JPWO2011158760A1 - Exposure equipment - Google Patents

Abstract

The mask stage 10 includes a mask stage base 11, four mask holders 71 and 72 that can suck and hold each side of the mask M, and a pair of masks that suck and hold the mask stage base 11 side and the short side of the mask M. The linear guide 73 provided between the holder 72, the driving mechanism 74 for moving the mask holder 72 on the short side, and the mask stage base 11 side and the mask holder 72 side are provided. A tilt angle adjusting mechanism 80 capable of adjusting the tilt angle. Thereby, it is possible to cope with a plurality of masks having different sizes while maintaining the flatness constant.

Description

  The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus that can handle a plurality of masks having different sizes and suction margins.

  For TFT substrates, color filter substrates, plasma display panel substrates, etc. for liquid crystal display devices, the mask pattern is applied to the substrate by using an exposure device and irradiating the substrate coated with photoresist with exposure light through the mask. Produced by transcription. The mask holder of the exposure apparatus is provided with a suction groove, and the edge of the mask is vacuum-sucked in this suction groove to hold the mask.

  Conventionally, exposure of substrates of different sizes has been performed by exchanging the mask holder of the exposure apparatus in accordance with the size of the mask. However, it takes time to replace the mask holder, and there is a problem in work efficiency. On the other hand, an exposure apparatus is known in which a single mask holder is adapted to handle a plurality of sizes of masks (see, for example, Patent Documents 1 to 3).

  In the exposure apparatus described in Patent Document 1, the mask holder is formed by dividing the mask holder into a plurality of independent holder parts that hold the peripheral part of the mask, and the holder part is moved according to the size of the mask. It is possible to deal with different masks in a short time. The scanning projection exposure apparatus described in Patent Document 2 includes a mask stage for moving a mask, suction holding means for sucking and holding only two sides of the mask, and a plurality of mask positionings that can be selectively put in and out of the mask stage. And a plurality of masks having different sizes.

  Further, the mask holding mechanism of the exposure apparatus described in Patent Document 3 holds the long side of the mask with a total of six chuck portions at three positions provided on each long side of the mask at a predetermined pitch. In addition to suppressing a reduction in the natural frequency of the mask, it supports a plurality of masks having different sizes.

  On the other hand, the mask whose peripheral part is held by being vacuum-sucked by the mask holder does not maintain the flatness of the mask because the central part hangs down due to its own weight, resulting in a gap between the mask and the substrate. May change and may have a large effect on exposure accuracy. In order to deal with this problem, the mask holder attached to the lower surface of the mask stage via a spacer is applied with an external force by an external force applying mechanism to deform the mask holder into a convex shape, whereby the mask has a tilt angle, That is, an exposure apparatus is disclosed that corrects the flatness of the mask by giving an inclination angle with respect to the horizontal direction of the mask holder (see, for example, Patent Document 4).

Japanese Unexamined Patent Publication No. 2009-210920 Japanese Unexamined Patent Publication No. 2006-5139 Japanese Unexamined Patent Publication No. 2008-58789 Japanese Unexamined Patent Publication No. 2006-178318

  The exposure apparatus disclosed in Patent Document 1 can cope with a plurality of masks having different sizes without exchanging the mask holder, but does not include a mechanism for correcting the flatness. The pattern cannot be accurately exposed and transferred, and even when a mask having a different size is used, the gap between the mask and the substrate changes due to the replacement of the mask, which may adversely affect the exposure accuracy. In addition, the exposure apparatus disclosed in Patent Document 4 improves the flatness of the mask by giving a tilt angle to the mask, but there is no description of masks of different sizes, and there are multiple sizes of masks. There was a problem that the mask could not be dealt with, and there was room for improvement.

  In general, a glass substrate for a mask on which a mask pattern is formed has a plurality of sizes, and the size of the mask pattern is determined by the size of the product and patterning, and the sizes are different. There are multiple patterns. For this reason, a glass substrate for a mask having an optimum size is selected and used for patterning a desired mask pattern. Therefore, depending on the patterning, a portion other than the pattern, that is, an area that can be used as a mask suction margin may be different. On the other hand, since the mask is expensive, there is a strong demand to prevent damage caused by dropping or the like by securely holding the mask on the mask holder.

  In the exposure apparatus disclosed in Patent Document 1, a plurality of masks having different sizes can be obtained without moving the mask holder by moving independently divided holder portions according to the size of the mask. Although the size of the suction groove for sucking and holding the mask provided on the holder part is constant, even if a large area of suction can be set on the mask, it is provided on the holder part. The suction groove can only be sucked and held by the suction groove of a predetermined size, and there is room for improvement from the viewpoint of securely holding the mask and preventing breakage due to the falling of the mask. In addition, the scanning projection exposure apparatus disclosed in Patent Document 2 can suck and hold only two sides on the long side of the mask, and has the same problem as Patent Document 1.

  Furthermore, as shown in FIG. 35A, the exposure apparatus disclosed in Patent Document 1 includes a mask M with four independent holder portions Ha, Hb, Hc, and Hd (of which Hc and Hd are movable). By adsorbing and holding the four sides, it is possible to correspond to a plurality of masks M having different sizes without exchanging the mask holder. As shown in FIGS. 35 (b) and 35 (c), the mask M with its peripheral edge attracted and held has its own weight bent by its own weight. In the case of the mask M with four sides held, the amount of bending is X. The central portion of the mask M is the largest in both the direction and the Y direction, and the three-dimensional deflection has a complicated shape that gradually decreases toward the periphery. In addition, the bending shape of the mask M having a large size and a small size is different in the span S between the holder portions Hc and Hd that hold both edge portions on the short side, so that the X-direction bending shape depends on the size of the mask M. It will be different. This bending of the mask M is a factor in the variation in the gap between the mask M and the substrate, which may adversely affect the exposure accuracy. However, the exposure apparatus of Patent Document 1 has a problem that it is impossible to eliminate a change in flatness (deflection) caused by exchanging masks having different sizes.

  Further, in the mask holding mechanism of the exposure apparatus disclosed in Patent Document 3, the pitch of the chuck portion provided on the long side of the mask is 0.65 to 0.80 with respect to 1/2 of the long side length. As a double, it is intended to suppress the reduction of the natural frequency of the mask attached to the mask holder, the flatness due to self-weight deflection of masks of different sizes cannot be made constant regardless of size, There was room for improvement.

  The present invention has been made in view of the above-described problems, and a first object of the present invention is to provide an exposure apparatus capable of dealing with a plurality of masks having different sizes while maintaining a constant flatness. There is. A second object of the present invention is to provide an exposure apparatus capable of reliably holding and holding a mask to prevent damage due to dropping, etc., corresponding to a plurality of masks having different sizes and suckable areas. A third object is to provide an exposure apparatus that can cope with a plurality of masks having different sizes and can easily correct the deflection of the mask.

The above object of the present invention can be achieved by the following constitution.
(1) A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is arranged above the substrate stage and holds a substantially rectangular mask, and light for pattern exposure is transmitted through the mask. An exposure device comprising an irradiation means for irradiating a substrate,
The mask stage is
A mask stage base side member;
Four mask holders capable of adsorbing and holding each side of the mask;
Provided between the mask stage base side member and at least two mask holders that hold the short side of the mask by suction, and the short side mask holder is longer than the mask stage base side member. A plurality of guide mechanisms for movably guiding in the side direction;
A drive mechanism for moving the short side mask holder in the long side direction with respect to the mask stage base side member;
A tilt that is provided between at least one of the mask stage base side member and the guide mechanisms and at least one of the guide mechanisms and the short side mask holder. An angle adjustment mechanism;
An exposure apparatus comprising:
(2) The tilt angle adjusting mechanism is provided both between the mask stage base side member and each guide mechanism and between each guide mechanism and the short side mask holder. The exposure apparatus according to (1), which is characterized.
(3) Each guide mechanism has a guide rail attached to the mask stage base side, and a slider member attached to the mask holder side,
The tilt angle adjusting mechanism is provided between at least one of the mask stage base side member and the guide rails and between the slider member and the short side mask holder, respectively. The exposure apparatus according to (1) or (2).
(4) The exposure apparatus according to any one of (1) to (3), wherein the tilt angle adjusting mechanism is a pair of interchangeable spacers having different heights.
(5) The tilt angle adjusting mechanism is
A spacer having a predetermined height;
A fixed-side taper member having an inclined surface provided outside the spacer, and a movable-side taper member having an inclined surface slidably contacting the inclined surface, the sliding contact position of the inclined surface Wedge mechanism that can change the height by changing
The exposure apparatus according to any one of (1) to (3), characterized in that:
(6) The exposure apparatus according to (5), wherein the wedge mechanism adjusts the tilt angle by driving the movable taper member with an electric actuator.
(7) The exposure apparatus according to any one of (1) to (3), wherein the tilt angle adjustment mechanism is a piezo element whose height can be changed by energization control.
(8) Any of (1) to (7), wherein the drive mechanism is a cylinder device in which a cylinder body is fixed to the mask stage base side member and a tip of a piston is fixed to the mask holder. An exposure apparatus according to claim 1.
(9) The cylinder device includes a stopper having a shock absorber that is movably attached to the mask stage base side member, and the piston is brought into contact with the stopper to position the mask holder at a predetermined position. The exposure apparatus according to (8), characterized in that:
(10) The exposure apparatus according to any one of (1) to (7), wherein the drive mechanism is an electric motor.
(11) The exposure apparatus according to (10), wherein the electric motor stops the mask holder at at least three stop positions.
(12) The mask holder for sucking and holding the short side of the mask and the mask holder for sucking and holding the long side of the mask are formed thinner at least on the side edges close to each other than the remaining portions. The exposure apparatus according to any one of (1) to (11), wherein the exposure apparatus has a thinned portion.
(13) The mask holder for sucking and holding the short side of the mask and the mask holder for sucking and holding the long side of the mask have chamfered portions at corners close to each other ( The exposure apparatus according to any one of 1) to (11).
(14) Any one of the mask holder that sucks and holds the short side of the mask and the mask holder that sucks and holds the long side of the mask extends from the lower surface to at least the side edges close to each other. The other mask holder has a step extending from the upper surface,
The exposure apparatus according to any one of (1) to (11), wherein the mask holders on the short side and the long side suck and hold the mask in a state where the stepped portions are overlapped with each other. .
(15) A chamber that faces one side of the mask, and a negative pressure that corrects the tilt angle of the mask by applying a pressure difference between the pressure inside the chamber and the pressure acting on the other side of the mask. The exposure apparatus according to any one of (1) to (14), further comprising a pressure correction mechanism.

