層、活性層およびn型層が、この順に積層されている
半導体発光素子。 - 請求項4または5に記載の半導体発光素子であって、
前記基板は、GaN基板またはGaNテンプレート基板である
半導体発光素子。 - 請求項1から6の何れか1項に記載の半導体発光素子であって、
前記半導体超格子において、前記III族窒化物半導体Aと前記III族窒化物半導体Bとの繰り返しの周期は、10nmよりも短い
半導体発光素子。 - 請求項7に記載の半導体発光素子であって、
前記半導体超格子において、前記III族窒化物半導体Aと前記III族窒化物半導体Bとの繰り返しの周期は、5nmよりも短い
半導体発光素子。 - 請求項1から8の何れか1項に記載の半導体発光素子であって、
前記n型層に第一屈折率窒化物半導体膜と前記半導体超格子とが交互に積層されたn型分布ブラッグ反射鏡を含み、
前記n型分布ブラッグ反射鏡は、
前記第一屈折率窒化物半導体膜の屈折率をn1、前記第一屈折率窒化物半導体膜の膜厚をd1、前記半導体超格子の屈折率をn2、前記半導体超格子の前記III族窒化物半導体Aと前記III族窒化物半導体Bとが繰り返し積層された合計膜厚をd2、前記活性層の発光波長をλとすると、
n1>n2
n1×d1=n2×d2=1/4×λ
の関係を満たす
半導体発光素子。
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JP2012152454 | 2012-07-06 | ||
JP2012152454 | 2012-07-06 | ||
PCT/JP2013/003336 WO2014006813A1 (ja) | 2012-07-06 | 2013-05-27 | 半導体発光素子 |
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JPWO2014006813A1 true JPWO2014006813A1 (ja) | 2016-06-02 |
JP6152848B2 JP6152848B2 (ja) | 2017-06-28 |
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JP (1) | JP6152848B2 (ja) |
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WO (1) | WO2014006813A1 (ja) |
Families Citing this family (11)
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WO2013134432A1 (en) * | 2012-03-06 | 2013-09-12 | Soraa, Inc. | Light emitting diodes with low refractive index material layers to reduce light guiding effects |
WO2015147334A1 (en) * | 2014-03-27 | 2015-10-01 | Canon Kabushiki Kaisha | Light emitting device, light source system including the light emitting device, and optical coherence tomography including the light source system |
US9331239B1 (en) * | 2015-07-07 | 2016-05-03 | Epistar Corporation | Light-emitting device |
JPWO2017017928A1 (ja) * | 2015-07-30 | 2018-05-17 | パナソニック株式会社 | 窒化物半導体レーザ素子 |
EP3352313B1 (en) * | 2015-09-15 | 2023-11-15 | Sony Group Corporation | Surface light-emitting laser |
US9847454B2 (en) * | 2015-10-02 | 2017-12-19 | Epistar Corporation | Light-emitting device |
JP6831375B2 (ja) * | 2016-05-13 | 2021-02-17 | ヌヴォトンテクノロジージャパン株式会社 | 窒化物系発光素子 |
JP6788301B2 (ja) * | 2017-02-28 | 2020-11-25 | 国立大学法人大阪大学 | AlInN膜および2次元フォトニック結晶共振器とこれらの製造方法ならびに半導体発光素子 |
JP7125867B2 (ja) * | 2018-06-20 | 2022-08-25 | 浜松ホトニクス株式会社 | 発光素子 |
JP2020077649A (ja) * | 2018-11-05 | 2020-05-21 | 学校法人 名城大学 | 窒化物半導体発光素子 |
WO2021102696A1 (zh) * | 2019-11-26 | 2021-06-03 | 天津三安光电有限公司 | 一种红外发光二极管 |
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JP2009164489A (ja) * | 2008-01-09 | 2009-07-23 | Hitachi Cable Ltd | 化合物半導体の製造方法、半導体レーザダイオード及びAlGaN系超格子構造 |
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JP3299739B2 (ja) | 2000-07-13 | 2002-07-08 | 士郎 酒井 | 発光素子 |
JP3785970B2 (ja) * | 2001-09-03 | 2006-06-14 | 日本電気株式会社 | Iii族窒化物半導体素子の製造方法 |
KR100647279B1 (ko) * | 2003-11-14 | 2006-11-17 | 삼성전자주식회사 | 질화물계 발광소자 및 그 제조방법 |
JP4110181B2 (ja) * | 2006-09-01 | 2008-07-02 | キヤノン株式会社 | 半導体レーザ装置 |
GB2454655A (en) * | 2007-11-09 | 2009-05-20 | Sharp Kk | Nitride structures with AlInN current confinement layers |
JP4952534B2 (ja) * | 2007-11-20 | 2012-06-13 | 三菱電機株式会社 | 窒化物半導体発光素子の製造方法 |
JP5649157B2 (ja) * | 2009-08-01 | 2015-01-07 | 住友電気工業株式会社 | 半導体素子およびその製造方法 |
JP2012104764A (ja) * | 2010-11-12 | 2012-05-31 | Panasonic Corp | 半導体発光素子 |
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- 2013-05-27 WO PCT/JP2013/003336 patent/WO2014006813A1/ja active Application Filing
- 2013-05-27 CN CN201380032979.4A patent/CN104380546B/zh active Active
- 2013-05-27 JP JP2014523564A patent/JP6152848B2/ja active Active
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- 2014-12-22 US US14/579,593 patent/US9214788B2/en active Active
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JP2009164489A (ja) * | 2008-01-09 | 2009-07-23 | Hitachi Cable Ltd | 化合物半導体の製造方法、半導体レーザダイオード及びAlGaN系超格子構造 |
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US9214788B2 (en) | 2015-12-15 |
US20150146756A1 (en) | 2015-05-28 |
CN104380546A (zh) | 2015-02-25 |
JP6152848B2 (ja) | 2017-06-28 |
CN104380546B (zh) | 2017-02-22 |
WO2014006813A1 (ja) | 2014-01-09 |
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