JPWO2010119811A1 - マスクブランク及び転写用マスク並びに膜緻密性評価方法 - Google Patents
マスクブランク及び転写用マスク並びに膜緻密性評価方法 Download PDFInfo
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- JPWO2010119811A1 JPWO2010119811A1 JP2011509271A JP2011509271A JPWO2010119811A1 JP WO2010119811 A1 JPWO2010119811 A1 JP WO2010119811A1 JP 2011509271 A JP2011509271 A JP 2011509271A JP 2011509271 A JP2011509271 A JP 2011509271A JP WO2010119811 A1 JPWO2010119811 A1 JP WO2010119811A1
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Images
Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/46—Antireflective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009100050 | 2009-04-16 | ||
| JP2009100050 | 2009-04-16 | ||
| PCT/JP2010/056409 WO2010119811A1 (ja) | 2009-04-16 | 2010-04-09 | マスクブランク及び転写用マスク並びに膜緻密性評価方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015009267A Division JP5899558B2 (ja) | 2009-04-16 | 2015-01-21 | マスクブランク及び転写用マスク |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2010119811A1 true JPWO2010119811A1 (ja) | 2012-10-22 |
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011509271A Pending JPWO2010119811A1 (ja) | 2009-04-16 | 2010-04-09 | マスクブランク及び転写用マスク並びに膜緻密性評価方法 |
| JP2015009267A Active JP5899558B2 (ja) | 2009-04-16 | 2015-01-21 | マスクブランク及び転写用マスク |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015009267A Active JP5899558B2 (ja) | 2009-04-16 | 2015-01-21 | マスクブランク及び転写用マスク |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8709681B2 (https=) |
| JP (2) | JPWO2010119811A1 (https=) |
| KR (1) | KR101702682B1 (https=) |
| TW (1) | TWI444760B (https=) |
| WO (1) | WO2010119811A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130160948A1 (en) * | 2011-12-23 | 2013-06-27 | Lam Research Corporation | Plasma Processing Devices With Corrosion Resistant Components |
| JP6335735B2 (ja) * | 2014-09-29 | 2018-05-30 | Hoya株式会社 | フォトマスク及び表示装置の製造方法 |
| JP6489951B2 (ja) * | 2015-06-12 | 2019-03-27 | 東芝メモリ株式会社 | 半導体装置の製造方法 |
| JP6932552B2 (ja) * | 2017-05-31 | 2021-09-08 | Hoya株式会社 | マスクブランク、転写用マスクの製造方法及び半導体デバイスの製造方法 |
| JP7332324B2 (ja) * | 2019-04-10 | 2023-08-23 | デクセリアルズ株式会社 | 無機偏光板及びその製造方法、並びに光学機器 |
| JP7801845B2 (ja) * | 2020-09-08 | 2026-01-19 | テクセンドフォトマスク株式会社 | 位相シフトマスクブランク、位相シフトマスク及び位相シフトマスクの製造方法 |
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- 2010-04-09 JP JP2011509271A patent/JPWO2010119811A1/ja active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| KR101702682B1 (ko) | 2017-02-06 |
| TWI444760B (zh) | 2014-07-11 |
| JP2015096973A (ja) | 2015-05-21 |
| US20120034434A1 (en) | 2012-02-09 |
| US8709681B2 (en) | 2014-04-29 |
| JP5899558B2 (ja) | 2016-04-06 |
| KR20120057569A (ko) | 2012-06-05 |
| TW201109833A (en) | 2011-03-16 |
| WO2010119811A1 (ja) | 2010-10-21 |
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