(16) A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and light for pattern exposure is transmitted through the mask. An exposure device comprising an irradiation means for irradiating a substrate,
The mask stage is
A pair of first mask holders capable of adsorbing and holding two opposing sides of the mask extending in a predetermined direction;
A pair of second mask holders capable of sucking and holding the other two opposite sides of the mask extending in a direction orthogonal to the predetermined direction and movable in the predetermined direction of the mask;
A pair of drive mechanisms for moving each of the second mask holders in the predetermined direction of the mask,
Each of the second mask holders includes a plurality of rows of suction grooves arranged in the predetermined direction, which suck and hold the other two sides of the mask by a negative pressure supplied.
(17) The exposure apparatus according to (16), wherein the suction groove of the second mask holder is switched between supply and stop of negative pressure by an electromagnetic valve.
(18) Each of the first mask holders includes a plurality of other suction grooves provided by being divided in the predetermined direction, which suction-holds the two sides of the mask by the negative pressure supplied.
The other suction groove of the first mask holder and the suction groove of the second mask holder are supplied and stopped by a solenoid valve provided for each of the other suction grooves and the suction groove. The exposure apparatus according to (16) or (17), wherein the exposure apparatus is switched and the magnitude of the negative pressure is controlled.
(19) A negative pressure correction that includes a chamber facing one surface of the mask and corrects the deflection of the mask by giving a pressure difference between the air pressure in the chamber and the air pressure acting on the other surface of the mask. The exposure apparatus according to any one of (16) to (18), further comprising a mechanism.

(20) A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and light for pattern exposure is transmitted through the mask. An exposure device comprising an irradiation means for irradiating a substrate,
The mask stage is
A pair of mask holders each having a plurality of suction grooves formed in the direction along the two sides that suck and hold the two opposite sides of the mask by the negative pressure supplied;
A negative pressure correction mechanism that includes a chamber facing one side of the mask, and that provides a pressure difference between the atmospheric pressure in the chamber and the atmospheric pressure acting on the other side of the mask to correct the deflection of the mask;
An exposure apparatus comprising:
(21) The plurality of suction grooves of the pair of mask holders can be switched between negative pressure supply and stop by an electromagnetic valve provided for each suction groove, and the magnitude of the negative pressure is controlled. The exposure apparatus according to (20), wherein
(22) A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and light for pattern exposure is transmitted through the mask. An exposure device comprising an irradiation means for irradiating a substrate,
The mask stage is
A mask stage base side member;
A pair of mask holders each having a plurality of suction grooves formed in the direction along the two sides that suck and hold the two opposite sides of the mask by the negative pressure supplied;
An exposure mechanism comprising: a tilt angle adjusting mechanism provided between the mask stage base side member and each mask holder, wherein the tilt angle of each mask can be adjusted by tilting each mask holder. apparatus.
(23) The plurality of suction grooves of the pair of mask holders can be switched between negative pressure supply and stop by an electromagnetic valve provided for each suction groove, and the magnitude of the negative pressure is controlled. (22) The exposure apparatus according to (22).

  According to the exposure apparatus of the present invention, the mask stage has a mask stage base, four mask holders that hold each side of the mask by suction, and the short side mask holder in the long side direction with respect to the mask stage base side member. A plurality of guide mechanisms for movably guiding and a driving mechanism for moving the mask holder on the short side in the long side direction of the mask, so that the mask holder on the short side is moved according to the size of the mask. By doing so, it is possible to suck and hold corresponding to a plurality of masks of different sizes without exchanging the mask holder. In addition, it has an angle adjustment mechanism between at least one of the mask stage base side member and each guide mechanism and between each guide mechanism and the short side mask holder, so it can be mounted regardless of the mask size. The flatness of the mask to be corrected can be corrected, and the gap between the mask and the substrate can be kept constant to increase the exposure accuracy.

  Further, according to the exposure apparatus of the present invention, the mask stage opposes the pair of first mask holders capable of sucking and holding two opposing sides of the mask extending in the predetermined direction, and the mask extending in the direction orthogonal to the predetermined direction. Since it includes a pair of second mask holders that can hold and hold the other two sides and move in a predetermined direction of the mask, and a pair of drive mechanisms that move each second mask holder in a predetermined direction of the mask, respectively. Without changing the mask holder, it is possible to suck and hold a plurality of masks having different sizes. In addition, since each second mask holder is provided with a plurality of rows of suction grooves arranged in a predetermined direction, the mask can be effectively used even for masks having different suction areas. It is possible to securely hold and hold.

  In addition, according to the exposure apparatus of the present invention, the mask stage includes a pair of mask holders that suck and hold the two opposing sides of the mask by the plurality of suction grooves formed in a divided manner, so that without replacing the mask holder, The two sides can be sucked and held corresponding to masks of different sizes. In addition, since the mask holder holds the mask only on the two sides, the bending shape of the mask does not change even when the mask holder is replaced with a mask of a different size. In addition, since it has a negative pressure correction mechanism that corrects the deflection of the mask by giving a pressure difference between the atmospheric pressure in the chamber facing one side of the mask and the atmospheric pressure acting on the other side of the mask, Correction by the negative pressure correction mechanism can maintain a constant gap between the mask and the substrate and maintain high exposure accuracy.

  In addition, even when a tilt angle adjusting mechanism is provided between the mask stage base side member and each mask holder, the deflection of the mask is corrected by the tilt angle adjusting mechanism so that the gap between the mask and the substrate is constant. Thus, the exposure accuracy can be increased.

It is a principal part perspective view of the exposure apparatus of 1st Embodiment which concerns on this invention. It is a front view of the exposure apparatus shown in FIG. It is a perspective view which expands and shows the mask stage vicinity. FIG. 4 is a cross-sectional view taken along line AA in FIG. 3. It is the bottom view which looked at the mask stage from the lower part. It is a figure which shows the state by which the flatness of the mask from which size differs is corrected by the tilt angle adjustment mechanism. It is a side view of the drive mechanism which moves the mask holder of a short side. It is a side view of the drive mechanism of a modification. It is a partially broken side view of the tilt angle adjusting mechanism of the modification. FIG. 10 is a partially cutaway side view of a fixed side taper member of the wedge mechanism shown in FIG. 9. (A) is a side view of the movable side taper member of the wedge mechanism shown in FIG. 9, and (b) is a cross-sectional view taken along line BB. It is a figure which shows the state by which the flatness of the mask from which size differs is corrected by the tilt angle adjustment mechanism of the exposure apparatus of 2nd Embodiment. It is a figure which shows the state by which the flatness of the mask from which size differs is corrected by the tilt angle adjustment mechanism of the modification of 2nd Embodiment. (A) is a perspective view showing a state in which a mask is adsorbed and held by a mask holder in which a thin portion is formed on a side edge as a means for adjusting a step between the fixed mask holder and the movable mask holder according to the third embodiment. FIG. 4B is a cross-sectional view taken along line XIV-XIV in FIG. 4A, and FIG. 4C is a cross-sectional view corresponding to FIG. 4B showing a first modification of a thin portion formed on the side edge portion. FIG. 4D is a cross-sectional view corresponding to FIG. 2B showing a second modification of the thin portion formed on the side edge, and FIG. 3E is a third view of the thin portion formed on the side edge. Sectional drawing corresponding to (b) which shows this modification, (f) is sectional drawing corresponding to (b) which shows the 4th modification of the thin part formed in a side edge part. It is sectional drawing for demonstrating the case where the level | step difference of a fixed mask holder and a movable mask holder arises. (A) And (b), as means for adjusting the step between the fixed mask holder and the movable mask holder according to the modification of the third embodiment, the mask is sucked and held by the mask holder provided with chamfered portions at the corners. It is a perspective view which shows the state performed. (A) As a means for adjusting the step between the fixed mask holder and the movable mask holder according to another modification of the third embodiment, a mask holder having stepped portions extending from the upper surface and the lower surface of the side edge portion. The perspective view which shows the state by which a mask is adsorbed-held, (b) is sectional drawing of the mask holder along the XVII-XVII line of (a) further provided with an adjustment bolt. It is a side view which shows the structure of the exposure apparatus of 4th Embodiment. It is sectional drawing corresponding to FIG. 4 of the exposure apparatus of 5th Embodiment. It is a top view which shows an example of the positional relationship of the suction groove layout of a 1st and 2nd mask holder, and the large mask hold | maintained at this. It is a pneumatic circuit figure connected to each adsorption slot of the 1st and 2nd mask holder. It is a side view of the drive mechanism which moves the 2nd mask holder of a short side. It is a side view of the drive mechanism of a modification. It is a top view which shows another example of the positional relationship of a 1st and 2nd mask holder and a large mask. It is a top view which shows an example of the positional relationship of a 1st and 2nd mask holder and a small mask. It is a top view which shows another example of the positional relationship of a 1st and 2nd mask holder and a small mask. It is a pneumatic circuit diagram of the modification connected to each suction groove of the 1st and 2nd mask holder. It is sectional drawing corresponding to FIG. 4 of the exposure apparatus of 6th Embodiment. It is a pneumatic circuit diagram connected to each suction groove of the mask holder. It is a top view which shows the positional relationship of the large and small mask and mask holder from which size differs. (A) is a plan view of a mask in which two sides on the long side are held by a mask holder, (b) is a cross-sectional view showing a bent state in the X direction of the mask, and (c) is a bent state in the Y direction of the mask. It is sectional drawing shown. It is sectional drawing equivalent to FIG. 28 of 7th Embodiment which concerns on this invention. It is a partially broken side view of the tilt angle adjusting mechanism of the modification. (A)-(c) is a figure which shows the shape of the corner part of a mask. (A) is a plan view of a mask whose four sides are held by a mask holder, (b) is a cross-sectional view showing a state of bending of the mask in the X direction, and (c) is a cross-sectional view showing a state of bending of the mask in the Y direction. is there.

Embodiments of an exposure apparatus according to the present invention will be described below in detail with reference to the drawings.
(First embodiment)
FIG. 1 is a perspective view of a main part of an exposure apparatus according to the first embodiment of the present invention, FIG. 2 is a front view, FIG. 3 is an enlarged view near the mask stage, and FIG. 4 is a plan view of the mask stage.

  As shown in FIG. 1, an exposure apparatus 1 according to this embodiment includes a mask stage 10 that holds a mask M, a substrate stage 20 that holds a glass substrate (material to be exposed) W, and irradiation means for pattern exposure. Supports the illumination optical system 30, the substrate stage moving mechanism 40 that moves the substrate stage 20 in the X-axis, Y-axis, and Z-axis directions and adjusts the tilt of the substrate stage 20, and the mask stage 10 and the substrate stage moving mechanism 40. Device base 50.

  Note that a glass substrate W (hereinafter simply referred to as “substrate W”) is disposed to face the mask M, and a surface (on the opposite surface side of the mask M) for exposing and transferring a mask pattern drawn on the mask M. ) Is coated with a photosensitive agent.

  First, the illumination optical system 30 will be described. The illumination optical system 30 is, for example, a high-pressure mercury lamp 31 that is a light source for ultraviolet irradiation, a concave mirror 32 that collects light emitted from the high-pressure mercury lamp 31, and a switchable arrangement near the focal point of the concave mirror 32. The two types of optical integrator 33, plane mirrors 35 and 36 and spherical mirror 37 for changing the direction of the optical path, and exposure control arranged between the plane mirror 35 and the optical integrator 33 to control opening and closing of the irradiation optical path. And a shutter 34 for use.

  In the illumination optical system 30, when the exposure control shutter 34 is controlled to open during exposure, the light irradiated from the high-pressure mercury lamp 31 passes through the optical path L shown in FIG. M, and further irradiated as parallel light for pattern exposure perpendicular to the surface of the substrate W held on the substrate stage 20. Thereby, the mask pattern of the mask M is exposed and transferred onto the substrate W.

  As shown in FIGS. 1 to 3, the mask stage 10 includes a mask stage base 11 in which a rectangular opening 11 a is formed in the center, and the opening 11 a of the mask stage base 11 in the X axis, Y axis, and θ directions. A mask holding frame (mask stage base side member) 12 that is movably mounted.

  The mask stage base 11 is supported by a column 51 standing on the apparatus base 50 and a Z-axis moving device 52 provided at the upper end of the column 51 so as to be movable in the Z-axis direction (see FIG. 2). 20 above. The Z-axis moving device 52 includes, for example, an electric actuator including a motor and a ball screw, a pneumatic cylinder, or the like, and moves the mask stage 10 up and down to a predetermined position by performing a simple vertical movement. The Z-axis moving device 52 is used for exchanging the mask M, cleaning the Z stage 21, and the like.

As shown in FIG. 4, a plurality of plane bearings 13 are arranged on the upper surface of the peripheral edge of the opening 11a of the mask stage base 11, and the mask holding frame 12 has a flange 12a provided at the outer peripheral edge of its upper end. It is mounted on the flat bearing 13. As a result, the mask holding frame 12 is inserted into the opening 11a of the mask stage base 11 through a predetermined gap, so that the mask holding frame 12 can move in the X axis, Y axis, and θ directions by the gap. The mask holding frame 12 is formed with a rectangular opening 12b for allowing pattern exposure light to pass through in the center.

  Referring also to FIG. 5, a pair of fixed mask holders 71 arranged on the long side of the opening 12b and a short side of the opening 12b are provided on the lower surface side of the mask holding frame 12 which is an example of the mask holding side member. A pair of movable mask holders 72 arranged, a plurality of linear guides (guide mechanisms) 73 provided between the mask holding frame 12 and each movable mask holder 72, and the movable mask holder 72 along the long side of the opening 12b. And a cylinder device 74 (see FIG. 7), which is a drive mechanism for moving them. A tilt angle adjusting mechanism 80 is disposed between the linear guide 73 and the movable mask holder 72.

  As shown in FIG. 5, a main suction groove 71a formed at the center in the longitudinal direction is formed on the lower surface (substrate W side) of a pair of fixed mask holders 71 fixed to the lower surface of the mask holding frame 12 via a spacer or the like. In addition, sub suction grooves 71b formed independently from the main suction grooves 71a are provided on the left and right sides of the main suction grooves 71a. Further, a suction groove 72 a is formed on the lower surface of the movable mask holder 72 movably disposed below the mask holding frame 12 over substantially the entire length. The main suction groove 71a, the sub suction groove 71b, and the suction groove 72a of the fixed mask holder 71 and the movable mask holder 72 are grooves for sucking the peripheral portion of the mask M on which the mask pattern is not drawn. Each of the four sides of the mask M is sucked by a vacuum suction device, and the mask M is detachably held.

  The main suction groove 71a, the sub suction groove 71b, and the suction groove 72a are each connected to a vacuum suction device via a switching valve (not shown), and an arbitrary suction groove is operated by switching the switching valve as appropriate. Can be in a state. Here, the size of the mask M may be slightly different (for example, about 10 to 20 mm) depending on the arrangement of the pattern drawn in the effective exposure area when multi-patterning, but the fixed mask holder 71 and the movable mask holder. 72 can be sucked and held corresponding to the masks M having different sizes. Specifically, the main suction groove 71a, the sub suction groove 71b, and the suction groove 72a cooperate to suck the large size mask M, and the main suction groove 71a and the suction groove 72a cooperate to reduce the small size mask M. Adsorb and hold.

  As shown in FIGS. 4 and 6, the linear guide 73 is attached to the mask stage base 11 side (mask holding frame 12) and the movable mask holder 72 side, and is guided by the guide rail 73a. The slider member 73b is movable in the Y direction (long side direction of the opening 12b) (in the embodiment shown in the figure, two slider members 73bi and 73bo are respectively provided for one guide rail 73a). Yes.

  A pair of cylinder devices 74 as a driving mechanism of the movable mask holder 72 is disposed in the center in the longitudinal direction corresponding to each movable mask holder 72, in other words, in the center of the short side of the mask holding frame 12, It extends in the longitudinal direction. As shown in FIG. 7, each cylinder device 74 has a cylinder body 74 a fixed to the lower surface of the mask holding frame 12, and a piston 74 b on a support shaft 75 of a projection 72 b provided to protrude upward from the movable mask holder 72. It is pivotably fitted. As a result, the angle change between the cylinder device 74 and the movable mask holder 72 when adjusting the tilt angle of the movable mask holder 72 described later can be absorbed and operated smoothly.

  Further, a stopper 77 having a shock absorber 76 is fixed to the lower surface of the mask holding frame 12 in front of the piston 74b in the operation direction. When the cylinder device 74 is operated and the piston 74b is extended, the shock absorber 76 is interposed. Then, the protrusion 72b (movable mask holder 72) is brought into contact with the stopper 77 to position the movable mask holder 72 at a predetermined position without giving an impact.

  The position of the stopper 77 regulates the position of the movable mask holder 72 when the mask M having a large size is attached, and the position of the movable mask holder 72 when the piston 74b of the cylinder device 74 is drawn into the cylinder body 74a. The position is the position of the movable mask holder 72 when the mask M having a small size is attached.

  As described above, the fixed mask holder 71, the movable mask holder 72, the linear guide 73, and the cylinder device 74 are attached to the mask holding frame 12, so that the X axis with respect to the mask stage base 11 together with the mask holding frame 12. , Y axis and θ direction.

  Then, as shown in FIG. 6, when the cylinder device 74 is operated to attach a mask M having a large size, the pair of movable mask holders 72 are simultaneously moved away from each other (outward) to widen the interval ( 6 (a)), when attaching a mask M having a small size, the pair of movable mask holders 72 can be moved simultaneously in the direction (inward) to approach each other to narrow the interval (FIG. 6 (b)). It is possible to correspond to a plurality of masks M having different sizes.

  According to the cylinder device 74 of the present embodiment capable of positioning at two positions, it is possible to deal with masks M of two sizes, large and small. At this time, by moving the pair of cylinder devices 74 at the same time so that the pair of movable mask holders 72 is always positioned in the left-right symmetrical position, the center position of both the movable mask holders 72, that is, the center of the mask M is moved. And the mask M can be exchanged.

  FIG. 8 is a side view of a drive device according to a modified example. A stopper 77 including a shock absorber 76 can be moved in the moving direction of the piston 74b by an electric actuator 78, for example. As a result, the stop position of the movable mask holder 72 by the cylinder device 74 can be positioned at a plurality of three or more positions, and further at an arbitrary position. It can cope with minute changes.

  Further, the drive device can be constituted by an electric motor (not shown) instead of the cylinder device 74. According to the electric motor, it is easy to set a plurality of stop positions at arbitrary positions. The movable mask holder 72 can be stopped at the stop position.

  The tilt angle adjusting mechanism 80 is a mechanism capable of adjusting the angle of the pair of movable mask holders 72, that is, the tilt angle. In this embodiment, a pair of interchangeable spacers 80a and 80b having different heights are provided. Each slider member 73b is arranged between the short side mask holder 72. Thereby, it is possible to correct the mask M whose both ends are attracted and held by the pair of movable mask holders 72 so as to be symmetrical with respect to the center C in the longitudinal direction so that the bending of the mask M is reduced. The flatness of the mask M is improved. Therefore, the gap between the mask M and the substrate W in the effective exposure area of the mask M can be made as uniform as possible.

  Further, since the deflection of the mask M is large in the mask M having a large size, the tilt angle is set to be large with respect to the mask M having a large deflection. For this reason, when the size of the mask M to be replaced is changed, the tilt angle may be adjusted by exchanging the pair of spacers 80a and 80b.

Further, on the upper surface of the mask stage base 11, as shown in FIGS. 3 and 4, the mask holding frame 12 is moved in the X axis, Y axis, and θ directions, and the mask M held on the mask holding frame 12 is moved. A mask position adjusting mechanism 16 for adjusting the position is provided.

  The mask position adjusting mechanism 16 includes one Y-axis direction driving device 16y attached to one side along the X-axis direction of the mask holding frame 12 and two Xs attached to one side along the Y-axis direction of the mask holding frame 12. An axial drive device 16x.

  The Y-axis direction drive device 16 y is installed on the mask stage base 11 and has a drive actuator (for example, an electric actuator) 55 having a rod 56 that expands and contracts in the Y-axis direction, and a pin support mechanism 57 at the tip of the rod 56. And a guide rail 59 attached to a side portion along the X-axis direction of the mask holding frame 12 and movably attached to the slider 58.

  On the other hand, the X-axis direction drive device 16x has the same configuration as the Y-axis direction drive device 16y, and is installed on the mask stage base 11 and includes a drive actuator 55 having a rod 56 that expands and contracts in the X-axis direction, A slider 58 connected to the tip of 56 via a pin support mechanism 57, and a guide rail 59 attached to a side portion along the Y-axis direction of the mask holding frame 12 and movably attached to the slider 58.

  The mask position adjusting mechanism 16 moves the mask holding frame 12 in the Y-axis direction by driving one Y-axis direction driving device 16y, and drives the two X-axis direction driving devices 16x equally. Thus, the mask holding frame 12 is moved in the X-axis direction. Further, the mask holding frame 12 is moved in the θ direction (rotated about the Z axis) by driving one of the two X-axis direction driving devices 16x.

  Further, on the upper surface of the mask stage base 11, as shown in FIG. 3, a gap sensor 17 for measuring the gap between the opposing surfaces of the mask M and the substrate W, and an alignment camera for confirming the attachment position of the mask M 18 are provided. The gap sensor 17 and the alignment camera 18 are held so as to be movable in the X-axis and Y-axis directions via the moving mechanism 19 and are arranged in the mask holding frame 12.

  The moving mechanisms 19 are respectively arranged on two sides of the mask holding frame 12 facing each other in the Y-axis direction. The moving mechanism 19 holds the gap sensor 17 and the alignment camera 18 in the X-axis and Y-axis directions. Linear guides 26 and 27 that are movably supported, and drive actuators 28 and 29 that move the holding frame 25 in the X-axis and Y-axis directions are provided.

  In the moving mechanism 19, the holding base 25 is moved in the X-axis direction by the linear guide 26 and the driving actuator 28, and the holding base 25 is moved in the Y-axis direction by the linear guide 27 and the driving actuator 29. The moving mechanism 19 uses a linear guide and a driving actuator to move the holding frame in the X-axis and Y-axis directions, but a linear motor or the like may be used.

  The alignment camera 18 optically detects a mask-side alignment mark (not shown) on the front surface of the mask M from the back side of the mask. The focus camera adjusts the focus by moving toward and away from the mask M by a focus adjustment mechanism. It has been made.

  On the upper surface of the mask stage base 11, as shown in FIG. 3, masking apertures 38 that shield both ends of the mask M as necessary are provided at both ends in the X-axis direction of the openings 11 a of the mask stage base 11. Provided. The masking aperture 38 is movable in the X-axis direction by a masking aperture drive mechanism 39 including a motor, a ball screw, a linear guide, and the like, and adjusts the shielding area at both ends of the mask M. Note that the masking aperture 38 may be provided not only at both ends of the opening 11a in the X-axis direction but also at both ends of the opening 11a in the Y-axis direction.

  As shown in FIGS. 1 and 2, the substrate stage 20 includes a Z stage 21 having a work chuck 22 disposed on the upper surface thereof, and is installed on a substrate stage moving mechanism 40. The work chuck 22 holds the substrate W by vacuum suction.

  The substrate stage moving mechanism 40 performs a tilt adjustment of the substrate stage 20, a Y-axis feed mechanism 41 that moves the substrate stage 20 in the Y-axis direction, an X-axis feed mechanism 42 that moves the substrate stage 20 in the X-axis direction, and the substrate stage 20. A Z-tilt adjustment mechanism 43 that finely moves the substrate stage 20 in the Z-axis direction.

  The Y-axis feed mechanism 41 includes a pair of linear guides 44 installed on the upper surface of the apparatus base 50 along the Y-axis direction, a Y-axis table 45 supported by the linear guide 44 so as to be movable in the Y-axis direction, And a Y-axis feed driving device 46 for moving the axis table 45 in the Y-axis direction. The linear guide 44 is a guide rail 44a installed on the apparatus base 50 along the Y-axis direction, a pair of sliders 44b fixed to the lower surface of the Y-axis table 45 and movably attached to the guide rail 44a, and a guide. A rolling element (not shown) interposed between the rail 44a and the slider 44b. The Y-axis feed driving device 46 is installed on the device base 50, a ball screw nut 46a fixed to the lower surface of the Y-axis table 45, a ball screw shaft 46b screwed to the ball screw nut 46a, and the ball screw shaft. And a motor 46c that rotationally drives 46b.

  In the Y-axis feed mechanism 41, the motor 46c of the Y-axis feed drive device 46 is driven to rotate the ball screw shaft 46b, whereby the Y-axis table 45 and the ball screw nut 46a are moved to the guide rail 44a of the linear guide 44. The substrate stage 20 is moved in the Y-axis direction.

  The X-axis feed mechanism 42 includes a pair of linear guides 47 installed on the upper surface of the Y-axis table 45 along the X-axis direction, an X-axis table 48 supported by the linear guide 47 so as to be movable in the X-axis direction, An X-axis feed drive device 49 that moves the X-axis table 48 in the X-axis direction. The linear guide 47 is a guide rail 47a installed along the X-axis direction on the Y-axis table 45, a pair of sliders 47b fixed to the lower surface of the X-axis table 48 and movably attached to the guide rail 47a, A rolling element (not shown) interposed between the guide rail 47a and the slider 47b. The X-axis feed driving device 49 is installed on a ball screw nut (not shown) fixed to the lower surface of the X-axis table 48, a ball screw shaft 49b screwed to the ball screw nut, and the Y-axis table 45. And a motor 49c that rotationally drives the ball screw shaft 49b.

  In the X-axis feed mechanism 42, the motor 49c of the X-axis feed drive device 49 is driven to rotate the ball screw shaft 49b, whereby the X-axis table 48 and the guide rail of the linear guide 47 are moved together with a ball screw nut (not shown). The substrate stage 20 is moved in the X-axis direction by moving along 47a.

  The Z-tilt adjustment mechanism 43 includes a motor 43a installed on the X-axis table 48, a ball screw shaft 43b rotated by the motor 43a, and a wedge formed in a wedge shape and screwed into the ball screw shaft 43b. And a wedge portion 43d that protrudes in a wedge shape on the lower surface of the substrate stage 20 and engages with the inclined surface of the wedge nut 43c. In the present embodiment, two Z-tilt adjustment mechanisms 43 are provided on one end side (front side in FIG. 1) in the X-axis direction of the X-axis table 48, and one set on the other end side (the rear side in FIG. A total of 3 units are installed (see FIG. 2), and each is driven and controlled independently. The number of Z-tilt adjustment mechanisms 43 installed is arbitrary.

In the Z-tilt adjustment mechanism 43, when the ball screw shaft 43b is rotationally driven by the motor 43a, the wedge-shaped nut 43c is horizontally moved in the X-axis direction, and this horizontal movement is caused by the wedge-shaped nut 43c and the wedge portion 43d. The wedge portion 43d is finely moved in the Z direction by being converted into a highly precise vertical fine motion by the action of the slope. Accordingly, by driving the three Z-tilt adjustment mechanisms 43 by the same amount, the substrate stage 20 can be finely moved in the Z-axis direction, and the three Z-tilt adjustment mechanisms 43 are independently driven. By doing so, the tilt adjustment of the substrate stage 20 can be performed. As a result, the position of the substrate stage 20 in the Z-axis and tilt directions can be finely adjusted so that the mask M and the substrate W face each other in parallel with a predetermined interval.
Note that the combination of the ball screw shaft mechanism and the motor constituting the Y-axis feed mechanism 41, the X-axis feed mechanism 42, and the Z-tilt adjustment mechanism 43 may be replaced by a linear motor.

  In addition, as shown in FIGS. 1 and 2, the exposure apparatus 1 of the present embodiment is provided with a laser length measuring device 60 that is a position measuring device that detects the position of the substrate stage 20. The laser length measuring device 60 measures a moving distance of the substrate stage 20 generated when the substrate stage moving mechanism 40 is driven.

  The laser length measuring device 60 is arranged on the X-axis mirror 64 and the Y-axis mirror 65 arranged on the substrate stage 20 and the device base 50 and irradiates the X-axis mirror 64 with laser light (measurement light). An X-axis length measuring device (length measuring device) 61 and a yawing measuring device (length measuring device) 62 that measure the position of the substrate stage 20 by receiving the laser beam reflected by the X-axis mirror 64, and a laser. A Y-axis length measuring device (length measuring device) 63 that measures the position of the substrate stage 20 by irradiating the Y-axis mirror 65 with light and receiving the laser light reflected by the Y-axis mirror 65; Is provided. Then, a position detection signal in the X and Y directions of the substrate stage 20 is input to the control device.

  In the exposure apparatus 1 configured as described above, the tilt angle adjusting mechanism 80 imparts a tilt angle to the mask M symmetrically with respect to the center C in the longitudinal direction, and corrects so that the deflection of the mask M is reduced. And the flatness of the mask M is improved. Therefore, the gap between the mask M and the substrate W in the effective exposure area of the mask M can be made as uniform as possible. Further, when the small-size mask M shown in FIG. 6B is used with respect to the large-size mask M shown in FIG. 6A, the cylinder device 74 is operated and the pair of movable mask holders 72 are operated. Can be sucked and held in correspondence with a plurality of masks M of different sizes. Further, the tilt angle is adjusted by the tilt angle adjusting mechanism 80 corresponding to the masks M having different sizes, and the change in the deflection amount of the mask M to be mounted can be corrected. As a result, regardless of the size of the mask M, the gap between the mask M and the substrate W can be kept constant and high exposure accuracy can be maintained.

  Next, modified examples of the tilt angle adjusting mechanism will be described in detail with reference to FIGS. 9 to 11. 9 is a partially broken side view of a wedge mechanism as an example of a tilt angle adjusting mechanism, FIG. 10 is a partially broken side view of a fixed side taper member of the wedge mechanism, FIG. 11 is a side view of a movable side taper member of the wedge mechanism, and It is sectional drawing.

  The tilt angle adjusting mechanism 80 includes a spacer 81 for horizontal level adjustment and a wedge mechanism 83. The spacer 81 is disposed between the lower surface of the slider member 73bi located on the inner side (center side of the mask holding frame 12) and the movable mask holder 72, and the movable mask holder 72 is attached by the mask holder fixing bolts 82. It is attached to the lower surface of the slider member 73bi. Between the slider member 73bo located outside the spacer 81 and the movable mask holder 72, a wedge mechanism 83 is provided on the upper surface of the movable mask holder 72 to apply a downward external force.

  The wedge mechanism 83 slides on the fixed side taper member 84 having an inclined surface 84a inclined inward from the outside (left side in FIG. 9) of the movable mask holder 72 and the inclined surface 84a of the fixed side taper member 84. A movable-side taper member 85 having an inclined surface 85a that is movably contacted, and a feed screw 86 as a movable-side taper member feeding means for moving the movable-side taper member 85 in a direction to make contact with and away from the spacer 81. . The feed screw 86 is held by a bracket 87 that protrudes outward from the fixed taper member 84. The movable side taper member 85 is formed with an inclined surface 85a having the same inclination angle as the inclined surface 84a of the fixed side taper member 84 and slidingly contacting the inclined surface 84a, and an elongated hole 85b.

  The fixed side taper member fixing bolt 88 inserted through the bolt hole 72c of the movable mask holder 72 passes through the through hole 84b of the fixed side taper member 84 and the long hole 85b of the movable side taper member 85, and the lower surface of the slider member 73bo. It is fixed to.

  In such a configuration, by operating the feed screw 86 of the wedge mechanism 83 to move the movable taper member 85 in the left-right direction in FIG. 9 and changing the sliding contact position of the inclined surfaces 84a and 85a, the height of the wedge mechanism 83 is increased. Change the size. Thereby, the downward external force applied to the outer side (left side in FIG. 9) of the spacer 81 of the movable mask holder 72 is adjusted, and the inclination of the movable mask holder 72 is changed around the position of the spacer 81.

  Thereby, it is possible to give a tilt angle to the mask M whose both ends are sucked and held by the pair of movable mask holders 72 and correct the mask M to be bent, and improve the flatness of the mask M. Can do. Note that the tilt angle may be adjusted by driving the movable side taper member 85 by an electric actuator (not shown) instead of the feed screw 86.

  The tilt angle adjusting mechanism 80 is not particularly limited as long as the angle of the pair of movable mask holders 72 can be adjusted. Besides the spacers 80a and 80b and the wedge mechanism 83 described above, the tilt angle adjusting mechanism 80 can be controlled by energization control. It can also be constituted by a piezo element (not shown) whose height can be changed.

(Second Embodiment)
FIG. 12 is a view showing an exposure apparatus of the second embodiment in which the tilt angle adjusting mechanism is different from that of the first embodiment. In the exposure apparatus 1 of the present embodiment, the tilt angle adjusting mechanism 80 is disposed between the mask holding frame 12 and the guide rail 73a.

  Also with such an exposure apparatus 1, as in the first embodiment, it is possible to suction and hold corresponding to a plurality of masks of different sizes without exchanging the mask holder. Regardless of the size of the mask M, the tilt angle is adjusted by the tilt angle adjusting mechanism 80 to correct the flatness of the mask M to be mounted, and the gap between the mask M and the substrate W is kept constant, and the exposure accuracy is maintained. Can be increased. In the case of the present embodiment, the height of the suction position of the movable mask holder 72 on the short side changes as the size of the mask M changes, so that a gap adjustment is necessary on the mask stage side or the substrate stage side. Become.

(Modification)
FIG. 13 is a view showing an exposure apparatus 1 according to a modification of the second embodiment, in which a first tilt angle adjusting mechanism 80A is disposed between the mask holding frame 12 and the guide rail 73a, and the slider member 73b. Between the movable mask holder 72, a second tilt angle adjusting mechanism 80B is arranged. According to such an exposure apparatus 1, even if the level of the mask holding frame 12 is slightly tilted, the tilt of the guide rail 73a can be corrected and leveled by the first tilt angle adjusting mechanism 80A. Then, the tilt angle of the movable mask holder 72 is adjusted by the second tilt angle adjusting mechanism 80B, the change in the amount of deflection of the mask M accompanying the mounting of the mask M is corrected, and the space between the mask M and the workpiece W is corrected. Transfer exposure can be performed with high exposure accuracy while maintaining a constant gap.

(Third embodiment)
FIG. 14 shows a means for adjusting a step generated between the fixed mask holder and the movable mask holder when the movable mask holder is tilted by the tilt angle adjusting mechanism as the exposure apparatus of the third embodiment.

  For example, as shown in FIG. 15, when the tilt angle of the movable mask holder 72 is adjusted, a height difference (step) may be generated between the fixed mask holder 71 and the movable mask holder 72. If it is large, the rigidity of the holders 71 and 72 is high, so that a gap C is formed between the movable mask holder 72 and the mask M, which may adversely affect the exposure accuracy.

  For this reason, as shown in FIG. 14, the fixed mask holder 71 and the movable mask holder 72 have thin portions 71e and 72e in which the upper surface sides of the adjacent side edge portions 71d and 72d are cut out to be thinner than the remaining portions. Is formed. When the mask M is attracted and held, the thin-walled portion 72e whose rigidity has been weakened is elastically deformed in the plate thickness direction of the mask holder 72 from the position indicated by the broken line in FIG. , 72 and the mask M without attracting a gap C, the mask M is sucked and held.

  The thickness t of the thin portions 71e and 72e is preferably 1 / 2h ≦ t ≦ 2 / 3h, where h is the plate thickness of the mask holders 71 and 72. This is because if the thickness t of the thin portions 71e and 72e is 1/2 h or less, the rigidity is too low and the mask holders 71 and 72 may be damaged. If the thickness t is 2/3 h or more, the rigidity is high. This is because a gap C may be generated between the mask holders 71 and 72 and the mask M.

  The tips of the thin portions 71e and 72e may be formed in a triangular cross section or a curved surface as shown in FIGS. 14C and 14D, and the mask holders 71 and 72 and the mask M It is possible to prevent the gap C from occurring between them. Further, as shown in FIGS. 14 (e) and 4 (f), the thin portions 71e and 72e are formed by forming the side edge portions 71d and 72d into a triangular shape or a curved shape without providing a step. Alternatively, by reducing the rigidity of the side edge portions 71d and 72d, it is possible to prevent the gap C from being generated between the mask holders 71 and 72 and the mask M.

  Further, as another means for adjusting the level difference between the fixed mask holder 71 and the movable mask holder 72, the mask holders 71 and 72 shown in FIG. 16A are provided with chamfered portions 71f and 72f at adjacent corners. Yes. As a result, the span between the corners of the mask holders 71 and 72 becomes longer and the deformation of the mask M is facilitated, so that the gap is not generated between the mask M and the mask holders 71 and 72, and suction holding is performed. can do. In addition, it is desirable to chamfer a curved surface at the ridge line portion where the side surfaces of the mask holders 71 and 72 and the chamfered portions 71f and 72f join to prevent the occurrence of concentrated stress. Further, as shown in FIG. 16B, it is more preferable that the chamfered portions 71f and 72f have a curved shape because the generation of concentrated stress can be further reduced.

  FIG. 17A shows still another means for adjusting the level difference between the fixed mask holder 71 and the movable mask holder 72. The fixed mask holder 71 extends from the lower surface of the adjacent side edge 71d. The movable mask holder 72 has a stepped portion 72g extending from the upper surface of the side edge portion 72d. The mask holders 71 and 72 can increase the force of pressing the mask M by overlapping the stepped portions 71g and 72g, and the mask M is surely sucked and held without a gap.

  Further, as shown in FIG. 17B, an adjustment bolt 79 is provided on a stepped portion 72g where the fixed mask holder 71 and the movable mask holder 72 are overlapped, and the lower surfaces (mask holding surfaces) of the fixed mask holder 71 and the movable mask holder 72 are provided. The heights of the fixed mask holder 71 and the movable mask holder 72 may be adjusted so that there is no difference in level. In this case, a sliding material 79 a such as Teflon (registered trademark) is provided at the tip of the screw of the adjustment bolt 79, and the upper surface 71 g 1 of the stepped portion 71 g of the fixed mask holder 71 is prevented from being worn by the adjustment bolt 79.

  The positions where the thin portions 71f and 72f and the step portions 71g and 72g are provided are not limited to the side edge portions 71d and 72d, but may be formed around the mask holders 71 and 72.

(Fourth embodiment)
FIG. 18 is a side view showing the arrangement of the exposure apparatus of the fourth embodiment. As shown in FIG. 18, the exposure apparatus 1 of the present embodiment employs a negative pressure correction mechanism 90 as a tilt angle adjustment mechanism for the mask M. The periphery of the mask stage 10 and the substrate stage 20 is shielded by the thermal chamber 91. An opening 91 a for transporting the substrate W is provided on the side wall of the thermal chamber 91. In addition, the upper part of the mask stage 10 is shielded by the optical system chamber 92, and a light source chamber 93 is disposed adjacent to the optical system chamber 92. A transparent plate 94 is disposed between the optical system chamber 92 and the light source chamber 93, and exposure light irradiated from the high-pressure mercury lamp 31 in the light source chamber 93 and passing through the transparent plate 94 passes through the optical path L and is masked. Guided to M.

  The thermal chamber 91 is connected to a positive pressure pump 96 via an air supply path 95, and the optical system chamber 92 is connected to a negative pressure pump 98 via an exhaust path 97. The CPU 101 measures the pressures of the thermal chamber 91 and the optical system chamber 92 with the sensor 102, and appropriately controls the positive pressure pump 96 and the negative pressure pump 98.

  According to the exposure apparatus 1 of the present embodiment, the signal from the gap sensor 17 (see FIG. 3) and the signal from the sensor 102 are associated with each other, and a pressure difference that can correct the deflection of the mask M is obtained in advance and stored in the CPU 101. Based on this, the negative pressure pump 98 and the positive pressure pump 96 are operated to pressurize the inside of the thermal chamber 91 and depressurize the inside of the optical system chamber 92. By applying a pressure difference to, the deflection of the mask M can be corrected.

  According to the exposure apparatus 1 of the present embodiment, since the deflection of the mask M is corrected by the pressure difference, it is suitable for correcting the large deflection of the mask M as a whole. Further, it is desirable that a temperature adjusting device (not shown) is provided in the thermal chamber 91 and the optical system chamber 92 so that the temperature control is performed so that the indoor temperature difference between the thermal chamber 91 and the optical system chamber 92 is minimized. . This is because, on the upper surface side of the mask M, gas flows in a relatively large space (optical system chamber 92), so that the upper surface of the mask M is easily cooled, but in the thermal chamber 91 on the lower surface side of the mask M, This is for preventing the influence of the thermal deformation (expansion / contraction) of the mask M due to the temperature difference between the upper and lower surfaces of the mask M on the flatness of the mask M because the gas flow is small and is not easily cooled. Further, since the high-pressure mercury lamp 31 serving as a heat source is partitioned by the transparent plate 94, the heat generated from the high-pressure mercury lamp 31 is difficult to conduct to the mask M and the substrate W, and exposure transfer can be performed with high accuracy. It can be carried out.

In the above embodiment, for example, the tilt angle adjusting mechanism can be provided side by side.
In the above embodiment, the mask holding frame 12 is a mask stage base side member. However, depending on the configuration of the mask stage, the mask stage base 11 may be a mask stage base side member, and a fixed mask holder 71, a movable mask holder. 72, the linear guide 73, the cylinder device 74, and the tilt angle adjusting mechanism 80 are disposed on the lower surface side of the mask stage base 11.

(Fifth embodiment)
Hereinafter, a fifth embodiment of an exposure apparatus according to the present invention will be described in detail with reference to the drawings. The present embodiment is different from the first embodiment in the configuration of the mask stage, and the same or equivalent parts as in the first embodiment are denoted by the same reference numerals, and description thereof is omitted or simplified.

  In the mask stage 10 of the present embodiment, as shown in FIGS. 19, 20, and 22, on the lower surface side of the mask holding frame 12, a pair of first mask holders that are arranged on the long side of the opening 12 b. A fixed mask holder 171, a pair of movable mask holders 172 which are second mask holders arranged on the short side of the opening 12b, and a plurality of linear guides provided between the mask holding frame 12 and each movable mask holder 172 (Guide mechanism) 73 and a cylinder device 74 that is a drive mechanism for moving the movable mask holder 172 along the long side of the opening 12b.

  As shown in FIG. 20, on the lower surface (substrate W side) of a pair of fixed mask holders 171 fixed to the lower surface of the mask holding frame 12 via a spacer or the like, a main suction groove 171a formed at the center in the longitudinal direction. The left and right sides of the main suction groove 171a are provided with sub suction grooves 171b that are formed independently of the main suction groove 171a and divided in a predetermined direction (X direction). Further, the main suction grooves 172a and the sub suction grooves 172b arranged in two rows in the long side direction have substantially the entire length in the short side direction on the lower surface of the movable mask holder 172 that is movably disposed below the mask holding frame 12. It is formed over.

  The suction grooves 171 a, 171 b, 172 a, and 172 b of the fixed mask holder 171 and the movable mask holder 172 are grooves for sucking the peripheral portion of the mask M on which the mask pattern is not drawn, and is attached to the vacuum suction device 110. Connected (see FIG. 21), the four sides of the mask M are sucked and held detachably. That is, the fixed mask holder 171 sucks and holds two opposite sides (long sides) of the mask M extending along a predetermined direction (X direction), and the movable mask holder 172 is a direction orthogonal to the predetermined direction (Y direction). The two opposite sides (short sides) of the mask M extending along the line are sucked and held.

  As shown in FIG. 21, the main suction grooves 171 a and 172 a of the fixed mask holder 171 and the movable mask holder 172 are connected to the vacuum suction device 110 via a pipe 111. Each sub suction groove 171b of the fixed mask holder 171 is connected to the vacuum suction device 110 via the piping 112 and an electromagnetic valve 113 that can be switched on / off, and each sub suction groove 172b of the movable mask holder 172 includes It is connected to the vacuum suction device 110 via a pipe 114 and an electromagnetic valve 115 that can be switched on / off. As the solenoid valves 113 and 115, direct acting or pilot type valves are used.

  Thereby, at the time of suction holding of the mask M, the vacuum suction device 110 is always connected to the main suction grooves 171a and 172a of the fixed mask holder 171 and the movable mask holder 172 via the pipe 111 to supply the vacuum, By switching the electromagnetic valves 113 and 115, it is possible to selectively supply vacuum to the sub suction grooves 171b and 172b of the fixed mask holder 171 and the movable mask holder 172 so that any suction groove can be activated. Here, the size of the mask M and the size of the pattern may be slightly different (for example, about 10 to 20 mm) depending on the arrangement of the pattern drawn in the effective exposure area when multi-patterning is performed, but the fixed mask holder 171. The movable mask holder 172 can be sucked and held corresponding to the masks M having different sizes.

  In the embodiment shown in FIG. 20, the solenoid valve 113 is switched on and the solenoid valve 115 is switched off. The main suction groove 171a and the sub suction groove 171b of the fixed mask holder 171 and the main of the movable mask holder 172 are shown. The suction groove 172a is in an activated state. Thereby, the large-sized mask M is sucked and held by the main suction grooves 171a and 172a and the sub suction grooves 171b.

  19, the linear guide 73 is attached to the guide rail 73a attached to the lower surface of the mask holding frame 12 and the movable mask holder 172, and is guided by the guide rail 73a in the X direction (the long side direction of the opening 12b). ) Movable slider member 73b.

  Further, as shown in FIG. 22, the pair of cylinder devices 74 that are the driving mechanism of the movable mask holder 172 correspond to the respective movable mask holders 172, approximately in the center in the longitudinal direction, in other words, the short of the mask holding frame 12. It is arranged at the approximate center of the side and extends in the longitudinal direction. Each cylinder device 74 has a cylinder main body 74 a fixed to the lower surface of the mask holding frame 12, and a piston 74 b that is pivotably fitted to a support shaft 75 of a projection 172 c provided projecting upward from the movable mask holder 172. ing.

  Further, a stopper 77 having a shock absorber 76 is fixed to the lower surface of the mask holding frame 12 in front of the piston 74b in the operation direction. When the cylinder device 74 is operated and the piston 74b is extended, the shock absorber 76 is interposed. Then, the protrusion 172c (movable mask holder 172) is brought into contact with the stopper 77, and the movable mask holder 172 is positioned at a predetermined position without giving an impact.

  The position of the stopper 77 regulates the position of the movable mask holder 172 when the large-size mask M is attached, and the position of the movable mask holder 172 when the piston 74b of the cylinder device 74 is drawn into the cylinder body 74a. The position is the position of the movable mask holder 172 when the mask M having a small size is attached.

  As described above, the fixed mask holder 171, the movable mask holder 172, the linear guide 73, and the cylinder device 74 are attached to the mask holding frame 12, so that the X axis is relative to the mask stage base 11 together with the mask holding frame 12. , Y axis and θ direction.

  When the cylinder device 74 is operated to attach a large size mask M, the pair of movable mask holders 172 are simultaneously moved in the direction away from each other (outward) to widen the interval, and the small size mask M is attached. In some cases, by moving the pair of movable mask holders 172 simultaneously in the direction of approaching (inward) to narrow the interval, it is possible to easily cope with a plurality of masks M having different sizes.

  According to the cylinder device 74 of this embodiment capable of positioning at two locations, it is possible to deal with masks M of two sizes, large and small. At this time, by moving the pair of cylinder devices 74 at the same time so that the pair of movable mask holders 172 are always positioned in the left-right symmetrical position, the center position of both the movable mask holders 172, that is, the center of the mask M is moved. And the mask M can be exchanged.

  FIG. 23 is a side view of a modified drive device. A stopper 77 having a shock absorber 76 can be moved in the moving direction of the piston 74b by an electric actuator 78, for example. As a result, the stop position of the movable mask holder 172 by the cylinder device 74 can be positioned at a plurality of three or more positions, and further at an arbitrary position. It can cope with minute changes.

  Further, the drive device can be constituted by an electric motor (not shown) instead of the cylinder device 74. According to the electric motor, it is easy to set a plurality of stop positions at arbitrary positions. The movable mask holder 172 can be stopped at the stop position.

  The glass substrate that is the material of the mask M uses a plurality of glass substrates in which the lengths of the two sides on the short side are substantially the same and the lengths of the two sides on the long side are different. A mask pattern is formed on the glass substrate. Is drawn. For this reason, the size of the non-pattern area remaining on the peripheral edge of the four sides, that is, the area that can be adsorbed by the mask holders 171 and 172 differs depending on the mask pattern or pattern layout formed on the glass substrate of a predetermined size.

  FIG. 20 is an example in the case of holding the mask M having a large mask size and a small short side suctionable area (a mask pattern is large), and extends until the piston 74b comes into contact with the stopper 77, and a pair of movable By widely separating the mask holder 172, the sub suction groove 172b is positioned outside the mask M to widen the pattern area. Then, the electromagnetic valve 113 is turned on and the electromagnetic valve 115 is turned off to stop the adsorption by the sub adsorption groove 172b (see FIG. 21). As a result, the mask M is sucked and held by the suction grooves 171 a and 171 b of the fixed mask holder 171 and the sub suction groove 172 b of the movable mask holder 172.

  FIG. 24 shows an example of holding a mask M having a large mask size and a large suction area on the short side. The piston 74b is retracted to narrow the distance between the pair of movable mask holders 172, and the movable mask holder 172 is drawn. The main suction groove 172a and the sub suction groove 172b are positioned inside the mask M. Then, both the electromagnetic valves 113 and 115 are turned on, and the mask M is sucked by the suction grooves 171a and 171b of the fixed mask holder 171 and the suction grooves 172a and 172b of the movable mask holder 172, and securely held. In this case, the short side of the mask M is sucked by the two suction grooves 172a and 172b by effectively using a large suckable area, so that the holding force is improved.

  FIG. 25 shows an example in which the mask size is small and the suctionable area on the short side is large. Since the sub suction groove 171b of the fixed mask holder 171 is disengaged from the mask M, the electromagnetic valve 83 is switched to the OFF state. While the suction by the suction groove 171b is stopped, the electromagnetic valve 85 is turned on, and the mask M is sucked and held by the main suction groove 171a of the fixed mask holder 171 and the main suction groove 172a and the sub suction groove 172b of the movable mask holder 172. To do. Also in this case, the short side of the mask M is sucked and held by the two suction grooves 172a and 172b.

  FIG. 26 shows an example in which the mask size is small and the suckable area on the short side is small. The sub suction groove 171b of the fixed mask holder 171 and the sub suction groove 172b of the movable mask holder 172 are separated from the mask M. Then, both the electromagnetic valves 113 and 115 are switched to the off state, and the adsorption by the sub adsorption grooves 171b and 172b is suspended. As a result, the mask M is sucked and held by the main suction groove 171a of the fixed mask holder 171 and the main suction groove 172a of the movable mask holder 172 so as to correspond to the small mask M.

  With the exposure apparatus 1 configured as described above, it is possible to handle a plurality of masks of different sizes without replacing the mask holder, and furthermore, suction can be performed corresponding to a plurality of masks having different suckable areas. It is possible to reliably hold and hold the region by effectively using the region.

  In addition, the pneumatic circuit connected to each adsorption | suction groove | channel 171a, 171b, 172a, 172b of the 1st and 2nd mask holders 171 and 172 is not limited to the thing of the said embodiment, It shows in FIG. You may be comprised by the modification. Specifically, the main suction groove 171a of each fixed mask holder 171 is connected to each electromagnetic valve 116 that can be switched on / off, and the main suction groove 172a of each movable mask holder 172 has each electromagnetic that can be switched on / off. Connected to valve 117. These electromagnetic valves 116 and 117 are connected to the vacuum suction device 110 via a pipe 111. Further, the sub suction groove 171 b of each fixed mask holder 171 is connected to each electromagnetic valve 113 that can be switched on / off, and each electromagnetic valve 113 is connected to the vacuum suction device 110 via a pipe 112. Further, the sub suction groove 172 b of each movable mask holder 172 is connected to each electromagnetic valve 115 that can be switched on / off, and each electromagnetic valve 115 is connected to the vacuum suction device 110 via a pipe 114.

  That is, as in this modification, the pneumatic circuit may be provided with a maximum number of solenoid valves corresponding to the number of suction grooves. Thus, by providing one electromagnetic valve 113, 115, 116, 117 for each adsorption groove 171a, 171b, 172a, 172b, the flow rate of each adsorption groove 171a, 171b, 172a, 172b can be easily controlled. Optimum adsorption is possible. In particular, the mask M is stably adsorbed by controlling the negative pressure of each electromagnetic valve 113, 115, 116, 117 one by one so that the negative pressure of each adsorption groove 171a, 171b, 172a, 172b becomes equal. be able to.

  In the exposure apparatus having the mask stage of the fifth embodiment, the negative pressure correction mechanism 90 that can correct the deflection of the mask M shown in FIG. 18 can be employed. Further, the deflection correction mechanism of the mask M is not limited to the negative pressure correction mechanism that corrects the deflection by the pressure difference, and the mask holder mounting angle such as a pair of spacers having different heights is adjusted as in the above embodiment. Then, a tilt angle adjusting mechanism capable of adjusting the tilt angle of the mask may be used. Furthermore, a negative pressure correction mechanism and a tilt angle adjustment mechanism can be provided together.

  In the fifth embodiment, the masks having different sizes are described using large and small masks in which the lengths of the two sides on the short side are substantially the same and the lengths of the two sides on the long side are different. It may be a mask in which the lengths of the two sides on the side are substantially the same and the lengths of the two sides on the short side are different.

(Sixth embodiment)
Hereinafter, a sixth embodiment of an exposure apparatus according to the present invention will be described in detail with reference to the drawings. The present embodiment is different from the first embodiment in the configuration of the mask stage, and the same or equivalent parts as in the first embodiment are denoted by the same reference numerals, and description thereof is omitted or simplified.

  In the mask stage of this embodiment, as shown in FIG. 28, a pair of mask holders 14 that hold the mask M are fixed to the lower surface of the mask holding frame 12 via spacers 15. The mask holder 14 can move in the X axis, Y axis, and θ directions with respect to the mask stage base 11 together with the mask holding frame 12. Note that the mask holder 14 may be an integrated mask holder that is not divided into two and is connected to both ends in a rectangular frame shape.

  As shown in FIG. 29, on the lower surfaces (substrate W side) of the pair of mask holders 14, a main suction groove 14a formed at the center in the longitudinal direction and on the left and right of the main suction groove 14a are independent from the main suction groove 14a. A pair of sub suction grooves 14b formed as described above are provided. The main suction groove 14a and the sub suction groove 14b of the mask holder 14 are grooves for sucking the peripheral portions of the two long sides on which the mask pattern of the mask M is not drawn.

  The main suction groove 14a and the sub suction groove 14b are connected to the vacuum suction device 110 via electromagnetic valves 113 and 115 that can be switched on / off, respectively. Specifically, each main adsorption groove 14 a is connected to each electromagnetic valve 113 that can be switched on / off, and each electromagnetic valve 113 is connected to the vacuum adsorption device 110 via a pipe 111. Each sub adsorption groove 14 b is connected to each electromagnetic valve 115 that can be switched on / off, and each electromagnetic valve 115 is connected to the vacuum adsorption device 110 via a pipe 112. Accordingly, the electromagnetic valves 113 and 115 are appropriately switched, and the two sides of the mask M are sucked and held detachably by the vacuum supplied to an arbitrary suction groove. As the solenoid valves 113 and 115, direct acting or pilot type valves are used.

  In this pneumatic circuit, as shown in FIG. 29, the maximum number of electromagnetic valves corresponding to the number of suction grooves is provided. Thus, by providing one electromagnetic valve 113, 115 for each adsorption groove 14a, 14b, it becomes easy to control the flow rate of each adsorption groove 14a, 14b, and optimum adsorption is possible. In particular, the mask M can be stably adsorbed by controlling the negative pressures of the electromagnetic valves 113 and 115 one by one so that the negative pressures of the adsorption grooves 14a and 14b become equal. In consideration of the number of parts, the main suction groove 14a is connected to the vacuum suction device 110 via the pipe 111 without providing a solenoid valve, and the plurality of sub suction grooves 14b are provided with a common solenoid valve 115. You may make it connect to the vacuum type adsorption device 110 via the piping 112.

Here, the size of the mask M may be slightly different (for example, about 10 to 20 mm) depending on the arrangement of the pattern drawn in the effective exposure area when multi-patterning is performed, but the mask holder 14 has such a size. It can be sucked and held corresponding to the masks M having different (long side lengths). Specifically, as shown in FIG. 30 (a), the main suction grooves 14a, and the sub suction grooves 14b was suction holding the mask M _L large size by operating at the same time, as shown in FIG. 30 (b) , suction-holds the mask M _S of smaller size by operating only the main suction grooves 14a.

  Also in the exposure apparatus of the present embodiment, the negative pressure correction mechanism 90 that can correct the deflection of the mask M shown in FIG. 18 is employed.

  In the exposure apparatus 1 configured as described above, the amount of bending in the X direction is constant in the mask M in which the two sides on the long side shown in FIG. 31 (b)), the amount of deflection in the Y direction is the largest at the center, and is a parabolic deflection that gradually decreases toward the long side edge of the mask M (see FIG. 31 (c)). In other words, the bending of the mask M is a relatively simple bending shape of a two-dimensional shape.

  Therefore, the deflection of the mask M according to the present embodiment held by suction on two sides is larger in absolute value than the deflection of the mask M held on four sides, but is complicated in the case of holding four sides. In contrast to the three-dimensional bending (see FIG. 35), a simple bending shape in which the amount of bending in the X direction is constant. For this reason, correction in the Y direction can be easily and accurately corrected by applying a pressure difference to both surfaces of the mask M by the negative pressure correction mechanism 90 (correction in the X direction is not necessary), and the flatness of the mask M Improve the degree. Thereby, the gap between the mask M and the substrate W in the effective exposure area of the mask M can be made as uniform as possible, and high exposure accuracy can be obtained.

Further, by switching the adsorption of the sub suction grooves 14b, it is possible to adsorb hold both the mask M _S of smaller size indicated in the mask M _L and FIG. 31 (b) of large size shown in FIG. 31 (a), A plurality of masks M having different sizes on the long side can be handled. Further, even if the size of the long side of the mask M is different, the amount of bending in the X direction remains constant and the shape of bending in the Y direction does not change, so the mask without substantially adjusting the negative pressure correction mechanism 90. The amount of deflection of each mask M accompanying the replacement of M can be easily corrected.

(Seventh embodiment)
Next, an exposure apparatus according to a seventh embodiment of the present invention provided with a tilt angle adjusting mechanism will be described in detail with reference to FIG. 32 which is a longitudinal sectional view of a mask stage.

  As shown in FIG. 32, a pair of mask holders 14 are attached to the mask holding frame 12 via the tilt angle adjusting mechanism 80 on the lower surfaces of both long sides of the opening 12b.

  The tilt angle adjusting mechanism 80 is a mechanism capable of adjusting the angle of the pair of mask holders 14, that is, the tilt angle. In this embodiment, a pair of interchangeable spacers 80a and 80b having different heights are used as masks. It is arranged between the holding frame 12 and the mask holder 14. As a result, the pair of mask holders 14 is inclined with respect to the horizontal direction, and the mask M, whose both ends are attracted and held by the pair of mask holders 14, is given a symmetric angle with respect to the center C in the longitudinal direction. It can correct | amend so that the bending of M may reduce and the flatness of the mask M is improved. Therefore, the gap between the mask M and the substrate W in the effective exposure area of the mask M can be made as uniform as possible.

  Even in such an exposure apparatus 1, as in the sixth embodiment, even if the size of the long side of the mask M is different, the X-direction deflection amount remains constant, and the Y-direction deflection shape does not change. The amount of deflection of each mask M associated with the replacement of the mask M can be easily corrected without substantially adjusting the angle adjusting mechanism 80.

  As shown in FIG. 33, as the tilt angle adjusting mechanism of the present embodiment, modifications of the tilt angle adjusting mechanism shown in FIGS. 9 to 11 may be applied.

In the above embodiment, for example, the tilt angle adjusting mechanism can be provided side by side.
The mask has been described as a large and small mask in which the length of the two sides on the short side is substantially the same and the length of the two sides on the long side is different, but the length of the two sides on the long side is substantially the same. In this case, the masks may have different lengths on the two short sides. In this case, the mask holder is configured to include double rows of suction grooves arranged in the short side direction.

  In this embodiment, the mask holding frame 12 is a mask stage base side member. However, depending on the configuration of the mask stage, the mask stage base 11 may be a mask stage base side member. The tilt angle adjusting mechanism 80 is disposed on the lower surface side of the mask stage base 11.

  In addition, this invention is not limited to each embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably. In addition, the present invention can be applied in combination with each embodiment within a feasible range.

  The substantially rectangular mask of the present invention may be a structure having four mask holders or four sides that can be adsorbed by a pair of mask holders. As shown in FIGS. It is not limited to one in which two sides adjacent to each other intersect at 90 ° ± 1 °, and includes, for example, those in which corners are notched as shown in FIGS.

  The present invention includes a Japanese patent application filed on June 17, 2010 (Japanese Patent Application No. 2010-138505), a Japanese patent application filed on June 17, 2010 (Japanese Patent Application No. 2010-138506), and an application filed on June 23, 2010. Japanese patent application (Japanese Patent Application No. 2010-142856), Japanese Patent Application filed on May 31, 2011 (Japanese Patent Application No. 2011-122231), Japanese Patent Application filed on May 31, 2011 (Japanese Patent Application No. 2011-122232), 2011 This is based on a Japanese patent application (Japanese Patent Application No. 2011-122233) filed on May 31, 2011, the contents of which are incorporated herein by reference.

DESCRIPTION OF SYMBOLS 1 Exposure apparatus 10 Mask stage 11 Mask stage base (mask stage base side member)
12 Mask holding frame (mask stage base side member)
14 Mask holder 14a Main suction groove (Suction groove)
14b Sub-adsorption groove (adsorption groove)
20 Substrate stage 30 Illumination optical system (irradiation means)
71 Fixed mask holder (mask holder)
71d, 72d Side edge portions 71e, 72e Thin portions 71f, 72f Chamfered portions 71g, 72g Stepped portion 72 Movable mask holder (short side mask holder, mask holder)
73 Linear guide 73a Guide rail 73b Slider member 74 Cylinder device (drive mechanism)
74a Cylinder body 74b Piston 76 Shock absorber 77 Stopper 78 Electric actuator 80, 80A, 80B Pivot angle adjustment mechanism 81 Spacer 83 Wedge mechanism 84 Fixed taper member 84a Inclined surface 85 of fixed taper member Movable taper member 85a Movable taper Inclined surface 90 of member Negative pressure correction mechanism 91 Thermal chamber (chamber)
92 Optical chamber (chamber)
113, 115, 116, 117 Solenoid valve 171 Fixed mask holder (first mask holder)
171a Main suction groove (other suction grooves)
171b Sub adsorption groove (other adsorption groove)
172 Movable mask holder (second mask holder)
172a Main suction groove (Suction groove)
172b Sub-adsorption groove (adsorption groove)
M Mask W substrate

Claims (23)

A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and irradiates the substrate with light for pattern exposure via the mask An exposure device comprising:
The mask stage is
A mask stage base side member;
Four mask holders capable of adsorbing and holding each side of the mask;
Provided between the mask stage base side member and at least two mask holders that hold the short side of the mask by suction, and the short side mask holder is longer than the mask stage base side member. A plurality of guide mechanisms for movably guiding in the side direction;
A drive mechanism for moving the short side mask holder in the long side direction with respect to the mask stage base side member;
A tilt that is provided between at least one of the mask stage base side member and the guide mechanisms and at least one of the guide mechanisms and the short side mask holder. An angle adjustment mechanism;
An exposure apparatus comprising:   The tilt angle adjusting mechanism is provided between both the mask stage base side member and each guide mechanism and between each guide mechanism and the mask holder on the short side. The exposure apparatus according to claim 1. Each guide mechanism has a guide rail attached to the mask stage base side, and a slider member attached to the mask holder side,
The tilt angle adjusting mechanism is provided between at least one of the mask stage base side member and the guide rails and between the slider member and the short side mask holder, respectively. The exposure apparatus according to claim 1 or 2.   The exposure apparatus according to any one of claims 1 to 3, wherein the tilt angle adjusting mechanism is a pair of interchangeable spacers having different heights. The tilt angle adjusting mechanism is
A spacer having a predetermined height;
A fixed-side taper member having an inclined surface provided outside the spacer, and a movable-side taper member having an inclined surface slidably contacting the inclined surface, the sliding contact position of the inclined surface Wedge mechanism that can change the height by changing
The exposure apparatus according to claim 1, further comprising:   6. The exposure apparatus according to claim 5, wherein the wedge mechanism adjusts the tilt angle by driving the movable side taper member by an electric actuator.   The exposure apparatus according to claim 1, wherein the tilt angle adjusting mechanism is a piezo element whose height can be changed by energization control.   8. The drive mechanism according to claim 1, wherein the drive mechanism is a cylinder device in which a cylinder body is fixed to the mask stage base side member and a tip of a piston is fixed to the mask holder. The exposure apparatus described in 1.   The cylinder device has a stopper having a shock absorber movably attached to the mask stage base side member, and the piston is brought into contact with the stopper to position the mask holder at a predetermined position. 9. An exposure apparatus according to claim 8, wherein   The exposure apparatus according to claim 1, wherein the drive mechanism is an electric motor.   The exposure apparatus according to claim 10, wherein the electric motor stops the mask holder at at least three stop positions.   The mask holder for sucking and holding the short side of the mask and the mask holder for sucking and holding the long side of the mask are thinly formed at least on the side edge portions close to each other than the remaining portions. The exposure apparatus according to any one of claims 1 to 11, further comprising a portion.   The mask holder for sucking and holding the short side of the mask and the mask holder for sucking and holding the long side of the mask have chamfered portions at corners close to each other. The exposure apparatus according to claim 11. Any one of the mask holder that sucks and holds the short side of the mask and the mask holder that sucks and holds the long side of the mask extends at least from the lower surface to the side edges close to each other. And the other mask holder has a stepped portion extending from the upper surface,
12. The mask holder according to claim 1, wherein the mask holders on the short side and the long side adsorb and hold the mask in a state where the stepped portions are overlapped with each other. Exposure device.   A negative pressure correction mechanism that includes a chamber facing one side of the mask and corrects the tilt angle of the mask by giving a pressure difference between the pressure inside the chamber and the pressure acting on the other side of the mask The exposure apparatus according to claim 1, further comprising: A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and irradiates the substrate with light for pattern exposure via the mask An exposure device comprising:
The mask stage is
A pair of first mask holders capable of adsorbing and holding two opposing sides of the mask extending in a predetermined direction;
A pair of second mask holders capable of sucking and holding the other two opposite sides of the mask extending in a direction orthogonal to the predetermined direction and movable in the predetermined direction of the mask;
A pair of drive mechanisms for moving each of the second mask holders in the predetermined direction of the mask,
Each of the second mask holders includes a plurality of rows of suction grooves arranged in the predetermined direction, which suck and hold the other two sides of the mask by a negative pressure supplied.   The exposure apparatus according to claim 16, wherein the suction groove of the second mask holder is switched between supply and stop of negative pressure by an electromagnetic valve. Each of the first mask holders includes a plurality of other suction grooves provided by being divided in the predetermined direction, which sucks and holds the two sides of the mask by the negative pressure supplied.
The other suction groove of the first mask holder and the suction groove of the second mask holder are supplied and stopped by a solenoid valve provided for each of the other suction grooves and the suction groove. 18. The exposure apparatus according to claim 16, wherein the exposure is switched and the magnitude of the negative pressure is controlled.   A negative pressure correction mechanism that includes a chamber facing one side of the mask, and that provides a pressure difference between the atmospheric pressure in the chamber and the atmospheric pressure acting on the other side of the mask to correct the deflection of the mask. The exposure apparatus according to claim 16, further comprising an exposure apparatus. A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and irradiates the substrate with light for pattern exposure via the mask An exposure device comprising:
The mask stage is
A pair of mask holders each having a plurality of suction grooves formed in the direction along the two sides that suck and hold the two opposite sides of the mask by the negative pressure supplied;
A negative pressure correction mechanism that includes a chamber facing one side of the mask, and that provides a pressure difference between the atmospheric pressure in the chamber and the atmospheric pressure acting on the other side of the mask to correct the deflection of the mask;
An exposure apparatus comprising:   The plurality of suction grooves of the pair of mask holders can be switched between negative pressure supply and stop by an electromagnetic valve provided for each suction groove, and the magnitude of the negative pressure is controlled. The exposure apparatus according to claim 20, wherein: A substrate stage on which a substrate as a material to be exposed is placed, a mask stage that is disposed above the substrate stage and holds a substantially rectangular mask, and irradiates the substrate with light for pattern exposure via the mask An exposure device comprising:
The mask stage is
A mask stage base side member;
A pair of mask holders each having a plurality of suction grooves formed in the direction along the two sides that suck and hold the two opposite sides of the mask by the negative pressure supplied;
An exposure mechanism comprising: a tilt angle adjusting mechanism provided between the mask stage base side member and each mask holder, wherein the tilt angle of each mask can be adjusted by tilting each mask holder. apparatus.   The plurality of suction grooves of the pair of mask holders can be switched between negative pressure supply and stop by an electromagnetic valve provided for each suction groove, and the magnitude of the negative pressure is controlled. The exposure apparatus according to claim 22.

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